
Journal of Physical Chemistry p. 6237 - 6240 (1994)
Update date:2022-08-17
Topics:
Myli, K. B.
Grassian, V. H.
We have investigated the photodissociation of chlorobenzene and 3-chloropyridine adsorbed on smooth and rough Ag surfaces.Photolysis of adsorbed chlorobenzene and 3-chloropyridine with UV radiation results in C-Cl bond dissociation.Biphenyl and bipyridyl desorb from the surface near 400 K, and AgCl desorbs near 800 K in postirradiation temperature-programmed desorption.Compared to a smooth surface, there is a red shift in the photodissociation threshold for both molecules when adsorbed on a rough surface.Possible mechanisms for the red shift are discussed.This study demonstrates the importance of substrate morphology on surface photochemistry.
View More
RongCheng K&S Chemical Co.,Ltd
Contact:0631-7336369
Address:rongcheng ,shandong province china
Chengdu Sino-Strong Pharmaceutical Co.,Ltd.
website:http://www.sino-strong.com.cn
Contact:+86-28-82666753
Address:459 West haike road,Cross-straits technological industry park, Wenjiang district,Chengdu, P.R.China
Dongtai Xinyuan Chemical Co., Ltd.
Contact:+86-21-56733000
Address:404F, 99Nong No.117 Zhongtan Rd. Shanghai
Qingzhou Baibang import and export co.,Ltd
Contact:+86-536-3265899
Address:No.338, Tuoshan Road
Contact:86-511-85210668 0511-85210668, 85210818, 85210898
Address:Yihai Garden E-902,NO.99 Daxi RD., Zhenjiang Jiiangsu ,China
Doi:10.1016/0038-1098(81)90682-7
(1981)Doi:10.1021/jo1011569
(2010)Doi:10.1002/zaac.19976231009
(1997)Doi:10.1063/1.443220
(1982)Doi:10.1002/jhet.1830
(2014)Doi:10.1016/j.jinorgbio.2013.02.007
(2013)