X.J. Wang et al. / Journal of Molecular Catalysis A: Chemical 278 (2007) 92–96
93
Cu-Ni/VSO [8], V2O /H3PO4 [9], ZrO2-CeO2 [11], BuSn
cursor of (Ni, V, O) semiconductor complex supported on SiO2
(Ni 2 wt%).
5
(
OMe)2 [14,15], metal(IV)tetra-alkoxide [16], magnesium
dialkoxide [17], potassium carbonate [18], ZrO2 [19], etc.
In recent decades semiconductor catalysts have drawn much
attention due to their photo-catalytic activity of initiating
redox reactions [20–23]. Both photo-catalytic (ꢀG < 0) and
photo-synthetic (ꢀG > 0) processes have widely introduced
the light-driven redox reactions with semiconductor catalysts
2.2.2. Copper modified catalyst
The above catalyst precursor was treated in its turn as fol-
lows: impregnated stoichiometrically into the solution of cupric
ammonia, aged in room temperature for 24 h, carried out the
surface reaction at 363 K for 24 h, dried at 383 K for 6 h and cal-
cined at 723 K in air for 5 h. Prior to use the product was reduced
under the atmosphere of by 5%H2/N2 mixture at 623 K for 2 h to
form the copper modified semiconductor complex catalyst (Cu
1 wt%).
[
24,25]. The photo-reduction of CO2 has long been investigated
in the past to produce formaldehyde, formic acid, methanol,
methane and oxalate, etc. with SrTiO3, TiO2 (pure or doped),
SiC, CdS, ZnO, WO3 and BaTiO3 semiconductor photocatalysts
[
20,23,24]. UV and visible light photoenergies have been used
to break the thermodynamic limitations of some thermodynami-
cally unfavorable reactions that have been proved to be effective,
like water splitting [20,23,24,26]. In this paper, we introduce a
copper doped (Ni, V, O) semiconductor complex as the catalyst
into photosynthesis of DMC from CO2 and methanol directly in
the continuous flow fixed-bed reactor to enhance the CO2 acti-
vation and DMC yield. Moreover, the continuous flow fixed-bed
reactor can remove the produced water and build a water-free
reaction system to favor the DMC formation.
2.3. Catalyst characterization
2.3.1. Temperature programmed reduction (TPR)
The semiconductor complex catalysts copper (Ni, V, O)
were reduced in the temperature programmed reduction mode
of Quantachrom ChemBET 3000 apparatus using a quartz U-
shaped reactor at temperature range from room temperature to
1073 K at a heating rate of 8 K/min, in 10%H2/Ar atmosphere.
The sample weight was 50 mg.
2
. Experimental
2.3.2. X-ray diffraction (XRD)
X-ray analysis was carried out on a D/Max-IIIA powder
◦
◦
2
.1. Materials
diffractometer in a step mode between 3 and 60 2θ using Cu
K␣1 radiation.
Vanadium pentoxide, hydrochloric acid, ammonia solution,
nickel nitrate, cupric nitrate and dried methanol with analytical
pure were purchased from commercial sources. Carbon dioxide
was supplied by Shanghai SGIG Co., China with purity higher
than 99.99%. Silica gel, commercially available from Qingdao
Ocean Chemical Factory, China, was in 100–200 mesh with a
2.3.3. Transmission electron microscopy (TEM)
The catalyst sample was examined by using transmission
electron microscopy (JEM-2010HR operated at 200 kV).
2.3.4. UV–vis spectra
2
specific surface area of 360 m /g.
UV–vis diffuse reflectance spectra were recorded by a spec-
trophotometer (UV-2501PC range from 190 to 900 nm) using
barium sulphate as reference sample.
2
.2. Catalyst preparation
2
.2.1. Catalyst precursor of (Ni, V, O) semiconductor
2.4. Direct synthesis of DMC with photo-assistance from
CH3OH and CO2
complex
V2O was added into HCl (38 wt%) at 363 K for 1 h to
5
form dark blue VOCl3 solution. Silica gel was pre-treated at
The title synthesis of DMC was carried out in the photo-
reactor as illustrated in Fig. 1. The setup comprised a
photo-reactor, a CO2 mass flow controller, a HLPC syringe
pump, a six-way valve, a back-pressure regulator and a gas
chromatography (GC). The six-way valve was placed into an
oven. The oven, heater and reactor were each equipped with a
thermometer, measured by thermocouples with an accuracy of
3
63 K for 2 h and the required liquid volume for stoichiometric
impregnation was measured. Silica gel was impregnated stoi-
chiometrically into VOCl3 solution, aged at room temperature
for 24 h and carried out the surface reaction at 363 K for another
2
4 h. Ammonia solution was added into the reaction system
to neutralize excessive acid at room temperature. The diluted
ammonia solution (1:10 vol.%) and distilled water was used to
◦
± 1 C. The system pressure was determined by pressure sensor
−
wash several times and get completely rid of the Cl ion retained
and controlled by the back-pressure regulator with an accuracy
of ± 0.01 MPa.
in the system, which was verified by 0.1 mol/L AgNO3 solution.
The mixture was filtered, dried at 383 K for 6 h and calcined at
During the experiment, the catalyst was first loaded into the
reactor and the reactor was sealed and purged using CO2 gas flow
for 10 min to exhaust the air inside. Prior heating up CO2 was
chargedintothereactortoacertainpressureandtheflowratewas
measured and controlled by the mass flow controller. When the
heater, reactor and oven were heated to the desired temperature,
the methanol was pumped into the system by the HPLC syringe
7
23 K in air for 5 h to produce the complex of V2O dispersed
5
on SiO2 (V2O 8.88 wt%). The complex was impregnated stoi-
5
chiometrically into the solution of nickel ammonia, aged in room
temperature for 24 h, and finally carried out the surface reaction
at 363 K for 24 h. The produced product was dried at 383 K for
6
h and calcined at 723 K in air for 5 h to yield the catalyst pre-