MULTIPHOTON IONIZATION OF CHLOROMETHANES WITH 193-NM EXCIMER LASER RADIATION IN ARGON MATRICES

Article abstract of DOI:10.1021/j100342a042

The 193-nm output of an excimer laser has been coupled with the matrix isolation technique to demonstrate the feasibility of multiphoton ionization of matrix-isolated species.CCl4, CHCl3, and CH2Cl2 were, in turn, deposited in argon and (in some cases) nitrogen matrices and irradiated for between 5 min and 3 h.For CCl4 and CH2Cl2, the major product was the parent cation or species derived directly thereform, while more varied species, including the CHCL3(-) anion, were observed in the CHCl3 studies.In addition, neutral fragments were observed in a manner similar to previous resonance radiation and proton-beam radiolysis studies.Irradiation of the sample mixture during the deposition process led to increased product yield, as well as additional products for some of the systems.The laser irradiation time, power, and repetition rate were varied over a wide range, and a relative insensitivity to these parameters was noted.