4098-98-0Relevant articles and documents
Gilman,Smith
, p. 1454 (1964)
Gilman,Smith
, p. 245,246,249 (1967)
TRIS(TRIMETHYLSILYL)SILYLLITHIUM *3 THF: A STABLE CRYSTALLINE SILYLLITHIUM REAGENT
Gutekunst, Gerhard,Brook, Adrian G.
, p. 1 - 4 (1982)
A synthesis of crystalline tris(trimethylsilyl)silyllithium * 3 THF is described.This stable compound can be used in hydrocarbon solvents to give improved yields of coupling products.
Tris(trimethylsilyl)silylboronate Esters: Novel Bulky, Air- and Moisture-Stable Silylboronate Ester Reagents for Boryl Substitution and Silaboration Reactions
Yamamoto, Eiji,Shishido, Ryosuke,Seki, Tomohiro,Ito, Hajime
supporting information, p. 3019 - 3022 (2017/09/05)
New, bulky tris(trimethylsilyl)silylboronate pinacol and hexylene glycol esters ((TMS)3Si-B(pin) and (TMS)3Si-B(hg)) were prepared in 46 and 61% yields, respectively, by the reaction of tris(trimethylsilyl)silylpotassium with the corresponding boron electrophiles. Notably, these silylboronate esters exhibited high stability to air and silica gel and were applied to the transition-metal-free boryl substitution of aryl halides, providing the desired borylated products in high yields with excellent B:Si ratios (up to 96% yield, B/Si = 99/1). These new silylboronate esters were also applied to a sequential borylation/cross-coupling process with various aryl halides, as well as the base-mediated silaboration of styrene.
Allylsilanes in "tin-free" oximation, alkenylation, and allylation of alkyl halides
Rouquet, Guy,Robert, Frederic,Mereau, Raphael,Castet, Frederic,Landais, Yannick
supporting information; experimental part, p. 13904 - 13911 (2012/01/15)
Tin-free oximation, vinylation, and allylation of alkyl halides have been developed by using allylsilanes as di-tin surrogates. Initiation of the radical process with a peroxide provides the silyl radical, which can abstract a halogen from the corresponding alkyl halide. The resulting carbon-centered radical then adds to various acceptors, including a sulfonyloxime, a vinylsulfone, and an allylsulfone, leading to formation of the desired products along with the corresponding allylsulfone resulting from the reaction of the PhSO2 radical with the allylsilane precursor. Better results were generally obtained with methallylsilane 1b than with 1a. This observation was rationalized by invoking the higher nucleophilicity of 1b and the faster β-fragmentation of the corresponding β-silyl radical intermediate. Calculation of the energy barrier for the β-fragmentation of a series of β-silyl radicals at the DFT level supported this hypothesis. Finally, a second version of these oximation and vinylation reactions, based on the utilization of 3-tris(trimethylsilyl)silylthiopropene, was devised, affording the desired oximes and olefins in reasonable yields. This strategy allowed the title reaction to be performed under milder conditions (AIBN, benzene, 80°C), as a result of the easier β-fragmentation of the C-S bond as compared with the C-Si bond.
