Chemical vapor deposition of silver films for superconducting wire applications

Article abstract of DOI:10.1016/0925-8388(92)90439-G

Chemical vapor deposition (CVD) was used to deposit silver films for superconducting wire applications. AgI, silver trifluoroacetate (Ag(TFA)), and perfluoro-1-methylpropenylsilver (Ag(PF)) produced the most promising silver films. CVD processing was optimized on these three precursors using thermodynamic calculations performed using a modified version of the SOLGASMIX-PV computer program. Ag(PF) produced the highest quality silver films at low temperatures and pressures. A fiber tow which contained a silver barrier layer and a YBa₂Cu₃O_x overlayer was found to be a superconductor at 72 K.