Welcome to LookChem.com Sign In|Join Free

CAS

  • or

2344-80-1

Post Buying Request

2344-80-1 Suppliers

Recommended suppliersmore

  • Product
  • FOB Price
  • Min.Order
  • Supply Ability
  • Supplier
  • Contact Supplier

2344-80-1 Usage

Chemical Properties

CLEAR COLOURLESS LIQUID

Uses

Different sources of media describe the Uses of 2344-80-1 differently. You can refer to the following data:
1. (Chloromethyl)trimethylsilane is used for Wittig reaction and building blocks.
2. (Chloromethyl)trimethylsilane can be treated with aldehydes or ketones in the presence of triphenylphosphine to synthesize terminal alkenes. It can also be used in the preparation of a reagent, trimethylsilylmethyl magnesium chloride, commonly used in Peterson methylenation.

Check Digit Verification of cas no

The CAS Registry Mumber 2344-80-1 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 2,3,4 and 4 respectively; the second part has 2 digits, 8 and 0 respectively.
Calculate Digit Verification of CAS Registry Number 2344-80:
(6*2)+(5*3)+(4*4)+(3*4)+(2*8)+(1*0)=71
71 % 10 = 1
So 2344-80-1 is a valid CAS Registry Number.
InChI:InChI=1/C4H11ClSi/c1-6(2,3)4-5/h4H2,1-3H3

2344-80-1 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
  • Price
  • Detail
  • TCI America

  • (C0862)  (Chloromethyl)trimethylsilane  >98.0%(GC)

  • 2344-80-1

  • 25mL

  • 195.00CNY

  • Detail
  • TCI America

  • (C0862)  (Chloromethyl)trimethylsilane  >98.0%(GC)

  • 2344-80-1

  • 100mL

  • 590.00CNY

  • Detail
  • TCI America

  • (C0862)  (Chloromethyl)trimethylsilane  >98.0%(GC)

  • 2344-80-1

  • 250mL

  • 1,180.00CNY

  • Detail
  • Alfa Aesar

  • (A14303)  (Chloromethyl)trimethylsilane, 98%   

  • 2344-80-1

  • 10g

  • 343.0CNY

  • Detail
  • Alfa Aesar

  • (A14303)  (Chloromethyl)trimethylsilane, 98%   

  • 2344-80-1

  • 50g

  • 1123.0CNY

  • Detail
  • Alfa Aesar

  • (A14303)  (Chloromethyl)trimethylsilane, 98%   

  • 2344-80-1

  • 250g

  • 5175.0CNY

  • Detail
  • Aldrich

  • (205354)  (Chloromethyl)trimethylsilane  98%

  • 2344-80-1

  • 205354-25ML

  • 881.01CNY

  • Detail
  • Aldrich

  • (205354)  (Chloromethyl)trimethylsilane  98%

  • 2344-80-1

  • 205354-100ML

  • 2,639.52CNY

  • Detail
  • Aldrich

  • (205354)  (Chloromethyl)trimethylsilane  98%

  • 2344-80-1

  • 205354-4X25ML

  • 2,769.39CNY

  • Detail
  • Aldrich

  • (18146)  (Chloromethyl)trimethylsilane  produced by Wacker Chemie AG, Burghausen, Germany

  • 2344-80-1

  • 18146-250G-F

  • 4,527.90CNY

  • Detail
  • Aldrich

  • (18146)  (Chloromethyl)trimethylsilane  produced by Wacker Chemie AG, Burghausen, Germany

  • 2344-80-1

  • 18146-1KG-F

  • 14,847.30CNY

  • Detail

2344-80-1SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 11, 2017

Revision Date: Aug 11, 2017

1.Identification

1.1 GHS Product identifier

Product name chloromethyl(trimethyl)silane

1.2 Other means of identification

Product number -
Other names (Trimethylsilyl)methyl chloride

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:2344-80-1 SDS

2344-80-1Synthetic route

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

dichloromethane
75-09-2

dichloromethane

A

bis(trimethylsilyl)methane
2117-28-4

bis(trimethylsilyl)methane

B

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
With N,N,N,N-tetraethylammonium tetrafluoroborate In tetrahydrofuran; N,N,N,N,N,N-hexamethylphosphoric triamide for 18.4167h; electroreduction, anode: Al, cathode: stainless steel;A 10%
B 90%
Chloro(chloromethyl)dimethylsilane
1719-57-9

Chloro(chloromethyl)dimethylsilane

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
With methylmagnesium bromide In not given90%
With CH3MgBr In not given90%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

dichloromethane
75-09-2

dichloromethane

A

bis(trimethylsilyl)methane
2117-28-4

bis(trimethylsilyl)methane

B

1,2-bis(trimethylsilyl)ethane
6231-76-1

1,2-bis(trimethylsilyl)ethane

C

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
With N,N,N,N-tetraethylammonium tetrafluoroborate In tetrahydrofuran; N,N,N,N,N,N-hexamethylphosphoric triamide for 33.5h; electroreduction, anode: Al, cathode: stainless steel;A 88%
B 6%
C 6%
tetramethylsilane
75-76-3

tetramethylsilane

chlorine
7782-50-5

chlorine

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
In neat (no solvent, gas phase) vapor phase chlorination at temp. of boiling benzene;;74%
In tetrachloromethane Irradiation (UV/VIS); introduction of gaseous Cl2 into a soln. of Si(CH3)4 in CCl4 under irradiation with sunlight in presence of some PCl5;;33%
Chloro(chloromethyl)dimethylsilane
1719-57-9

Chloro(chloromethyl)dimethylsilane

methylmagnesium bromide
75-16-1

methylmagnesium bromide

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
42%
With diethyl ether
tetramethylsilane
75-76-3

tetramethylsilane

Chloro(chloromethyl)dimethylsilane
1719-57-9

Chloro(chloromethyl)dimethylsilane

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
aluminium trichloride In tetrachloromethane for 6h; Heating; atmospheric pressure;33%
tetramethylsilane
75-76-3

tetramethylsilane

Chloro(chloromethyl)dimethylsilane
1719-57-9

Chloro(chloromethyl)dimethylsilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
aluminium trichloride In neat (no solvent) at 30 - 40℃; for 19h; Product distribution; atmospheric pressure; other time and solvents, different ratio of the starting materials;A n/a
B 32%
tetramethylsilane
75-76-3

tetramethylsilane

A

methanesulfonyl trimethylsilyl chloride
18143-34-5

methanesulfonyl trimethylsilyl chloride

B

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
With yttrium(III) chloride; sulfuryl dichloride for 8h; Irradiation;A 20%
B 20%
methyl magnesium iodide
917-64-6

methyl magnesium iodide

(chloromethyl)trichlorosilane
1558-25-4

(chloromethyl)trichlorosilane

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

methyl magnesium iodide
917-64-6

methyl magnesium iodide

(chloromethyl)trichlorosilane
1558-25-4

(chloromethyl)trichlorosilane

A

iodo(trimethylsilyl)methane
4206-67-1

iodo(trimethylsilyl)methane

B

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

diethyl ether
60-29-7

diethyl ether

Chloro(chloromethyl)dimethylsilane
1719-57-9

Chloro(chloromethyl)dimethylsilane

methylmagnesium chloride
676-58-4

methylmagnesium chloride

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

tetramethylsilane
75-76-3

tetramethylsilane

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
With tetrachloromethane; phosphorus pentachloride; chlorine unter Belichtung;
With tetrachloromethane; potassium carbonate; acetonitrile; bis(triphenylphosphine)platinum(II) dichloride at 120℃; for 16h;2.4 % Chromat.
(chloromethyl)trichlorosilane
1558-25-4

(chloromethyl)trichlorosilane

methylmagnesium bromide
75-16-1

methylmagnesium bromide

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

methyl magnesium iodide
917-64-6

methyl magnesium iodide

chloromethylmethyldichlorosilane
1558-33-4

chloromethylmethyldichlorosilane

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

chloromethyldimethylsilane
3144-74-9

chloromethyldimethylsilane

methyl magnesium iodide
917-64-6

methyl magnesium iodide

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

n-Butyl chloride
109-69-3

n-Butyl chloride

(bromomethyl)trimethylsilane
18243-41-9

(bromomethyl)trimethylsilane

A

1-bromo-butane
109-65-9

1-bromo-butane

B

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
With triisooctyl amine Equilibrium constant;
n-Butyl chloride
109-69-3

n-Butyl chloride

iodo(trimethylsilyl)methane
4206-67-1

iodo(trimethylsilyl)methane

A

1-iodo-butane
542-69-8

1-iodo-butane

B

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
With triisooctyl amine Equilibrium constant;
trichloromethyltrimethylsilane
5936-98-1

trichloromethyltrimethylsilane

Dilithium N,N'-bis(trimethylsilyl)hydrazide tetramer
15114-92-8, 33509-48-7, 53380-51-1

Dilithium N,N'-bis(trimethylsilyl)hydrazide tetramer

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

(dichloromethyl)trimethylsilane
5926-38-5

(dichloromethyl)trimethylsilane

C

N,N'-bis(trimethylsilyl)hydrazine
692-56-8

N,N'-bis(trimethylsilyl)hydrazine

D

tris(trimethylsilyl)hydrazine
13272-02-1

tris(trimethylsilyl)hydrazine

E

1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

F

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
In diethyl ether at -78℃; Product distribution; var.: reagent;
tetrachloromethane
56-23-5

tetrachloromethane

tetramethylsilane
75-76-3

tetramethylsilane

phosphorus pentachloride
10026-13-8, 874483-75-7

phosphorus pentachloride

chlorine
7782-50-5

chlorine

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

bis(chloromethyl)dimethylsilane
2917-46-6

bis(chloromethyl)dimethylsilane

A

tetramethylsilane
75-76-3

tetramethylsilane

B

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
With Zn In ethanol; water react. of (CH3)2Si(CH2Cl)2 and Zn powder in aq. ethanol in presence of NaI and Na2CO3;;
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

chlorobromomethane
74-97-5

chlorobromomethane

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
With n-butyllithium In tetrahydrofuran; hexane at -78℃;
(dichloromethyl)trimethylsilane
5926-38-5

(dichloromethyl)trimethylsilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

tetramethylsilane
75-76-3

tetramethylsilane

C

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
With hydrogen at 200℃; under 760.051 Torr; for 1h; Kinetics; Flow reactor;
With hydrogen at 200℃; under 760.051 Torr; for 1h; Kinetics; Flow reactor;
(dichloromethyl)trimethylsilane
5926-38-5

(dichloromethyl)trimethylsilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

Conditions
ConditionsYield
With hydrogen at 200℃; under 760.051 Torr; for 1h; Kinetics; Flow reactor;
benzylamine
100-46-9

benzylamine

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

N-benzyl-1-(trimethylsilyl)-N-((trimethylsilyl)methyl)methanamine
144964-17-0

N-benzyl-1-(trimethylsilyl)-N-((trimethylsilyl)methyl)methanamine

Conditions
ConditionsYield
With potassium carbonate In acetonitrile Heating;100%
With potassium carbonate In acetonitrile for 68h; Heating;76%
4,6,6-trimethyl-5,6,7,7a-tetrahydro-1,3-benzodioxol-5-one

4,6,6-trimethyl-5,6,7,7a-tetrahydro-1,3-benzodioxol-5-one

trimethylsilylmethyllithium
1822-00-0

trimethylsilylmethyllithium

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

lithium hydride
7580-67-8

lithium hydride

4,6,6-trimethyl-5,6,7,7a-tetrahydro-5-trimethylsilylmethyl-1,3-benzodioxol-5-ol

4,6,6-trimethyl-5,6,7,7a-tetrahydro-5-trimethylsilylmethyl-1,3-benzodioxol-5-ol

Conditions
ConditionsYield
In tetrahydrofuran; water; pentane100%
3-fluorosalicylaldehyde
394-50-3

3-fluorosalicylaldehyde

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

3-fluoro-2-((trimethylsilyl)methoxy)benzaldehyde
1346529-53-0

3-fluoro-2-((trimethylsilyl)methoxy)benzaldehyde

Conditions
ConditionsYield
With potassium carbonate; sodium iodide In N,N-dimethyl-formamide at 65℃; for 12h; Inert atmosphere;100%
With potassium carbonate; sodium iodide In N,N-dimethyl-formamide at 65℃;98%
With potassium carbonate; sodium iodide In N,N-dimethyl-formamide at 65℃;
furfural
98-01-1

furfural

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

1-(2'-furyl)-2-trimethylsilanylethan-1-ol
1578-26-3

1-(2'-furyl)-2-trimethylsilanylethan-1-ol

Conditions
ConditionsYield
Stage #1: Chloromethyltrimethylsilane With magnesium In diethyl ether at 20℃; for 1h;
Stage #2: furfural In diethyl ether at 0 - 20℃; for 1h;
99%
With magnesium In diethyl ether at 0 - 20℃; for 12h; Grignard reaction;90%
Stage #1: Chloromethyltrimethylsilane With magnesium In diethyl ether for 1h; Grignard reaction; Heating;
Stage #2: furfural In diethyl ether at 0 - 20℃; for 12h; Addition; Further stages.;
90%
Stage #1: Chloromethyltrimethylsilane With magnesium In diethyl ether for 1h; Heating;
Stage #2: furfural In diethyl ether for 12h; Grignard reaction; Further stages.;
90%
Stage #1: Chloromethyltrimethylsilane With 1,1-Dibromoethane; magnesium In diethyl ether for 18h; Heating;
Stage #2: furfural In diethyl ether at 0 - 23℃; for 18h; Grignard reaction;
2-Mercaptopyridine
2637-34-5

2-Mercaptopyridine

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

2-(trimethylsilylmethylmercapto)pyridine
151668-58-5

2-(trimethylsilylmethylmercapto)pyridine

Conditions
ConditionsYield
With potassium carbonate; potassium iodide In ethanol for 1h; Heating;98%
thiophene-2-carbaldehyde
98-03-3

thiophene-2-carbaldehyde

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

1-(2-thienyl)-2-(trimethylsilyl)ethanol

1-(2-thienyl)-2-(trimethylsilyl)ethanol

Conditions
ConditionsYield
Stage #1: Chloromethyltrimethylsilane With magnesium In diethyl ether at 20℃; for 1h;
Stage #2: thiophene-2-carbaldehyde In diethyl ether at 0 - 20℃; for 1h;
98%
Stage #1: Chloromethyltrimethylsilane With magnesium; ethylene dibromide In diethyl ether for 1h; Heating;
Stage #2: thiophene-2-carbaldehyde In diethyl ether at 0 - 20℃; for 21h;
94%
2-bromo-4,5-dichloro-1 H-imidazole
16076-27-0

2-bromo-4,5-dichloro-1 H-imidazole

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

2-bromo-4,5-dichloro-1-[(trimethylsilyl)methyl]-1H-imidazole

2-bromo-4,5-dichloro-1-[(trimethylsilyl)methyl]-1H-imidazole

Conditions
ConditionsYield
With potassium hexamethylsilazane In N,N-dimethyl acetamide at 0 - 100℃; for 4h;98%
Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

trimethylsilylmethyl azide
87576-94-1

trimethylsilylmethyl azide

Conditions
ConditionsYield
With sodium azide In N,N-dimethyl-formamide at 80℃; for 44h;97%
With N,N,N,N,N,N-hexamethylphosphoric triamide; sodium azide at 80℃; for 12h;95%
With sodium azide In N,N-dimethyl-formamide at 80℃; for 40h; Inert atmosphere;85%
1,8-diazabicyclo[5.4.0]undec-7-ene
6674-22-2

1,8-diazabicyclo[5.4.0]undec-7-ene

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

1-(methyl trimethylsilane)-1,8-diazobicyclo[5.4.0]undec-7-ene chloride

1-(methyl trimethylsilane)-1,8-diazobicyclo[5.4.0]undec-7-ene chloride

Conditions
ConditionsYield
In neat (no solvent) at 70℃; for 2h; Inert atmosphere;97%
In N,N-dimethyl-formamide at 100℃; for 20h;95%
(+)-(S)-1-Phenyl-3,4,5,6-tetrahydro[1,2]thiazin-1-oxide
210552-40-2

(+)-(S)-1-Phenyl-3,4,5,6-tetrahydro[1,2]thiazin-1-oxide

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

(+)-(1S,6S)-6-(trimethylsilyl)methyl-1-phenyl-3,4,5,6-tetrahydro-1λ4-1,2-thiazine 1-oxide
1305338-61-7

(+)-(1S,6S)-6-(trimethylsilyl)methyl-1-phenyl-3,4,5,6-tetrahydro-1λ4-1,2-thiazine 1-oxide

Conditions
ConditionsYield
Stage #1: (+)-(S)-1-Phenyl-3,4,5,6-tetrahydro[1,2]thiazin-1-oxide With n-butyllithium In tetrahydrofuran; hexane at -50 - 20℃;
Stage #2: Chloromethyltrimethylsilane In tetrahydrofuran; hexane at -78 - 20℃; for 18h; optical yield given as %de; diastereoselective reaction;
97%
Chloro(chloromethyl)dimethylsilane
1719-57-9

Chloro(chloromethyl)dimethylsilane

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

chloromethyl(dimethyl)(trimethylsilylmethyl)silane
18306-73-5

chloromethyl(dimethyl)(trimethylsilylmethyl)silane

Conditions
ConditionsYield
Stage #1: Chloromethyltrimethylsilane With magnesium; ethylene dibromide In tetrahydrofuran for 2h; Schlenk technique; Inert atmosphere; Reflux;
Stage #2: Chloro(chloromethyl)dimethylsilane In tetrahydrofuran for 20h; Reflux; Schlenk technique; Inert atmosphere;
97%
tert-butylamine
75-64-9

tert-butylamine

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

N-tert-butyl<(trimethylsilyl)metyl>amine
79250-80-9

N-tert-butyl<(trimethylsilyl)metyl>amine

Conditions
ConditionsYield
Stage #1: tert-butylamine; Chloromethyltrimethylsilane at 200℃; for 18h;
Stage #2: With sodium hydroxide In water
96%
at 200℃; for 18h; Product distribution / selectivity; Heating / reflux;96%
Stage #1: tert-butylamine; Chloromethyltrimethylsilane at 200℃; for 18h;
Stage #2: With sodium hydroxide In water at 20℃; for 1h; Product distribution / selectivity;
96%
methyltris(trimethylsilyl)silane
2003-86-3

methyltris(trimethylsilyl)silane

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

2-[(trimethylsilyl)methyl]heptamethyltrisilane
1314534-53-6

2-[(trimethylsilyl)methyl]heptamethyltrisilane

Conditions
ConditionsYield
With potassium tert-butylate In tetrahydrofuran Inert atmosphere;96%
Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

1,4-bis(trimethylsilyl)dodecamethylbicyclo[2.2.2]octasilane
79769-61-2

1,4-bis(trimethylsilyl)dodecamethylbicyclo[2.2.2]octasilane

1-(trimethylsilyl)-4-[(trimethylsilyl)methyl]dodecamethylbicyclo[2.2.2]octasilane
1314534-75-2

1-(trimethylsilyl)-4-[(trimethylsilyl)methyl]dodecamethylbicyclo[2.2.2]octasilane

Conditions
ConditionsYield
Stage #1: 1,4-bis(trimethylsilyl)dodecamethylbicyclo[2.2.2]octasilane With potassium tert-butylate In tetrahydrofuran Inert atmosphere;
Stage #2: Chloromethyltrimethylsilane In tetrahydrofuran at 20℃; for 16.1667h; Cooling with ice; Inert atmosphere;
96%
thiophenol
108-98-5

thiophenol

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

(phenylsulfanylmethyl)trimethylsilane
17873-08-4

(phenylsulfanylmethyl)trimethylsilane

Conditions
ConditionsYield
With sodium hydroxide In ethanol; water for 4h; Heating;95%
benzylamine
100-46-9

benzylamine

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

N-(trimethylsilylmethyl)benzylamine
53215-95-5

N-(trimethylsilylmethyl)benzylamine

Conditions
ConditionsYield
In dimethyl sulfoxide Heating;95%
at 20 - 120℃; for 24h;93.3%
In acetonitrile for 16h; Reflux; Inert atmosphere;93%
p-Chlorothiophenol
106-54-7

p-Chlorothiophenol

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

<(4-chlorophenylthio)methyl>trimethylsilane
112474-70-1

<(4-chlorophenylthio)methyl>trimethylsilane

Conditions
ConditionsYield
With sodium hydroxide In ethanol; water for 4h; Heating;95%
Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

1,1,1-trichloro-3,3-dimethyl-1,3-disilabutane
16538-62-8

1,1,1-trichloro-3,3-dimethyl-1,3-disilabutane

Conditions
ConditionsYield
With trichlorosilane; tetra-n-butylphosphonium chloride at 150℃; for 4h;95%
With trichlorosilane; benzyltriphenylphosphonium chloride72%
With trichlorosilane; benzyltriphenylphosphonium chloride72%
With tetrachlorosilane; magnesium; methyl iodide 1.) THF, reflux, 0.5 h, 2.) THF, 80 deg C, 4 h; Yield given. Multistep reaction;
2-mercaptobenzimidazole sodium salt
15091-69-7, 26585-65-9

2-mercaptobenzimidazole sodium salt

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

2-Trimethylsilanylmethylsulfanyl-1H-benzoimidazole

2-Trimethylsilanylmethylsulfanyl-1H-benzoimidazole

Conditions
ConditionsYield
In benzene for 4h; Heating;95%
(R)-1-phenyl-ethyl-amine
3886-69-9

(R)-1-phenyl-ethyl-amine

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

(R)-(+)-N-1-phenylethyl-N-trimethylsilylmethylamine
104942-85-0

(R)-(+)-N-1-phenylethyl-N-trimethylsilylmethylamine

Conditions
ConditionsYield
In dimethyl sulfoxide at 90℃; for 18h;95%
Heating;84%
With potassium carbonate In acetonitrile for 4h; Heating;81%
furan-3-carboxaldehyde
498-60-2

furan-3-carboxaldehyde

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

1-furan-3-yl-2-trimethylsilanyl-ethanol

1-furan-3-yl-2-trimethylsilanyl-ethanol

Conditions
ConditionsYield
Stage #1: Chloromethyltrimethylsilane With magnesium In diethyl ether Heating;
Stage #2: furan-3-carboxaldehyde In diethyl ether at 0 - 20℃; for 12h; Further stages.;
95%
Stage #1: Chloromethyltrimethylsilane With 1,1-Dibromoethane; magnesium In diethyl ether for 19h; Heating;
Stage #2: furan-3-carboxaldehyde In diethyl ether at 0 - 23℃; for 18h; Grignard reaction;
1-methyl-4-((phenylsulfonyl)methyl)benzene
19523-24-1

1-methyl-4-((phenylsulfonyl)methyl)benzene

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

(2-benzenesulfonyl-2-p-tolyl-ethyl)-trimethyl-silane

(2-benzenesulfonyl-2-p-tolyl-ethyl)-trimethyl-silane

Conditions
ConditionsYield
With lithium methylsulfinyl carbanion at 20℃; for 2h; Product distribution; Further Variations:; Reagents; Temperatures;95%
Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

1-cyclopropyl-5,9-dimethyl-deca-4,8-dien-1-one
714230-48-5

1-cyclopropyl-5,9-dimethyl-deca-4,8-dien-1-one

(E)-2-Cyclopropyl-6,10-dimethyl-1-trimethylsilanyl-undeca-5,9-dien-2-ol
714230-49-6

(E)-2-Cyclopropyl-6,10-dimethyl-1-trimethylsilanyl-undeca-5,9-dien-2-ol

Conditions
ConditionsYield
Stage #1: Chloromethyltrimethylsilane With magnesium In diethyl ether
Stage #2: With cerium(III) chloride In tetrahydrofuran; diethyl ether at 0℃;
Stage #3: 1-cyclopropyl-5,9-dimethyl-deca-4,8-dien-1-one In tetrahydrofuran; diethyl ether at 0 - 20℃;
95%
lithium
7439-93-2

lithium

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

trimethylsilylmethyllithium
1822-00-0

trimethylsilylmethyllithium

Conditions
ConditionsYield
In pentane95%
In pentane95%
In pentane at 40℃; for 16h; Argon gasification;80%
ethyl cinnamate
4192-77-2

ethyl cinnamate

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

trimethyl[(3E)-2-methylene-4-phenylbut-3-en-1-yl]silane
80814-92-2, 117747-08-7

trimethyl[(3E)-2-methylene-4-phenylbut-3-en-1-yl]silane

Conditions
ConditionsYield
Stage #1: Chloromethyltrimethylsilane With magnesium In tetrahydrofuran at 20℃; for 3h;
Stage #2: ethyl cinnamate With cerium(III) chloride In tetrahydrofuran at -78 - 20℃;
Stage #3: With silica gel In dichloromethane at 20℃; for 3h; Further stages.;
95%
tributyltin chloride
1461-22-9

tributyltin chloride

magnesium
7439-95-4

magnesium

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

(trimethylsilyl)(tributylstannyl)methane
77425-85-5

(trimethylsilyl)(tributylstannyl)methane

Conditions
ConditionsYield
With iodine; ammonium chloride In diethyl ether N2-atmosphere; addn. of Me3SiCH2Cl to Mg (activated with I2), refluxing(1 h), addn. of Bu3SnCl, refluxing (18 h); addn. of satd. aq. NH4Cl, extn. of aq. layer (ether), washing of org. layer (satd. aq. NaCl), drying (Na2SO4), evapn. of ether, distn. (vac.);95%
2-chloro-1-(2,4-dichlorophenyl)ethanone
51336-94-8

2-chloro-1-(2,4-dichlorophenyl)ethanone

(trimethylsilyl)methylmagnesium chloride
13170-43-9

(trimethylsilyl)methylmagnesium chloride

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

1-(1-chloromethylethenyl)-2,4-difluorobenzene
156570-10-4

1-(1-chloromethylethenyl)-2,4-difluorobenzene

Conditions
ConditionsYield
Stage #1: (trimethylsilyl)methylmagnesium chloride; Chloromethyltrimethylsilane With magnesium In tert-butyl methyl ether at 55℃; for 4h;
Stage #2: 2-chloro-1-(2,4-dichlorophenyl)ethanone In tert-butyl methyl ether at -10 - 0℃;
Stage #3: With sulfuric acid In tert-butyl methyl ether at 25 - 50℃; for 3h;
95%
(S)-1-phenyl-ethylamine
2627-86-3

(S)-1-phenyl-ethylamine

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

N-(S)-α-methylbenzyl-N-((trimethylsilyl)methyl)amine
135782-16-0

N-(S)-α-methylbenzyl-N-((trimethylsilyl)methyl)amine

Conditions
ConditionsYield
In neat (no solvent) at 200℃; for 3h; Sealed tube;94%
With triethylamine for 16h; Reflux; Inert atmosphere;76%
With potassium carbonate In acetonitrile for 4h; Heating;75%
(Z)-3-bromo-4-trimethylsilyl-3-buten-2-one
1257841-93-2

(Z)-3-bromo-4-trimethylsilyl-3-buten-2-one

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

(Z)-2-bromo-3-methyl-1-trimethylsilyl-1,3-butadiene
1257841-99-8

(Z)-2-bromo-3-methyl-1-trimethylsilyl-1,3-butadiene

Conditions
ConditionsYield
Stage #1: Chloromethyltrimethylsilane With magnesium; ethylene dibromide In diethyl ether for 1h; Inert atmosphere; Reflux;
Stage #2: (Z)-3-bromo-4-trimethylsilyl-3-buten-2-one In diethyl ether at 0℃; Peterson olefination; Inert atmosphere;
Stage #3: With water; acetic acid at 50℃; for 6h; Peterson olefination; Inert atmosphere;
94%
[tris(trimethylsilyl)silyl]potassium

[tris(trimethylsilyl)silyl]potassium

Chloromethyltrimethylsilane
2344-80-1

Chloromethyltrimethylsilane

2-(trimethylsilyl)-2-[(trimethylsilyl)methyl]hexamethyltrisilane
1253730-05-0

2-(trimethylsilyl)-2-[(trimethylsilyl)methyl]hexamethyltrisilane

Conditions
ConditionsYield
In benzene at 0℃; for 2h;94%

2344-80-1Relevant articles and documents

Energetic Sila-Nitrocarbamates: Silicon Analogues of Neo-Pentane Derivatives

Axthammer, Quirin J.,Klap?tke, Thomas M.,Krumm, Burkhard,Reith, Thomas

, p. 4683 - 4692 (2016)

Four silanes based on the neo-pentane skeleton Me4-xSi(CH2R)x containing carbamate groups (x = 1-4, R = OC(O)NH2) have been prepared via the corresponding alcohols Me4-xSi(CH2OH)x, starting from the chlorosilanes Me4-xSiClx. Subsequent nitration leads to the corresponding primary nitrocarbamates (R = OC(O)NHNO2), examined for the purpose as potential energetic materials, including the silicon analogue of pentaerythritol tetranitrocarbamate (sila-PETNC) and a siloxane based nitrocarbamate side-product. All compounds were thoroughly characterized by spectroscopic methods including X-ray diffraction. Thermal stabilities and sensitivities toward impact and friction were examined, as well as detonation values by calculating energies of formation using the EXPLO5 V6.02 software.

Preparative catalytic chlorination of adamantane, cyclohexane, and hexane in the system tetrachloromethane-MX2(PPh3)2 (MX2 = PdBr2, PtCl2)-acetonitrile-potassium carbonate

Vedernikov,Sayakhov,Zazybin,Solomonov

, p. 812 - 815 (2007/10/03)

Heating of saturated hydrocarbons RH (cyclohexane, adamantane, and hexane) with tetrachloromethane in the presence of acetonitrile, potassium carbonate, and catalytic amounts of dihalide triphenylphosphine complexes of palladium(II) or platinum(II), MX2(PPh)2 (MX2 = PdBr2, PtCi2), for 6-8 h at 120°C yields monochlorinated derivatives of the respective hydrocarbons in 30-55% yield. Benzene, toluene, ethylbenzene, and tetramethylsilane show low reactivity under the conditions adopted for the reaction. Relative reactivity of various bond types C-H of alkanes is in agreement with the well known sequence: tertiary > secondary > primary. A scheme is proposed assuming trichloromethyl radicals as active species, and the catalyst function consists in activating C-C1 bond of the tetrachloromethane.

The synthesis of -substituted dialkyldichlorosilanes and their conversion into polysiloxanes

Ducker, Graham E.,Tipping, Anthony E.

, p. 253 - 262 (2007/10/02)

Attack of the oxyl (CF3)2NO. (1) on an ethyl group of the silane Et2SiCl2 occurs at both the α- and β-positions relative to silicon (ratio 31:45), whereas with the silane PrnSiMeCl2 attack takes place at the β-position of the propyl group.With the disilane Me3SiCH2SiMe3, the mojor silicon-containing products formed from treatment with oxyl 1 are Me3SiF, (CF3)2NOSiMe3 and Me3SiSiMe3.Speier-catalysed (H2PtCl6) addition of the silane HSiCl2X (X = Me and Cl) to the alkene (CF3)2NOCH2CH=CH2 gives the adducts (CF3)2NOCH2CH2CH2SiCl2X (29, X = Me) and (28, X = Cl)in high yield.The substituted dichlorosilanes (CF3)2NOCH2CH2SiEtCl2 (9), (CF3)2NOCHMeCH2SiMeCl2 (14) and (CF3)2NOCH2CH2CH2SiMeCl2 (29) are converted into corresponding polysiloxanes ("prepolymers" of low molecular weight) by reaction with reagents including water, acid, base and metal oxides; equilibration of the polysiloxane "prepolymer" 38, derived from dichlorosilane 29 by heating with powdered KOH, affords a solid rubbery polysiloxane.

Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1

What can I do for you?
Get Best Price

Get Best Price for 2344-80-1