
Journal of the American Chemical Society p. 2975 - 2983 (2015)
Update date:2022-08-11
Topics:
Wang, Songbo
Pan, Lun
Song, Jia-Jia
Mi, Wenbo
Zou, Ji-Jun
Wang, Li
Zhang, Xiangwen
Defects are critically important for metal oxides in chemical and physical applications. Compared with the often studied oxygen vacancies, engineering metal vacancies in n-type undoped metal oxides is still a great challenge, and the effect of metal vacancies on the physiochemical properties is seldom reported. Here, using anatase TiO2, the most important and widely studied semiconductor, we demonstrate that metal vacancies (VTi) can be introduced in undoped oxides easily, and the presence of VTi results in many novel physiochemical properties. Anatase Ti0.905O2 was synthesized using solvothermal treatment of tetrabutyl titanate in an ethanol-glycerol mixture and then thermal calcination. Experimental measurements and DFT calculations on cell lattice parameters show the unstoichiometry is caused by the presence of VTi rather than oxygen interstitials. The presence of VTi changes the charge density and valence band edge of TiO2, and an unreported strong EPR signal at g = 1.998 presents under room temperature. Contrary to normal n-type and nonferromagnetic TiO2, Ti-defected TiO2 shows inherent p-type conductivity with high charge mobility, and room-temperature ferromagnetism stronger than Co-doped TiO2 nanocrystalline. Moreover, Ti-defected TiO2 shows much better photocatalytic performance than normal TiO2 in H2 generation (4.4-fold) and organics degradation (7.0-fold for phenol), owing to the more efficient charge separation and transfer in bulk and at semiconductor/electrolyte interface. Metal-defected undoped oxides represent a unique material; this work demonstrates the possibility to fabricate such material in easy and reliable way and thus provides new opportunities for multifunctional materials in chemical and physical devices.
Suzhou Jingye Medicine & Chemical Co., Ltd
Contact:+86-512-66658588
Address:No. 88, Sanlian Street, Jinfeng Road, Suzhou New District, Jiangsu Province, P. R. China
Taizhou volsen chemical Co., Ltd
website:http://www.volsenchem.com
Contact:+86-576-88869393
Address:Jiaojiang District, Taizhou, Zhejiang, China.
Shenyang NovPharm Technology Co., Ltd.
Contact:.+86-24-24165786
Address:Room 306, Hongjin Mansion, No. 36-1, Wanliutang Rd., Shenhe District, Shenyang, Liaoning, P.R.C.
Huangshan Honghui Pharm Technology Co., Ltd.(expird)
website:http://www.honghuichem.com
Contact:18855958372
Address:Qingshan Wan No.1,Nanyuan Kou,SheXian Huangshan City,Anhui Province
Synochem Ingredients Corp., Ltd.
Contact:+86-512-5636 2180
Address:Zhangjiagang Free Trade Zone
Doi:10.1016/j.molcata.2014.06.021
(2014)Doi:10.1021/ja964465u
(1997)Doi:10.1021/jm050726b
(2005)Doi:10.1080/10426500008042103
(2000)Doi:10.1016/j.ab.2018.12.022
(2019)Doi:10.1063/1.453527
(1987)