SELECTIVE MOLYBDENUM DEPOSITION BY LPCVD.

Article abstract of DOI:10.1149/1.2100820

Molybdenum films have been deposited by low pressure chemical vapor deposition (LPCVD) on silicon substrates by the reduction of molybdenum hexafluoride in hydrogen and argon atmospheres. The deposition is extremely selective, with no Mo observed on silic

Full text of DOI:10.1149/1.2100820

Downloaded on 2015-06-13 to IP 137.99.31.134 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-13 to IP 137.99.31.134 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-13 to IP 137.99.31.134 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-13 to IP 137.99.31.134 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-13 to IP 137.99.31.134 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-13 to IP 137.99.31.134 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-13 to IP 137.99.31.134 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).