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Detail of > 75-76-3

  • MSDS Download
  • CAS Number:
  • 75-76-3
  • Name:
  • Silane, tetramethyl-

  • Superlist Name:
  • Tetramethylsilane
  • Formula:
  • C4H12Si
  • Molecular Structure:
  • Synonyms:
  • NSC 5210;T2050;TMS (silane derivative);Tetramethylsilane;
  • Molecular Weight:
  • 88.22
  • EINECS:
  • 200-899-1
  • Density:
  • 0.677 g/cm3
  • Melting Point:
  • -27 °C
  • Boiling Point:
  • 26.8 °C at 760 mmHg
  • Solubility:
  • Soluble in methanol, diethyl ether.Insoluble in cold water.
  • Appearance:
  • Colorless clear liquid
  • Hazard Symbols:
  • HighlyF+
  • Risk Codes:
  • 12
  • Safety:
  • 16-33-9Details
  • Transport Information:
  • UN 2749
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CAS No. 

75-76-3 TetramethylsilaneCompetitive Product

Tetramethylsilane
China (Mainland)   1074
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CAS No. 

75-76-3 Tetramethylsilane

English name: Tetramethylsilane CAS number: 75-76-3 Formula: C4H12Si Molecular weight: 88.22 EINECS number: 200-899-1
China (Mainland)   2472
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CAS No. 

75-76-3 Tetramethylsilane

TETRAMETHYLSILANE
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75-76-3 Tetramethylsilane

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75-76-3 Tetramethylsilane

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75-76-3 Tetramethylsilane

China (Mainland)   2070
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CAS No. 

75-76-3 Tetramethylsilane

English name: Tetramethylsilane CAS number: 75-76-3 Formula: C4H12Si Molecular weight: 88.22 EINECS number: 200-899-1
China (Mainland)   2414
  • Tel:86-311-67697318/86-311-67697368
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75-76-3 Tetramethylsilane

China (Mainland)   1262
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CAS No. 

75-76-3 Tetramethylsilane

Items A-Grade B-Grade Appearance(APHA) 20 max. 50 max. Purity(GC, %) 98.0 min. 80 min. Ion chloride(ppm) 10max. 1000 max.
China (Mainland)   8
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CAS No. 

75-76-3 Tetramethylsilane

Molecular formula:Si(CH3)4 CAS:75-76-3 Properties:Colorless, transparent liqued. Technical specifications: Content of Dimethyl dimethoxy silicane:99.0 Boiling point:26.5
China (Mainland)   4
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75-76-3 Tetramethylsilane

Tetramethylsilane
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CAS No. 

75-76-3 Tetramethylsilane

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75-76-3 Tetramethylsilane

China (Mainland)  
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75-76-3 Tetramethylsilane

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75-76-3 Tetramethylsilane

China (Mainland)   70
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CAS No. 

75-76-3 Tetramethylsilane

United States   10
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  • Address:Avantor Performance Materials
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    Reference

    Role of unsaturated groups in glow discharge polymerization
    Role of unsaturated groups in glow discharge polymerization. Inagaki, N.; Yamazaki, H. (Fac. Eng., Shizuoka Univ., Hamamatsu 432, Japan). J. Appl. Polym. Sci., 29(4), 1369-79 (English) 1984. CODEN: JAPNAB. ISSN: 0021-8995. DOCUMENT TYPE: Journal CA Section: 35 (Chemistry of Synthetic High Polymers) Elemental anal., IR spectroscopy, and ESCA were used to investigate the glow-discharge polymn. of Me4Si [75-76-3], trimethylvinylsilane [754-05-2], and ethynyltrimethylsilane [1066-54-2]. Glow-discharge conditions and degree of unsatn. of starting materials strongly affected the polymer deposition rate and the elemental compn. of the polymers. The C1s and the Si2p spectra showed that the chem. compn. of these polymers was distinguished by either presence or absence of unsatd. groups in the starting compds., rather than the kind of unsatd.In this experiment, several chemicals are used like 30553-41-4 and 1066-54-2 groups. Regarding the monomers contg. double and triple bonds, polymer formation proceeded not only through these unsatd. bonds but also through cleavage between Si and C atoms. .
    The standard molar enthalpies of formation of organosilicon compounds and related bond dissociation enthalpies
    The standard molar enthalpies of formation of organosilicon compounds and related bond dissociation enthalpies. II. Tetramethylsilane. Steele, W. V. (Dep. Chem., Univ. Stirling, Stirling FK9 4LA, UK). J. Chem. Thermodyn., 15(6), 595-601 (English) 1983. CODEN: JCTDAF. ISSN: 0021-9614. DOCUMENT TYPE: Journal CA Section: 69 (Thermodynamics, Thermochemistry, and Thermal Properties) The std. molar heat of combustion of Me4Si [75-76-3] was measured by usingan O aneroid rotating-bomb calorimeter with poly(vinylidene fluoride) to promote the combustion and form a well defined final soln. of fluorosilicic acid in excess HF. The std. heat of formation, DfHm°(Me4Si, 1) = -257.9 kJ/mol, was detd. The corresponding gas-phase std. heat of formation, DfHm°(Me4Si, g) = -233.2 kJ/mol was combined with the kinetic data from the literature to obtain bond dissocn. enthalpies and the std. heat of formation of the trimethylsilyl radical.

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