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TRIMETHOXYCHLOROSILANEDISC 05/06/04 is a colorless, flammable, and highly reactive chemical compound used in the manufacturing of silicones and silanes. It is commonly used as a coupling agent, adhesion promoter, and surface modifier in various industrial applications due to its ability to bond to both organic and inorganic surfaces.

4668-00-2

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4668-00-2 Usage

Uses

Used in Adhesives and Sealants Industry:
TRIMETHOXYCHLOROSILANEDISC 05/06/04 is used as a coupling agent and adhesion promoter for enhancing the bonding strength between different materials, such as organic and inorganic surfaces, in the production of adhesives and sealants.
Used in Coatings Industry:
TRIMETHOXYCHLOROSILANEDISC 05/06/04 is used as a surface modifier in the production of coatings to improve their adhesion, durability, and resistance to environmental factors.
Used in Manufacturing of Silicones and Silanes:
TRIMETHOXYCHLOROSILANEDISC 05/06/04 is a key chemical compound in the manufacturing process of silicones and silanes, which are widely used in various industries, including electronics, automotive, aerospace, and construction.
Safety Precautions:
Due to its highly corrosive nature, TRIMETHOXYCHLOROSILANEDISC 05/06/04 can cause severe skin and eye irritation, as well as respiratory issues if inhaled. Therefore, proper handling and safety precautions, such as wearing protective gear and working in well-ventilated areas, are necessary when working with this chemical compound.

Check Digit Verification of cas no

The CAS Registry Mumber 4668-00-2 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 4,6,6 and 8 respectively; the second part has 2 digits, 0 and 0 respectively.
Calculate Digit Verification of CAS Registry Number 4668-00:
(6*4)+(5*6)+(4*6)+(3*8)+(2*0)+(1*0)=102
102 % 10 = 2
So 4668-00-2 is a valid CAS Registry Number.
InChI:InChI=1/C3H9ClO3Si/c1-5-8(4,6-2)7-3/h1-3H3

4668-00-2Synthetic route

tetramethylorthosilicate
681-84-5

tetramethylorthosilicate

acetyl chloride
75-36-5

acetyl chloride

A

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

B

acetic acid methyl ester
79-20-9

acetic acid methyl ester

Conditions
ConditionsYield
With aluminium trichloride for 2h; Heating;A 90%
B n/a
tetramethylorthosilicate
681-84-5

tetramethylorthosilicate

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

A

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

B

phenyl trimethylsiloxane
2996-92-1

phenyl trimethylsiloxane

C

chloro(dimethoxy)phenylsilane
18246-06-5

chloro(dimethoxy)phenylsilane

D

phenylmethoxydichlorosilane
50971-88-5

phenylmethoxydichlorosilane

Conditions
ConditionsYield
at 20 - 22℃; for 70h;A 8.51 g
B 0.2%
C 89%
D 10%
at 20 - 22℃; for 70h;A 8.51 g
B 0.01 g
C 5.41 g
D 0.62 g
tert-butyl methyl ether
1634-04-4

tert-butyl methyl ether

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

Conditions
ConditionsYield
With bismuth(III) chloride; tetrachlorosilane at 20℃; for 17h; Inert atmosphere;73.1%
isothiocyanato-trimethoxy-silane
18250-91-4

isothiocyanato-trimethoxy-silane

Dichlorophenylphosphine
644-97-3

Dichlorophenylphosphine

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

Conditions
ConditionsYield
73%
disulfur dichloride
10025-67-9

disulfur dichloride

isothiocyanato-trimethoxy-silane
18250-91-4

isothiocyanato-trimethoxy-silane

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

Conditions
ConditionsYield
50%
methanol
67-56-1

methanol

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

Conditions
ConditionsYield
With tetrachlorosilane
With tetrachlorosilane
With pyridine; tetrachlorosilane In diethyl ether
With tetrachlorosilane for 0.5h; Inert atmosphere;
tetramethylorthosilicate
681-84-5

tetramethylorthosilicate

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

Conditions
ConditionsYield
With tetrachlorosilane at 150℃;
With hydrogenchloride at -85℃; for 0.3h; Catalytic behavior; Temperature; Time;
With aluminum (III) chloride; acetyl chloride for 3h; Inert atmosphere; Reflux;
trimethoxysilane
2487-90-3

trimethoxysilane

3-chloroprop-1-ene
107-05-1

3-chloroprop-1-ene

A

bis(trimethoxysilyl)propane

bis(trimethoxysilyl)propane

B

3-chloropropyltrichlorosilane
253586-30-0

3-chloropropyltrichlorosilane

C

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

D

tetramethylorthosilicate
681-84-5

tetramethylorthosilicate

E

1-Chloropropane
540-54-5

1-Chloropropane

F

n-propyltrimethoxysilane
1067-25-0

n-propyltrimethoxysilane

G

3-Chloropropyltrimethoxysilan
2530-87-2

3-Chloropropyltrimethoxysilan

Conditions
ConditionsYield
With toluene; ruthenium trichloride In methanol at 20 - 83℃; for 2h; Product distribution / selectivity;
[ruthenium(II)(η6-1-methyl-4-isopropyl-benzene)(chloride)(μ-chloride)]2 In dichloromethane at 20 - 83℃; for 2h; Product distribution / selectivity;
ruthenium trichloride In methanol at 75 - 169℃; for 18h; Product distribution / selectivity; Continuous operation;
trimethoxysilane
2487-90-3

trimethoxysilane

3-Chloro-2-methylpropene
563-47-3

3-Chloro-2-methylpropene

A

3-chloroisobutylchlorodimethoxysilane
754992-03-5

3-chloroisobutylchlorodimethoxysilane

B

bis(trimethoxysilyl)isobutane

bis(trimethoxysilyl)isobutane

C

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

D

tetramethylorthosilicate
681-84-5

tetramethylorthosilicate

E

isobutyltrimethoxysilane
18395-30-7

isobutyltrimethoxysilane

F

3-chloro-2-methylpropyltrimethoxysilane
17256-27-8

3-chloro-2-methylpropyltrimethoxysilane

G

isobutyryl chloride
513-36-0

isobutyryl chloride

Conditions
ConditionsYield
ruthenium trichloride In methanol at 20 - 83℃; for 2h; Product distribution / selectivity;
With 1,1'-(1,2-ethanediyl)bisbenzene; ruthenium trichloride In methanol at 20 - 83℃; for 2h; Product distribution / selectivity;
Stage #1: trimethoxysilane With 1,1'-(1,2-ethanediyl)bisbenzene; ruthenium trichloride In methanol at 20 - 80℃; Heating / reflux;
Stage #2: 3-Chloro-2-methylpropene at 78 - 83℃; for 2h;
Stage #1: trimethoxysilane; ruthenium trichloride In methanol at 20 - 80℃; Heating / reflux;
Stage #2: 3-Chloro-2-methylpropene at 78 - 83℃; for 2h;
trimethoxysilane
2487-90-3

trimethoxysilane

3-chloroprop-1-ene
107-05-1

3-chloroprop-1-ene

A

3-chloropropyltrichlorosilane
253586-30-0

3-chloropropyltrichlorosilane

B

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C

tetramethylorthosilicate
681-84-5

tetramethylorthosilicate

D

1-Chloropropane
540-54-5

1-Chloropropane

E

n-propyltrimethoxysilane
1067-25-0

n-propyltrimethoxysilane

F

3-Chloropropyltrimethoxysilan
2530-87-2

3-Chloropropyltrimethoxysilan

Conditions
ConditionsYield
With toluene; ruthenium trichloride In methanol at 20 - 83℃; for 2h; Product distribution / selectivity;
Stage #1: trimethoxysilane; ruthenium trichloride In methanol; toluene at 20 - 80℃; Heating / reflux;
Stage #2: 3-chloroprop-1-ene at 78 - 83℃; for 2h;
methanol
67-56-1

methanol

A

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

B

tetramethylorthosilicate
681-84-5

tetramethylorthosilicate

Conditions
ConditionsYield
With tetrachlorosilane for 0.333333h;
With tetrachlorosilane Inert atmosphere; Schlenk technique;
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

Conditions
ConditionsYield
With CH3OH In diethyl ether
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

tetramethylorthosilicate
681-84-5

tetramethylorthosilicate

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

Conditions
ConditionsYield
at 150°C;;
methanol
67-56-1

methanol

A

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

B

tetramethylorthosilicate
681-84-5

tetramethylorthosilicate

C

methoxytrichlorosilane
1825-97-4

methoxytrichlorosilane

D

dichlorodimethoxysilane
18544-45-1

dichlorodimethoxysilane

Conditions
ConditionsYield
With tetrachlorosilane
tetramethylorthosilicate
681-84-5

tetramethylorthosilicate

A

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

B

methoxytrichlorosilane
1825-97-4

methoxytrichlorosilane

C

dichlorodimethoxysilane
18544-45-1

dichlorodimethoxysilane

Conditions
ConditionsYield
With aluminum (III) chloride; tetrachlorosilane
With thionyl chloride; N,N-dimethyl-formamide at 20℃; for 0.5h; Catalytic behavior; Reagent/catalyst; Time;
With thionyl chloride; N-butylamine at 20℃; for 48h; Catalytic behavior; Reagent/catalyst; Time;
With thionyl chloride; N-butylamine at 20℃; under 760.051 Torr; for 48h; Reagent/catalyst; Time; Concentration; Temperature;
tert-butyl methyl ether
1634-04-4

tert-butyl methyl ether

A

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

B

tetramethylorthosilicate
681-84-5

tetramethylorthosilicate

Conditions
ConditionsYield
With bismuth(III) chloride; tetrachlorosilane at 0 - 20℃; Neat (no solvent); Inert atmosphere;A Ca. 80 %Spectr.
B Ca. 20 %Spectr.
tetramethylorthosilicate
681-84-5

tetramethylorthosilicate

A

chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

B

dichlorodimethoxysilane
18544-45-1

dichlorodimethoxysilane

Conditions
ConditionsYield
With thionyl chloride; triethylamine at 20℃; for 2h; Catalytic behavior; Reagent/catalyst; Time;
With thionyl chloride; benzene at 20℃; for 48h; Catalytic behavior; Reagent/catalyst; Time;
With thionyl chloride; triethylamine at 20℃; under 760.051 Torr; for 2h; Reagent/catalyst; Time; Temperature; Concentration;
With thionyl chloride; benzene at 20℃; under 760.051 Torr; for 48h; Reagent/catalyst; Time; Concentration; Temperature;
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

(R)-6,6'-dibromo-2,2'-bis(methoxyethoxymethyloxy)-1,1'-binaphthyl

(R)-6,6'-dibromo-2,2'-bis(methoxyethoxymethyloxy)-1,1'-binaphthyl

(R)-6,6'-bis(trimethoxysilyl)-2,2'-di(methoxyethoxymethyloxy)-1,1'-binaphthyl

(R)-6,6'-bis(trimethoxysilyl)-2,2'-di(methoxyethoxymethyloxy)-1,1'-binaphthyl

Conditions
ConditionsYield
With n-butyllithium In tetrahydrofuran; hexane at -80 - 20℃; for 2.5h;99%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C24H46N2O5(2+)*2Cl(1-)

C24H46N2O5(2+)*2Cl(1-)

C27H54N2O8Si(2+)*2Cl(1-)

C27H54N2O8Si(2+)*2Cl(1-)

Conditions
ConditionsYield
With hydrogenchloride In dichloromethane; water at 20℃; for 6h;98.5%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

trimethoxysilylamine
21692-64-8

trimethoxysilylamine

Conditions
ConditionsYield
With sodium amide In tetrahydrofuran at 0℃; for 6h;97%
With sodium amide In tetrahydrofuran at 0℃; for 6h;97%
With ammonia; dimethylsilicon dichloride In benzene
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C24H47N3O4(2+)*2Cl(1-)

C24H47N3O4(2+)*2Cl(1-)

C27H56N4O6Si(2+)*2Cl(1-)

C27H56N4O6Si(2+)*2Cl(1-)

Conditions
ConditionsYield
With hydrogenchloride In chloroform; water at 20℃; for 6h;95.1%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C37H76N2O5(2+)*2Cl(1-)

C37H76N2O5(2+)*2Cl(1-)

C40H84N2O8Si(2+)*2Cl(1-)

C40H84N2O8Si(2+)*2Cl(1-)

Conditions
ConditionsYield
With hydrogenchloride In dichloromethane; water at 20℃; for 18h;92.5%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C31H66N4O3(2+)*2Cl(1-)

C31H66N4O3(2+)*2Cl(1-)

C34H74N4O6Si(2+)*2Cl(1-)

C34H74N4O6Si(2+)*2Cl(1-)

Conditions
ConditionsYield
With hydrogenchloride In chloroform; water at 20℃; for 18h;91.2%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

trimethoxysilyl azide

trimethoxysilyl azide

Conditions
ConditionsYield
With sodium azide In acetonitrile at 0℃; for 6h;91%
With sodium azide In acetonitrile at 0℃; for 6h;91%
With lithium azide In tetrahydrofuran for 24h; Ambient temperature;
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C34H71N3O4(2+)*2Cl(1-)

C34H71N3O4(2+)*2Cl(1-)

C37H79N3O7Si(2+)*2Cl(1-)

C37H79N3O7Si(2+)*2Cl(1-)

Conditions
ConditionsYield
With hydrogenchloride In dichloromethane; water at 20℃; for 20h;89.6%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

trimethoxysilyl hydrazine

trimethoxysilyl hydrazine

Conditions
ConditionsYield
With pyridine; hydrazine In dichloromethane at 0℃; for 8h;89%
With pyridine; hydrazine In dichloromethane at 0℃; for 8h;89%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C34H70N2O5(2+)*2Cl(1-)

C34H70N2O5(2+)*2Cl(1-)

C37H78N2O8Si(2+)*2Cl(1-)

C37H78N2O8Si(2+)*2Cl(1-)

Conditions
ConditionsYield
With hydrogenchloride In dichloromethane; water at 20℃; for 20h;87.5%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C27H53N3O4(2+)*2Cl(1-)

C27H53N3O4(2+)*2Cl(1-)

C30H61N3O7Si(2+)*2Cl(1-)

C30H61N3O7Si(2+)*2Cl(1-)

Conditions
ConditionsYield
With hydrogenchloride In dichloromethane; water at 20℃; for 16h;87.5%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C27H52N2O5(2+)*2Cl(1-)

C27H52N2O5(2+)*2Cl(1-)

C30H60N2O8Si(2+)*2Cl(1-)

C30H60N2O8Si(2+)*2Cl(1-)

Conditions
ConditionsYield
With hydrogenchloride In dichloromethane; water at 20℃; for 8h;85.3%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C27H54N4O3(2+)*2Cl(1-)

C27H54N4O3(2+)*2Cl(1-)

C30H62N4O6Si(2+)*2Cl(1-)

C30H62N4O6Si(2+)*2Cl(1-)

Conditions
ConditionsYield
With hydrogenchloride In dichloromethane; water at 20℃; for 8h;84.6%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

trimethylsilyl acetate
2754-27-0

trimethylsilyl acetate

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

(acetoxy)tri(methoxy)silane
13170-06-4

(acetoxy)tri(methoxy)silane

Conditions
ConditionsYield
at 20℃; for 8h;A n/a
B 82%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C34H72N4O3(2+)*2Cl(1-)

C34H72N4O3(2+)*2Cl(1-)

C37H80N4O6Si(2+)*2Cl(1-)

C37H80N4O6Si(2+)*2Cl(1-)

Conditions
ConditionsYield
With hydrogenchloride In chloroform; water at 20℃; for 20h;81.7%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C34H71N3O4(2+)*2Cl(1-)

C34H71N3O4(2+)*2Cl(1-)

C37H79N3O7Si(2+)*2Cl(1-)

C37H79N3O7Si(2+)*2Cl(1-)

Conditions
ConditionsYield
With hydrogenchloride In chloroform; water at 20℃; for 20h;79.8%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C37H77N3O4(2+)*2Cl(1-)

C37H77N3O4(2+)*2Cl(1-)

C40H85N3O7Si(2+)*2Cl(1-)

C40H85N3O7Si(2+)*2Cl(1-)

Conditions
ConditionsYield
With hydrogenchloride In dichloromethane; water at 20℃; for 6h;78.6%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

7-(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)-1,1,3,3,5,5,7,7-octamethyltetrasiloxane-1-ol

7-(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)-1,1,3,3,5,5,7,7-octamethyltetrasiloxane-1-ol

9-(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)-3,3,5,5,7,7,9,9-octamethyl-1,1,1-trimethoxypentasiloxane

9-(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)-3,3,5,5,7,7,9,9-octamethyl-1,1,1-trimethoxypentasiloxane

Conditions
ConditionsYield
With pyridine In diethyl ether at 25℃; for 2.16667h; Inert atmosphere;78.2%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

C37H78N4O3(2+)*2Cl(1-)

C37H78N4O3(2+)*2Cl(1-)

C40H86N4O6Si(2+)*2Cl(1-)

C40H86N4O6Si(2+)*2Cl(1-)

Conditions
ConditionsYield
With hydrogenchloride In chloroform; water at 20℃; for 18h;75.5%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

5-(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)-1,1,3,3,5,5-hexamethyltrisiloxane-1-ol

5-(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)-1,1,3,3,5,5-hexamethyltrisiloxane-1-ol

7-(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)-3,3,5,5,7,7-hexamethyl-1,1,1-trimethoxypentasiloxane

7-(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)-3,3,5,5,7,7-hexamethyl-1,1,1-trimethoxypentasiloxane

Conditions
ConditionsYield
With pyridine In diethyl ether at 25℃; for 2.08333h; Inert atmosphere;75.2%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

trimethylsilyl butyrate
16844-99-8

trimethylsilyl butyrate

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

trimethoxy(butanoyloxy)silane
122278-75-5

trimethoxy(butanoyloxy)silane

Conditions
ConditionsYield
at 20℃; for 8h;A n/a
B 74%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

2,2-dimethyl-3-pentanone
564-04-5

2,2-dimethyl-3-pentanone

tert-Butyl ethyl ketone trimethoxysilyl enol ether
332041-61-9

tert-Butyl ethyl ketone trimethoxysilyl enol ether

Conditions
ConditionsYield
Stage #1: 2,2-dimethyl-3-pentanone With lithium diisopropyl amide In tetrahydrofuran; hexane at -78℃;
Stage #2: chlorotrimethoxysilane In tetrahydrofuran; hexane for 0.5h;
74%
Stage #1: 2,2-dimethyl-3-pentanone With lithium diisopropyl amide In diethyl ether
Stage #2: chlorotrimethoxysilane In diethyl ether
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

[Me2P=N]5
52193-19-8

[Me2P=N]5

C40H110N5O30P5Si10

C40H110N5O30P5Si10

Conditions
ConditionsYield
With n-butyllithium In tetrahydrofuran; n-heptane -78 deg C to r.t.;72%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

[Me2P=N]5
52193-19-8

[Me2P=N]5

C25H70N5O15P5Si5

C25H70N5O15P5Si5

Conditions
ConditionsYield
With n-butyllithium In tetrahydrofuran; n-heptane 1) -78 deg C to r.t., 2) r.t., 12 h;72%
chlorotrimethoxysilane
4668-00-2

chlorotrimethoxysilane

5-(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)-1,1,3,3 5,5-hexamethyltrisiloxane-1-ol

5-(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)-1,1,3,3 5,5-hexamethyltrisiloxane-1-ol

7-(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)-3,3,5,5,7,7-hexamethyl-1,1,1-trimethoxypentasiloxane

7-(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)-3,3,5,5,7,7-hexamethyl-1,1,1-trimethoxypentasiloxane

Conditions
ConditionsYield
With pyridine In diethyl ether at 25℃; for 3.33333h; Inert atmosphere;71.9%

4668-00-2Relevant academic research and scientific papers

Stable silanetriols that contain tert-alkoxy groups: Versatile precursors of siloxane-based nanomaterials

Suzuki, Jumpei,Shimojima, Atsushi,Fujimoto, Yasuhiro,Kuroda, Kazuyuki

, p. 973 - 980 (2008)

Novel tert-alkoxysilanetriols (ROSi(OH)3, R = adamantyl and 3-ethyl-3-pentyl) have been prepared from the corresponding tert- alkoxytrichlorosilanes and successfully used as molecular building blocks to produce ordered siloxane-based nanomateri

Hierarchically porous monolithic silica with varying porosity using bis(trimethoxysilyl)arenes as precursors

Von Der Lehr, Martin,Ellinghaus, Rüdiger,Smarsly, Bernd M.

, p. 4455 - 4463 (2016)

The ortho-, meta- and para-isomers of bis(trimethoxysilyl)benzene and bis((trimethoxysilyl)phenyl)dimethoxysilane were synthesized from their corresponding diarylbromides. Mixtures of these bis(trimethoxysilyl)arenes and tetramethoxysilane (TMOS) were used as organosilica precursors for the preparation of macro-mesoporous silica monoliths using different amounts of the porogen poly(ethylene glycol) to investigate the effect on the porosity of the final materials. The prepared samples were characterized by nitrogen and dibromomethane sorption measurements, mercury intrusion porosimetry and scanning electron microscopy. The analysis of dibromomethane isotherms indicated a significantly lower polarity of the mesopore surface compared to that of pure SiO2 monoliths, proving the presence of arene units at the mesopore surfaces.

Molecularly designed nanoparticles by dispersion of self-assembled organosiloxane-based mesophases

Sakamoto, Shigeru,Tamura, Yasuhiro,Hata, Hideo,Shimojima, Atsushi,Kuroda, Kazuyuki,Sakamoto, Yasuhiro

, p. 9173 - 9177,5 (2014)

The design of siloxane-based nanoparticles is important for many applications. Here we show a novel approach to form core-shell silica nanoparticles of a few nanometers in size through the principle of dispersion of ordered mesostructures into single nanocomponents . Self-assembled siloxane-organic hybrids derived from amphiphilic alkyl-oligosiloxanes were postsynthetically dispersed in organic solvent to yield uniform nanoparticles consisting of dense lipophilic shells and hydrophilic siloxane cores. Insitu encapsulation of fluorescent dyes into the nanoparticles demonstrated their ability to function as nanocarriers. Self-assembled hybrid nanoparticles: A new type of oligosiloxane precursor self-assembles into reverse-micellar mesostructures, which can be transformed to nanoparticles with a siloxane core and an organic shell by dispersion in nonpolar organic solvents.

ORGANOMETALLIC COMPOUND AND METHOD

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Page/Page column 9; 10, (2017/09/05)

A class of organometallic compounds is provided. The compounds correspond in structure to Formula 1 (A)x-M-(OR3)4-x wherein: A is selected from the group consisting of -NR1R2, -N(R4)(CH2)nN(R5R6), -N=C(NR4R5)(NR6R7), OCOR1, halo and Y; R1 and R2 are independently selected from the group consisting of H and a cyclic or acyclic alkyl group having from 1 to 8 carbon atoms, with the proviso that at least one of R1 and R2 must be other than H; R4, R5, R6 and R7 are independently selected from the group consisting of H and an acyclic alkyl group having from 1 to 4 carbon atoms; Y is selected from the group consisting of a 3- to 13-membered heterocyclic radical containing at least one nitrogen atom; R3 is a cyclic or acyclic alkyl group having from 1 to 6 carbon atoms; M is selected from the group consisting of Si, Ge, Sn, Ti, Zr and Hf; x is an integer from 1 to 3; and n is an integer from 1 to 4. Compounds of the invention may be useful as precursors in chemical phase deposition processes such as atomic layer deposition (ALD), chemical vapour deposition (CVD), plasma assisted ALD and plasma assisted CVD. Methods of low temperature vapour phase deposition of metal oxide films, such as SiO2 films, are also provided.

FLUORINE-CONTAINING SILOXANE COMPOUND, METHOD FOR PRODUCING THE SAME, COATING AGENT COMPRISING THE SAME, AND SURFACE TREATMENT METHOD FOR GLASS BASE MATERIAL

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Paragraph 0067-0069, (2017/09/21)

PROBLEM TO BE SOLVED: To provide a fluorine-containing siloxane compound that can impart water repellent and antifouling properties to the surface of a base material, and allows distillation purification and can be produced conveniently, and provide a coating agent comprising the same. SOLUTION: The present invention provides a fluorine-containing siloxane compound produced by making a dihydroxy siloxane compound react with a fluoroalkyl-substituted silane compound, then a silane compound having a reactive group, and a coating agent comprising the fluorine-containing siloxane compound and a liquid medium. SELECTED DRAWING: None COPYRIGHT: (C)2017,JPOandINPIT

ALTERNATIVE METHODS FOR THE SYNTHESIS OF ORGANOSILICON COMPOUND

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Paragraph 0077-0082, (2013/09/26)

A method of forming chloro-substituted silanes from the reaction of an alkoxysilane with a chlorinating agent in the optional presence of a catalyst is provided. More specifically, chloro-substituted silanes, including but not limited to silicon tetrachloride, are formed by reacting a chlorinating agent, such as thionyl chloride, with an alkylalkoxysilane having the formula (R'0)4-xSiRx, where R and R' are independently selected alkyl groups comprising one or more carbon atoms and x is 0, 1, 2, or 3. The catalyst may be dimethylformamide, (chloromethylene)dimethyliminium chloride, or triethylamine, among others. The chloro- substituted silane formed in the reaction along with several by-products has the formula (RO)4-x-ySiRxCly; where x is 0, 1, 2, or 3 and y is 1, 2, 3, or 4. One of the by-products of the reaction is an alkyl chloride.

Alternative methods for the synthesis of organosilicon compounds

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Paragraph 0029; 0059-0061, (2013/09/26)

A method of forming chloro-substituted silanes from the reaction of an alkoxy-or acetoxy-substituted silane with a chlorinating agent in the optional presence of a catalyst is provided. For instance, chloro-substituted silanes, including but not limited to silicon tetrachloride, are formed by reacting a chlorinating agent, such as thionyl chloride, with an alkoxysilane having the formula (R'O)4-xSiRx, where R and R' are independently selected alkyl groups comprising one or more carbon atoms and x is 0, 1, 2, or 3. The catalyst may be dimethylformamide, (chloromethylene)dimethyliminium chloride, or triethylamine, among others. The chloro-substituted silane formed in the reaction along with several by-products has the formula (R'O)4-x-ySiRxCly; where x is 0, 1, 2, or 3 and y is 1, 2, 3, or 4. One of the by-products of the reaction is an alkyl chloride.

METHOD OF PRODUCING A HYDROLYZABLE SILICON-CONTAINING COMPOUND

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Page/Page column 17; 20, (2012/07/14)

The present invention provides a safe, inexpensive, and high yield means of producing a hydrolyzable silicon-containing compound, e.g., an organooxysilane and the like. A compound (A) represented by the general formula R1-O-R2 wherein R1 represents a C4-30, substituted or unsubstituted, tertiary alkyl group or aralkyl group and R2 represents a C1-30, substituted or unsubstituted, monovalent hydrocarbyl group or acyl group, is reacted in the presence of a Lewis acid catalyst with a halosilane (B) represented by the general formula R3mSiX4-m wherein R3 represents the hydrogen atom or a C1-30 substituted or unsubstituted monovalent hydrocarbyl group, X is independently bromine or chlorine, and m represents an integer from 0 to 3.

Practical conversion of chlorosilanes into alkoxysilanes without generating HCl

Wakabayashi, Ryutaro,Sugiura, Yasushi,Shibue, Toshimichi,Kuroda, Kazuyuki

supporting information; experimental part, p. 10708 - 10711 (2011/12/05)

Alcohol-free: A versatile, efficient, and practical synthesis of alkoxysilanes without generation of HCl involves the reaction of chlorosilanes with unsymmetrical ethers in the presence of a Lewis acid (see scheme). The reaction proceeds through selective cleavage of C-O bonds and is superior to conventional processes. Industrially feasible reagents are used and only one by-product results. Copyright

Formation of organo-inorganic hybrid networks in the system consisting of Tris(2,2-bipyridine)ruthenium complexes and silica

Zdravkov,Aleksandrova,Aseev,Nikonorov,Khimich

scheme or table, p. 1532 - 1537 (2009/05/06)

Organo-inorganic composites consisting of mutually linked ruthenium complexes with organic ligands and an inorganic SiO2 network were synthesized by the sol-gel method. The luminescence and photosensitive properties of the resulting compounds w

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