074705-4
Omar Uñac et al.
J. Chem. Phys. 125, 074705 ͑2006͒
some to induce the formation of O islands. However, simu-
lations using those mechanisms resulted in a clear loss of
quality in the reproduction of the temporal behavior of the
N2O decomposition rate while not resolving the issue of this
high-temperature surface poisoning. Eventually, it was con-
cluded that the only way to correctly reproduce the observed
N2O decomposition rates, the overall nitrogen yields, and the
final oxygen coverages at different temperatures was to as-
sume an additional condition for the N2O dissociation: that
this elementary step can only occur if a mean number of nn
vacant sites, V͑T͒, is available to the adsorbed N2O mol-
ecule. It was then found that this number needs to increase
with temperature to reproduce the experimental values. V͑T͒
was used as the only fitting parameter in our simulations; all
other parameters were determined independently or taken
from the literature, and fixed at the values listed in Table I.
Interestingly, there is no longer a need to assume that N2O
desorption is more activated than its decomposition;
good results were obtained here even with an activation
energy difference between the two of Ea͑act͒−Ea͑des͒
= +1 kcal/mol.
Again, the general conclusion that the decrease in reac-
tivity with increasing temperature is the result of the dynam-
ics of the decomposition reaction, and not of a kinetic com-
petition with other steps, is borne by the data in Fig. 1. We
argue that if the time evolution of the kinetic behavior at any
given temperature depends on the evolution of the surface as
the reaction proceeds, preparing the surface at different tem-
peratures first should affect any subsequent rates in ways not
easily predicted by the first-order kinetics observed for this
reaction.24 Specifically, if oxygen islands were to form at low
temperatures but not at high temperatures ͑perhaps because
of a competition among mobility, decomposition, and de-
sorption steps͒, N2O decomposition could require the same
surface ensembles ͑sites͒ at all temperatures, only the surface
oxygen would not block the surface randomly at low tem-
peratures, and would leave more open sites for reaction.
However, in that case the surfaces obtained after reactions at
high temperatures should lose their subsequent activity at all
temperatures, since at that point the oxygen atoms would
already be randomly distributed on the surface. This is not
what is observed in Fig. 1. On the other hand, if there is a
need for larger surface ensembles for N2O decomposition at
high versus low temperatures, as the Monte Carlo simula-
tions indicate, a small coverage of randomly dispersed oxy-
gen would be enough to kill the reaction at high temperatures
but not at low temperatures; there should still be space for a
low-temperature reaction requiring smaller ensembles. Fig-
ure 1 shows that this is indeed the case.
FIG. 1. Isothermal molecular beam kinetic data for the decomposition of
N2O on a Rh͑111͒ single-crystal surface. Shown are the rates of molecular
nitrogen production as a function of time for four sets of double-run experi-
ments. In each pair an initial run was carried out on the clean surface at
either one of two temperatures, 350 ͑two bottom pairs͒ or 520 ͑two top
pairs͒ K; the results are reported in the top traces of each pair. A second run
was then recorded immediately afterwards, without cleaning the surface, but
after changing the temperature. Those results are shown in the lower traces
of each pair. The data in this figure indicate that N2O decomposition is
slower, produces less N2, and deposits less atomic oxygen on the surface at
higher temperatures. It also points to the fact that the inactive surfaces
obtained at the end of the N2O conversion at high temperatures can still
promote additional decomposition at lower temperatures.
formed in order to probe the temperature dependence of the
reactivity of the surfaces saturated with adsorbed oxygen
from N2O decomposition at different temperatures, to test
the hypothesis presented in Sec. I. The data indicate that
while the surface prepared at 350 K displays no significant
subsequent reactivity at either 350 or 520 K ͑two bottom
cases in Fig. 1͒, the one resulting from saturation with N2O
at 520 K is still quite active at 350 K: the data in the third set
from the bottom in Fig. 1 indicate a similar initial rate for the
second run at 350 K as for the first at 520 K. In other words,
surfaces saturated with oxygen atoms from N2O decomposi-
tion at high temperatures are still active for that reaction at
lower temperatures. On the other hand, the opposite is not
true: surfaces saturated at low temperatures are not active at
higher temperatures. This observation is central to our dis-
cussion below. More generally, the reaction rates obtained in
the second runs scale quite nicely with the fraction of empty
sites left after the first runs ͑as calculated from the N2 yields;
data not shown͒, as expected from the first-order kinetics
followed by this reaction.24
The experimental results reported before for the kinetics
of N2O decomposition on Rh͑111͒ ͑Ref. 24͒ could be satis-
factorily reproduced by simulations with the values of V͑T͒
shown in Fig. 2. A value of V͑T͒=0 was obtained at 335 K,
indicating that N2O can dissociate on the same site on which
it is adsorbed, without the need of any additional nn vacant
sites. V͑T͒ then increases with temperature until reaching a
maximum of six around 795 K, which in a triangular lattice
such as that in Rh͑111͒ represents the maximum number of
nn atoms around a given site. A continuous line has been
Monte Carlo simulations were carried out to try to repro-
duce and explain the experimental findings obtained by us
here and by Wehner et al.24 First, to explain the decrease in
nitrogen yield and oxygen deposition seen with increasing
reaction temperature, several kinetic mechanisms were at-
tempted based on the idea of larger N2O desorption prob-
abilities before dissociation at higher temperatures, including