14965-52-7Relevant articles and documents
Laser induced dielectric breakdown for synthesis of chlorofluorosilanes
Ermakov, A. A.,Gornushkin, I. B.,Kornev, R. A.,Polyakov, V. S.,Sennikov, P. G.,Shkrunin, V. E.
, (2020/12/15)
Tetrafluorosilane (SF4) and tetrachlorosilane (SiCl4) plasmas have been widely used as a source of either F or Cl for etching silicon or as a source of silicon for deposition of Si-based materials. Using different combinations of F and Cl in molecules of chlorofluorosilane SiFxCly adds additional flexibility in realization of these processes. Direct synthesis of SiFxCl4-x (x = 1, 2, 3) from SiF4 and SiCl4 is thermodynamically forbidden under standard conditions. This restriction is removed in low-temperature plasmas studied in this work: a laser induced dielectric breakdown (LIDB) plasma and steady-state inductively-coupled plasma (ICP). The plasmas differ in many respects including energy content, temperature, and electron density that lead to different ionization/excitation states of plasma species, which are observed from plasma optical emission spectra. IR spectroscopy and mass-spectrometry confirm the formation of three chlorofluorosilanes, SiF3Cl, SiF2Cl2, and SiFCl3 that constitute ～60 % in products of LIDB plasma and split 50/50 between SiF3Cl, SiFCl3 and SiF2Cl2. Experimental observations are verified by equilibrium static calculations via the minimization of Gibbs free energy and by dynamic calculations via the chemical-hydrodynamic plasma model of a spherically expanding plasma plume. The both types of calculations qualitatively agree with the results of spectroscopic analysis and reproduce dominant presence of SiF2Cl2 as the temperature of the gas approaches the room temperature.
Conversion of alkyltrifluoroborates into alkyldichloroboranes with tetrachlorosilane in coordinating solvents
Kim, Byung Ju,Matteson, Donald S.
, p. 3056 - 3058 (2007/10/03)
Organotrifluoroborate salts are converted rapidly by tetrachlorosilane in nucleophilic solvents such as THF or acetonitrile into organodichloroboranes coordinated with the solvent (see scheme). This reaction completes a sequence from alkylboronic esters via the trifluoroborate salts to reactive alkyldichloroboranes under mild conditions.
Selective and sequential reduction of polyhalosilanes with alkyltin hydrides
D'Errico, John J.,Sharp, Kenneth G.
, p. 2177 - 2180 (2008/10/08)
The reactions between alkyltin hydrides and a variety of polyhalo- and mixed halosilanes have been investigated. For SiCl4 and SiCl3H, the reductions proceed in a stepwise manner to yield the monoreduced species as the major products. The reduction of SiBr4 occurs much faster to yield a mixture of SiBr3H and SiH4, or, in the vapor phase, SiBr3H as the sole product. SiF3X (X = Br, Cl) is converted into SiF3H, with no further reduction of SiF3H observed upon addition of a second equivalent of alkyltin hydride. SiF2HX compounds (X = Br, Cl) are obtained from SiF2X2 and are converted into SiF2H2 with excess Me3SnH. Redistribution becomes competitive with reduction in reactions between Me3SnH and SiFBr3, leading to mixtures of SiH4, SiF2H2, and SiF3H. The major products in the reaction between SiCl2Br2 and Me3SnH are SiCl3H and SiH4 (no SiCl2H2 was observed). Several probable intermediates were independently synthesized and allowed to react with Me3SnH. Together with deuterium labeling experiments, these reactions shed light on the mechanisms involved in these systems. In particular, the reactions appear not to proceed via free radicals.
