Microsystem Technologies 6 ꢀ2000) 179±183 Ó Springer-Verlag 2000
Dimensional measurement of high aspect ratio micro structures
with a resonating micro cantilever probe
M. Yamamoto, H. Takeuchi, S. Aoki
179
Abstract In non-destructive dimensional measurement of EDM and LIGA are beginning to be used in practice. The
high aspect ratio micro structures ꢀHARMS), optical
evaluation of tooth surface roughness and wear of such
methods cannot offer full three dimensional information gears call for a new measurement method.
due to the lack of observation light. Again, conventional
HARMS measurement has inherent dif®culties because
mechanical measurement, such as a surface pro®ler or a high walls stand with extremely narrow spacing for
coordinate measurement machine, cannot be applied be- probing means. Because the vertical surface doesn't re¯ect
cause their stylus is too large. Furthermore, the AFM,
light back, optical methods are not suitable for three-di-
though popular among the semiconductor industry, is also mensional evaluation. Thus, measurement with physical
limited in terms of dimensional measurement, because its contact probes seems to be the promising solution for
system is usually designed for planar samples. Thus, we
have developed a new sensor-integrated micro resonating
cantilever probe and a new dimensional measurement
HARMS nondestructive evaluation.
The ®rst approach for HARMS measurement is con-
ventional mechanical probing measurement such as co-
machine, which allows the probe's vertical access to mic- ordinate measurement machine ꢀCMM). The smallest
rostructures in a sample. The new probe is made of
tungsten carbide super hard alloy and possesses design
probe readily available as of present is /0.2 mm. Because
the probing force decides the minimum probe size, low
¯exibility according to its intended application. Validity of contact force systems have been investigated ꢀfor example,
the system is con®rmed through the measurement exper- [Pril et al. ꢀ1997)] and [Schepperie et al. ꢀ1998)]). Al-
iment of EDM drilled and chemically etched micro holes. though these approaches have succeeded in realizing 1 lN
probing force and /100 micron ®ber probes respectively,
1
the dif®culty of probe assembly limits further downsizing
Introduction
of the CMM probe.
Recent development in the ®eld of high aspect ratio micro
structure technologies ꢀHARMST) accelerates the need for
nondestructive measurement of such structures.
Among various HARMS measurement, micro hole
measurement is recognized as one of the most important
industrial applications. For example, contemporary micro
nozzle tests have been done by actually spraying liquid
from the holes. The drawback; the test fails to give the
exact location of the defect, thus stirring a desire for the
measurement of hole pro®le and internal surface rough-
ness. Again in the micromachine ®eld, micro gears by
Another promising approach for HARMS measurement
is the AFM. Because most AFM systems are designed for
planer samples like Si wafers, they employ a light leverage
method to detect the probe's strain. As a result, when the
probe is inserted into microstructures, the detective light
can easily be obstructed and the system fails. One excep-
tion is critical dimension AFM ꢀCD-AFM) [Vachet and
Young ꢀ1995)]. Equipped with a ¯are-shape tip, this device
can measure a trench of maximum 8 lm depth and min-
imum 0.5 lm width, which is used for devise isolation in
LSI process. Thanks to the recent progress in AFM probe
technology, some AFM probes have their own integrated
strain sensor ꢀfor example, [Indermuhle et al. ꢀ1997) and
Itoh and Suga ꢀ1993)]). These probes can be vertically
inserted into micro holes and can measure the surface,
once the measurement setup is prepared. Although the
AFM approach seems to be a good candidate for HARMS
measurement, its rigid probe dimension can be an obsta-
cle. In other words, requirements for probe dimension can
M. Yamamoto ꢀ&), H. Takeuchi, S. Aoki
Matsushita Research Institute Tokyo, Inc.,
3-10-1 Higashimita, Tama-ku,
Kawasaki 214-8501, Japan
E-mail: tyama@mrit.mei.co.jp
A part of this work was performed under the management of the
Micromachine Center as the Industrial Science and Technology
Frontier Program, ``Research and Development of Micromachine change according to the measurement sample because the
Technology'', of MITI supported by the New Energy and
Industrial Technology Development Organization. The authors
gratefully acknowledge suggestions and encouragement by Prof.
Masuzawa of the University of Tokyo.
probe and its tip dimension decide the maximum depth,
maximum protrusion and minimum gap it can handle.
Lithographically manufactured AFM probes cannot
change shape once the mask pattern and the process
conditions are ®xed.
This paper was presented at the Third International Workshop on
High Aspect Ratio Microstructure Technology HARMST '99 in
June 1999.
The third approach for HARMS measurement is to
utilize a ¯exible manufacturing technology for custom-