Full text of DOI:10.1063/1.104783

Synchrotron radiation excited Si epitaxial growth using disilane gas source
molecular beam system
Junichi Takahashi, Yuichi Utsumi, Housei Akazawa, Izumi Kawashima, and Tsuneo Urisu
Citation: Applied Physics Letters 58, 2776 (1991); doi: 10.1063/1.104783
View online: http://dx.doi.org/10.1063/1.104783
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/58/24?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
140.254.87.149 On: Sat, 20 Dec 2014 16:58:21

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
140.254.87.149 On: Sat, 20 Dec 2014 16:58:21

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
140.254.87.149 On: Sat, 20 Dec 2014 16:58:21