Journal of the Electrochemical Society p. 2339 - 2345 (1987)
Update date:2022-08-16
Topics:
Wong
Kobayashi
Browning
Paine
Saraswat
The effects of thin (chemical) oxide grown during the chemical cleaning of silicon wafers on the silicon reduction of tungsten hexafluoride have been investigated. Unlike tungsten deposition on samples without the chemical oxide, deposition thickness on t
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