Tetrakis(trimethylsiloxy)silane

Base Information

• Chemical Name: Tetrakis(trimethylsiloxy)silane
• CAS No.: 3555-47-3
• Molecular Formula: C12H36O4Si5
• Molecular Weight: 384.843
• Hs Code.: 29319090
• European Community (EC) Number: 222-613-4
• UNII: 55L9T9A11I
• DSSTox Substance ID: DTXSID9042463
• Nikkaji Number: J129.389C
• Wikipedia: Tetrakis(trimethylsilyloxy)silane
• Wikidata: Q27261316
• Mol file: 3555-47-3.mol

Synonyms:3555-47-3;TETRAKIS(TRIMETHYLSILOXY)SILANE;Tetrakis(trimethylsilyl) orthosilicate;tetrakis(trimethylsilyl) silicate;Tetrakis(trimethylsilyloxy)silane;Trisiloxane, 1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)-;UNII-55L9T9A11I;55L9T9A11I;EINECS 222-613-4;Trisiloxane, 1,1,1,5,5,5-hexamethyl-3,3-bis((trimethylsilyl)oxy)-;Trisiloxane, 1,1,1,5,5,5-hexamethyl-3,3-bis[(trimethylsilyl)oxy]-;1,1,5,5,5-Hexamethyl-3,3-bis((trimethylsilyl)oxy)trisiloxane;1,1,5,5,5-hexamethyl-3,3-bis[(trimethylsilyl)oxy]trisiloxane;SCHEMBL28013;DTXSID9042463;TETRATRIMETHYLSILYL SILICATE;Tetrakis(trimethylsilyl)orthosilicate;MFCD00051587;AKOS025295217;FS-5542;Tetrakis(trimethylsilyloxy)silane, 97%;Tetrakis(trimethylsilyl) orthosilicate #;CS-0187690;T3494;D92706;SILICIC ACID, TETRAKIS(TRIMETHYLSILYL) ESTER;Q27261316;SILICIC ACID (H4SIO4), TETRAKIS(TRIMETHYLSILYL) ESTER;1,1,1,5,5,5-hexamethyl-3,3-bis-(trimethylsilanyloxy)-trisiloxane;SILANOL, TRIMETHYL-, TETRAESTER WITH SILICIC ACID (H4SIO4);Trisiloxane, 1,1,1,5,5,5-hexamethyl-3, 3-bis[(trimethylsilyl)oxy]-

Chemical Property of Tetrakis(trimethylsiloxy)silane

Chemical Property:

• Vapor Pressure: 0.00512mmHg at 25°C
• Melting Point: -60 °C
• Refractive Index: n20/D 1.389(lit.)
• Boiling Point: 284.4 °C at 760 mmHg
• Flash Point: 117.4 °C
• PSA: 36.92000
• Density: 0.893 g/cm³
• LogP: 4.82800
• Storage Temp.: Inert atmosphere,Room Temperature
• Water Solubility.: 150.7ng/L at 23℃
• Hydrogen Bond Donor Count: 0
• Hydrogen Bond Acceptor Count: 4
• Rotatable Bond Count: 8
• Exact Mass: 384.14599230
• Heavy Atom Count: 21
• Complexity: 266

Purity/Quality:

99.9% ^*data from raw suppliers

Tetrakis(trimethylsilyl) Orthosilicate >98.0%(GC) ^*data from reagent suppliers

Safty Information:

• Pictogram(s): Xi
• Hazard Codes: Xi
• Statements: 36/37/38
• Safety Statements: 26-36

MSDS Files:

SDS file from LookChem

Total 1 MSDS from other Authors

Useful:

• Chemical Classes: Metals -> Metalloid Compounds (Silicon)
• Canonical SMILES: C[Si](C)(C)O[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C
• Uses: Tetrakis(trimethylsilyloxy)silane (TTMS) is an organosilicon compound used as a precursor to prepare nanostructured organosilicon polymer films by plasma-enhanced chemical vapor deposition (PECVD) at atmospheric pressure. TTMS along with cyclohexane can also be used to synthesize low dielectric constant SiCOH films by PECVD method.

Technology Process of Tetrakis(trimethylsiloxy)silane

There total 53 articles about Tetrakis(trimethylsiloxy)silane which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 98.4%

chloro-trimethyl-silane (75-77-4) → 1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane (3555-47-3)

Guidance literature:

With tetrachlorosilane; trifluorormethanesulfonic acid; at -10 - 70 ℃; for 7h; Concentration; Reagent/catalyst;

Reference yield: 94.5%

tetramethylorthosilicate (681-84-5) + Hexamethyldisiloxane (107-46-0) → 1,1,1,5,5,5-hexamethyl-3-trimethylsiloxy-3-hydroxytrisiloxane (17477-97-3) + 1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane (3555-47-3) + 1,1,1,5,5,5-hexamethyl-3-trimethylsiloxy-3-methoxytrisiloxane (56120-91-3)

Guidance literature:

Hexamethyldisiloxane; With methanol; sulfuric acid; at 5 - 10 ℃; for 1h;

tetramethylorthosilicate; at 5 - 10 ℃; for 1.5h;

With sulfuric acid; water; more than 3 stages;

Reference yield: 93.0%

Trimethylsilanol (1066-40-6) + 2-methyl a l l y l t r i s-(trimethylsiloxy)silane (37611-52-2) → 1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane (3555-47-3)

Guidance literature:

With Amberlyst-15; In acetonitrile; at 20 ℃; for 1h; Solvent; chemoselective reaction;

DOI:10.1016/j.ica.2019.03.025

upstream raw materials:

pyridine

tetraethoxy orthosilicate

trimethylsilyl bromide

chloro-trimethyl-silane

Downstream raw materials:

trimethylsilyl fluoride

tris(trimethylsiloxy)difluoro(phenyl)silane

4-Chloro-2-nitroaniline

tetramethylsilane

Refernces

• 1、 Kuciński, Krzysztof,Hreczycho, Grzegorz. "O-Metalation of silanols and POSS silanols over Amberlyst-15 catalyst: A facile route to unsymmetrical siloxanes, borasiloxanes and germasiloxanes". . p. 261 - 266. Retrieved 2019/03/27.
• 2、 -. "A four (three-siloxy) silicon synthetic method (by machine translation)". Paragraph 0009; 0010; 0011; 0012; 00013; 0014; 0015-0022. . Retrieved 2018/03/28.