Full text of DOI:10.1063/1.99921

Lowtemperature organometallic chemical vapor deposition of platinum
Yeajer Chen, Herbert D. Kaesz, Hareesh Thridandam, and Robert F. Hicks
Citation: Applied Physics Letters 53, 1591 (1988); doi: 10.1063/1.99921
View online: http://dx.doi.org/10.1063/1.99921
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/53/17?ver=pdfcov
Published by the AIP Publishing
Articles you may be interested in
A compact low-temperature single crystal adsorption calorimetry setup for measuring coverage dependent heats
of adsorption at cryogenic temperatures
Rev. Sci. Instrum. 85, 074101 (2014); 10.1063/1.4890435
Influence of process variables on electron beam chemical vapor deposition of platinum
J. Vac. Sci. Technol. B 23, 2151 (2005); 10.1116/1.2050672
Low-temperature ordering of FePt by formation of silicides in underlayers
J. Appl. Phys. 97, 10H310 (2005); 10.1063/1.1861415
Hydrogen beam stimulated lowtemperature dissociation of organometallics—application for lowering the growth
temperature in a metalorganic chemical vapor deposition process
Appl. Phys. Lett. 56, 2019 (1990); 10.1063/1.103004
Lowtemperature chemical vapor deposition of tungsten from tungsten hexacarbonyl
J. Vac. Sci. Technol. 20, 1336 (1982); 10.1116/1.571599
This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
129.24.51.181 On: Sat, 29 Nov 2014 21:15:21

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
29.24.51.181 On: Sat, 29 Nov 2014 21:15:21
1

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
29.24.51.181 On: Sat, 29 Nov 2014 21:15:21
1