Journal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases p. 2795 - 2802 (1987)
Update date:2022-08-29
Topics:
Howarth, Jonathan N.
Pletcher, Derek
The electrodeposition of aluminium from five solutions in THF of AlCl3-LiAlH4 has been investigated using potential sweep and step techniques at Au microelectrodes.The ratios of AlCl3 to LiAlH4 range from 5:1 to 1:5 (total Al concentration always 1 mol dm-3).The nucleation overpotential, the exchange-current density and the maximum rate of Al deposition all depend on the solution composition and in extreme compositions the electroactive species can be different.A 1:1 solution appears to be a good choice for electroplating aluminium.The nucleation and growth of Al on Au from a 1:2 solution of AlCl3-LiAlH4 in THF has been studied in more detail.
Doi:10.1016/j.tetlet.2009.02.113
(2009)Doi:10.1016/0040-4020(72)80148-0
(1972)Doi:10.1021/ja01378a017
(1929)Doi:10.1021/jo01348a508
(1966)Doi:10.1039/c39820000566
(1982)Doi:10.1021/jo0712289
(2007)
