Effect of acid structure on deprotection of poly(2-trimethylsilyl-2-propyl methacrylate)

Add time:09/09/2019    Source:sciencedirect.com

Deprotection of poly(2-trimethylsilyl-2-propyl methacrylate) was studied for various photogenerated acids. Deprotection of 2-trimethylsilyl-2-propyl (TMSP) ester did not occur in a catalytic manner when the photogenerated acid possessing a fluoride ion source such as SbF6− or AsF6− was used. Because the cleaved product, α-methyl-α-(trimethylsilyl)ethyl cation, undergoes rearrangement through methyl migration from silicon to carbon with nucleophilic attack on the silicon by the fluoride ion, the acid was consumed in the reaction. Fortunately, when the counterion of the acid does not provide a fluoride ion, e.g. sulfonate, the carbonium ion undergoes elimination to produce 2,2,3-trimethyl-2-silabut-3-ene, and regenerates another acid. The thermal stability of TMSP ester was very similar to t-butyl ester, and acid catalyzed cleavage of the TMSP begins at 80°C.

We also recommend Trading Suppliers and Manufacturers of TRIMETHYLSILYL METHACRYLATE (cas 13688-56-7). Pls Click Website Link as below: cas 13688-56-7 suppliers

Prev:Studies on laser action from polymeric matrices based on TRIMETHYLSILYL METHACRYLATE (cas 13688-56-7) doped with pyrromethene 567 dye
Next:Syntheses of bis- and tetra(trimethylsilyl) substituted lanthanocene methyl complexes and their catalyses for polymerizations of methyl methacrylate, ε-caprolactone and l-lactide)