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Dalton Transactions
Page 8 of 10
DOI: 10.1039/C7DT02608K
ARTICLE
Journal Name
11 B. Y. Xia, H. Bin Wu, X. Wang and X. W. Lou, J. Am. Chem.
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15 S. Zhang, S. Guo, H. Zhu, D. Su and S. Sun, J. Am. Chem.
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that not only Ni but also NiO, Ni(OH)2, and NiOOH were
present along with Pt on the surface of the alloys with Ni as one
component. Thus, presence of oxophilic Ni sites on the surface
of TMA favors the formation of surface OH− layer to a greater
extent and thereby assists in removing the carbonaceous
species. The removal of carbonaceous species is presented as
equations (6) and (7), which allow freeing up of both the Pt and
Ni sites for further methanol oxidation.64 The higher CO
tolerance is ascertained by higher Ip,f/Ip,r value with TMA as
shown in Fig 5b. This concludes the requirement of an optimal
ratio of nonꢀPt metal contents, i.e., Ni and Au in the alloy for
the maximum MEO activity, which is found with Pt66Au11Ni23.
16 Z.ꢀB. Wang, G.ꢀP. Yin, Y.ꢀY. Shao, B.ꢀQ. Yang, P.ꢀF. Shi
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20 H. Zhu, S. Zhang, S. Guo, D. Su and S. Sun, J. Am. Chem.
4. Conclusions
In summary, synthesis of highly uniform PtAuNi TMA NPs
with narrow size distribution (3−6 nm) and controlled atomic
Soc., 2013, 135, 7130–7133.
percentage is demonstrated here using a simple oneꢀstep
solvothermal method. The PtAuNi TMA NPs with an optimum
content of Pt, Ni, and Au (Pt66Au11Ni23) exhibit superior MEO
activity as compared to their BMA counterparts and Pt/C. This
was attributed to the synergistic role of Pt, Ni, and Au in the
TMA NPs. While Ni facilitates adsorption of OHad species on
NPs to enhance the oxidation of carbonaceous species, Au
deters adsorption of carbonaceous species that poison the active
Pt sites of the catalyst. The design of the PtAuNi TMA NPs
with an enhanced MEO activity as presented here has a strong
bearing to the development of DMFC.
21 S. Guo, S. Zhang, X. Sun and S. Sun, J. Am. Chem. Soc.
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22 H.ꢀH. Li, S. Zhao, M. Gong, C.ꢀH. Cui, D. He, H.ꢀW. Liang,
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23 J. Luo, P. N. Njoki, Y. Lin, D. Mott, L. Wang and C.ꢀJ.
Zhong, Langmuir, 2006, 22, 2892–2898.
24 J. B. Xu, T. S. Zhao, W. W. Yang and S. Y. Shen, Int. J.
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25 Z. Zhang, Y. Wang and X. Wang, Nanoscale, 2011, 3, 1663–
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26 W. Niu, L. Li, X. Liu, W. Zhou, W. Li, J. Lu and S. Chen,
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27 A. B. A. A. Nassr, I. Sinev, M.ꢀM. Pohl, W. Grunert and M.
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,
28 Y. Hao, X. Wang, Y. Zheng, J. Shen, J. Yuan, A. Wang, L.
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29 V. R. Stamenkovic, B. S. Mun, K. J. J. Mayrhofer, P. N. Ross
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Acknowledgements
KB thanks to Scientific & Industrial Research (CSIR), New
Delhi for a senior research fellowship. This work is supported
by CSIR [Grant No. 01(2724)/13/EMRꢀII], New Delhi, India.
Authors also acknowledge the DSTꢀFIST funded facility at the
Department of Physics for XPS measurement.
30 N. Roy, K. Bhunia, C. Terashima, A. Fujishima and D.
Pradhan, ACS Omega, 2017, 2, 1215–1221.
31 S. Karra, M. Wooten, W. Griffith and W. Gorski,
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32 S. Megarajan, K. B. A. Ahmed, G. R. K. Reddy, P. S. Kumar
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