Chemical method for the deposition of nickel oxide thin films

Article abstract of DOI:10.1149/1.2086316

Nickel oxide is an antiferromagnetic oxide semiconductor. It can be used as a catalyst and also as a electrochromic material. Previously, films of NiO have been prepared by vacuum evaporation as well as sputtering techniques. However, no chemical depositi

Full text of DOI:10.1149/1.2086316

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Downloaded on 2014-11-26 to IP 169.230.243.252 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).