
Chemistry Letters p. 871 - 872 (1999)
Update date:2022-08-11
Topics:
Tanabe, Shuji
Egashira, Kayo
Okitsu, Kenji
Matsumoto, Hiroshige
The partial oxidation of CH4 by N2O was investigated in a dielectric-barrier discharge system at atmospheric pressure. CH4 converted to CH3OH, HCHO, and CO in this system. Total yield of CH3OH and HCHO reached about 10 % in the Ar stream. It was suggested that excited Ar species and electrons might behave important role to promote the partial oxidation reaction.
View More
Nanjing Chemlin Chemical Co., Ltd.
website:http://www.echemlin.cn
Contact:+86-25-83697070
Address:Rm.902 Longyin Plaza, No. 217 Zhongshan Rd.(N) Nanjing 210009,China
shijiazhuang alkay chemicals co..ltd(expird)
Contact:86-311-67692035
Address:2601,juntang building,qiaodong district,shijiazhuang
Contact:18698110882
Address:1303 No2 building,LuoMa Garden,YongAn Road,Hexi District,Tianjin city
Contact:+86+21-58956006 15800617331
Address:402 Room, 150# Cailun Road, Zhangjiang high tech park, Shanghai
Wuhan Silworld Chemical Co.,Ltd
website:http://www.silworldchemical.com
Contact:+86-27-85613400
Address:No.198 jiangjun Road, Wuhan,China 430033
Doi:10.1002/cctc.201900492
(2019)Doi:10.1016/j.jconrel.2015.12.022
(2016)Doi:10.1039/c4ce01567c
(2014)Doi:10.1021/cs5008798
(2014)Doi:10.1002/mrc.2190
(2008)Doi:10.1002/bbpc.198800366
(1988)