Full text of DOI:10.1063/1.106864

Crystallizationinduced stress in silicon thin films
Hideo Miura, Hiroyuki Ohta, Noriaki Okamoto, and Toru Kaga
Citation: Applied Physics Letters 60, 2746 (1992); doi: 10.1063/1.106864
View online: http://dx.doi.org/10.1063/1.106864
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/60/22?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
137.195.150.201 On: Sun, 26 Oct 2014 08:48:09

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
137.195.150.201 On: Sun, 26 Oct 2014 08:48:09

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
137.195.150.201 On: Sun, 26 Oct 2014 08:48:09