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BIS(TRICHLOROSILYL)METHANE, with the chemical formula (Cl3Si)2CH2, is a colorless, odorless liquid that is highly flammable and reactive. It is a versatile chemical compound primarily used as a precursor in the production of silicon-containing materials and as an intermediate in the synthesis of other organosilicon compounds and organic chemistry reactions.

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  • 4142-85-2 Structure
  • Basic information

    1. Product Name: BIS(TRICHLOROSILYL)METHANE
    2. Synonyms: 1,1,1,3,3,3-hexachloro-1,3-disilapropane;bis-trichlorosilanyl-methane;BIS(TRICHLOROSILYL)METHANE
    3. CAS NO:4142-85-2
    4. Molecular Formula: CH2Cl6Si2
    5. Molecular Weight: 282.92
    6. EINECS: N/A
    7. Product Categories: Self Assembly&Contact Printing;Self-Assembly Materials;Silane Coupling Agents/Adhesion Promoters;SilanesSelf Assembly&Contact Printing;Trichlorosilanes
    8. Mol File: 4142-85-2.mol
  • Chemical Properties

    1. Melting Point: N/A
    2. Boiling Point: 179-180 °C(lit.)
    3. Flash Point: >221 °F
    4. Appearance: /
    5. Density: 1.545 g/mL at 25 °C(lit.)
    6. Vapor Pressure: 6.25mmHg at 25°C
    7. Refractive Index: n20/D 1.468(lit.)
    8. Storage Temp.: N/A
    9. Solubility: N/A
    10. CAS DataBase Reference: BIS(TRICHLOROSILYL)METHANE(CAS DataBase Reference)
    11. NIST Chemistry Reference: BIS(TRICHLOROSILYL)METHANE(4142-85-2)
    12. EPA Substance Registry System: BIS(TRICHLOROSILYL)METHANE(4142-85-2)
  • Safety Data

    1. Hazard Codes: C
    2. Statements: 14/15-34
    3. Safety Statements: 26-36/37/39-43-45-7/8
    4. RIDADR: UN 3094 8/PG 2
    5. WGK Germany: 3
    6. RTECS:
    7. TSCA: No
    8. HazardClass: N/A
    9. PackingGroup: N/A
    10. Hazardous Substances Data: 4142-85-2(Hazardous Substances Data)

4142-85-2 Usage

Uses

Used in Silicon-Containing Material Production:
BIS(TRICHLOROSILYL)METHANE is used as a precursor for the production of various silicon-containing materials, such as silicone rubber, resins, and coatings. Its reactivity allows for the formation of these materials with desired properties, making it an essential component in the manufacturing process.
Used in Organosilicon Compound Synthesis:
BIS(TRICHLOROSILYL)METHANE serves as an intermediate in the synthesis of other organosilicon compounds. Its unique structure and reactivity enable the creation of a wide range of organosilicon compounds with diverse applications in various industries.
Used in Organic Chemistry Reactions:
As a reagent in organic chemistry, BIS(TRICHLOROSILYL)METHANE is utilized in various reactions to facilitate the formation of desired products. Its reactivity and ability to form stable intermediates make it a valuable tool in the synthesis of complex organic molecules.
Used in Chemical Research and Development:
Due to its unique properties and reactivity, BIS(TRICHLOROSILYL)METHANE is also used in chemical research and development to explore new reactions, syntheses, and applications. Its potential in creating novel materials and compounds makes it an important compound in the field of chemical research.
Safety Precautions:
Given its reactivity and potential hazards, BIS(TRICHLOROSILYL)METHANE should be handled with caution and in accordance with proper safety protocols and regulations. This includes using appropriate personal protective equipment, working in well-ventilated areas, and following established guidelines for handling and storage of reactive chemicals.

Check Digit Verification of cas no

The CAS Registry Mumber 4142-85-2 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 4,1,4 and 2 respectively; the second part has 2 digits, 8 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 4142-85:
(6*4)+(5*1)+(4*4)+(3*2)+(2*8)+(1*5)=72
72 % 10 = 2
So 4142-85-2 is a valid CAS Registry Number.
InChI:InChI=1/CH2Cl6Si2/c2-8(3,4)1-9(5,6)7/h1H2

4142-85-2 Well-known Company Product Price

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  • Aldrich

  • (568198)  Bis(trichlorosilyl)methane  97%

  • 4142-85-2

  • 568198-5G

  • 2,441.79CNY

  • Detail

4142-85-2SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 13, 2017

Revision Date: Aug 13, 2017

1.Identification

1.1 GHS Product identifier

Product name trichloro(trichlorosilylmethyl)silane

1.2 Other means of identification

Product number -
Other names Silane,1,1'-methylenebis[1,1,1-trichloro

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:4142-85-2 SDS

4142-85-2Synthetic route

tris(trichlorosilyl)methane
4775-56-8

tris(trichlorosilyl)methane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With hydrogenchloride; tetrabutyl phosphine chloride In dodecane at 20℃; for 1h;87%
1,2-Dichloroethylene
540-59-0

1,2-Dichloroethylene

A

dichloromethane
75-09-2

dichloromethane

B

1,2-bis(trichlorosilyl)ethane
2504-64-5

1,2-bis(trichlorosilyl)ethane

C

1,2-bis(trichlorosilyl)ethene
692-52-4

1,2-bis(trichlorosilyl)ethene

D

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With hexachlorodisilane at 550℃; for 0.00833333h;A n/a
B n/a
C 83%
D n/a
3-chloroprop-1-ene
107-05-1

3-chloroprop-1-ene

A

allyltrichlorosilane
107-37-9

allyltrichlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

D

3-(Dichloro-trichlorosilanylmethyl-silanyl)-propene

3-(Dichloro-trichlorosilanylmethyl-silanyl)-propene

E

1,1,3,3-tetrachloro-1,3-disilacyclohex-4-ene
59361-35-2

1,1,3,3-tetrachloro-1,3-disilacyclohex-4-ene

Conditions
ConditionsYield
With hexachlorodisilane at 500℃; for 0.00833333h; Product distribution; Mechanism;A 81%
B 1.85%
C 1.77%
D 1.52%
E 4.63%
bis(dichlorosilyl)methane
18081-42-0

bis(dichlorosilyl)methane

dichloromethane
75-09-2

dichloromethane

A

1,1,3,3,5,5-hexachloro-1,3,5-trisilacyclohexane
16538-69-5

1,1,3,3,5,5-hexachloro-1,3,5-trisilacyclohexane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane
16538-67-3

1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane

Conditions
ConditionsYield
tetra-n-butylphosphonium chloride at 180℃; for 2h; Product distribution / selectivity; Inert atmosphere;A 70.1%
B 40.6%
C 13%
trichloro(dichloromethyl)silane
1558-24-3

trichloro(dichloromethyl)silane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With tri-n-propylamine; trichlorosilane In acetonitrile for 21h; Ambient temperature;64%
(chloromethyl)trichlorosilane
1558-25-4

(chloromethyl)trichlorosilane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With tri-n-propylamine; trichlorosilane 1.) r.t., 8 h, 2.) reflux, 10 h;63.6%
With trichlorosilane; triethylamine In acetonitrile at 65 - 70℃; 12-15 h;57%
With copper; silicon at 300 - 400℃;
With trichlorosilane; trihexyl(tetradecyl)phosphonium chloride at 50 - 240℃; under 12929 - 33615.5 Torr; for 3.25h;
With tri-n-propylamine; trichlorosilane
chloroform
67-66-3

chloroform

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With tributylphosphine; trichlorosilane at 150℃; for 2h; Reagent/catalyst; Autoclave;54.3%
With tributylphosphine; trichlorosilane at 150℃; for 2h; Reagent/catalyst; Autoclave; High pressure; Inert atmosphere;54.3%
With trichlorosilane at 150℃; for 2h; Reagent/catalyst; Inert atmosphere; Sealed tube;54.3%
dichloromethane
75-09-2

dichloromethane

(dichlorosilylmethyl)trichlorosilane
18171-02-3

(dichlorosilylmethyl)trichlorosilane

A

1,1,3,3,5,5-hexachloro-1,3,5-trisilacyclohexane
16538-69-5

1,1,3,3,5,5-hexachloro-1,3,5-trisilacyclohexane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane
16538-67-3

1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane

Conditions
ConditionsYield
With tetra-n-butylphosphonium chloride In toluene at 180℃; for 3h; Inert atmosphere; Autoclave;A 54%
B 23%
C 8%
3-Chloro-2-methylpropene
563-47-3

3-Chloro-2-methylpropene

A

trichloro(2-methyl-2-propenyl)silane
18147-56-3

trichloro(2-methyl-2-propenyl)silane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

(Z)-crotyltrichlorosilane
18147-55-2, 52885-13-9, 49749-84-0

(Z)-crotyltrichlorosilane

D

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

E

1,1,1,5,5,5-hexachloro-3-methyl-1,5-disila-1-pentene

1,1,1,5,5,5-hexachloro-3-methyl-1,5-disila-1-pentene

Conditions
ConditionsYield
With hexachlorodisilane at 520℃; for 30h; Product distribution; Mechanism;A 53.4%
B 1.5%
C 8.6%
D 5.3%
E 10.2%
3-Chloro-2-methylpropene
563-47-3

3-Chloro-2-methylpropene

A

trichloro(2-methyl-2-propenyl)silane
18147-56-3

trichloro(2-methyl-2-propenyl)silane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

D

1,1,1,5,5,5-hexachloro-3-methyl-1,5-disila-1-pentene

1,1,1,5,5,5-hexachloro-3-methyl-1,5-disila-1-pentene

Conditions
ConditionsYield
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given;A 53.4%
B 10.2%
C 8.6%
D 5.3%
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given;A 53.4%
B 8.6%
C 5.3%
D 10.2%
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given;A 53.4%
B 10.2%
C 5.3%
D 8.6%
silicon
7440-21-3

silicon

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With dichloromethane; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 400°C;;A 53%
B n/a
With CH2Cl2; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 400°C;;A 53%
B n/a
With dichloromethane; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 300-350°C;;
With CH2Cl2; copper In neat (no solvent) Si-Cu (4:1) and gaseous CH2Cl2 at 300-350°C;;
2-propynyl chloride
624-65-7

2-propynyl chloride

A

allyltrichlorosilane
107-37-9

allyltrichlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

trichloro(prop-2-ynyl)silane
33415-29-1

trichloro(prop-2-ynyl)silane

D

1,1,2,2-tetrachloro-1,2-disilacyclopent-4-ene

1,1,2,2-tetrachloro-1,2-disilacyclopent-4-ene

Conditions
ConditionsYield
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given;A 14.4%
B 42.7%
C 22.1%
D 11.8%
2-propynyl chloride
624-65-7

2-propynyl chloride

A

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

B

trichloro(prop-2-ynyl)silane
33415-29-1

trichloro(prop-2-ynyl)silane

C

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

D

1,1,2,2-tetrachloro-1,2-disilacyclopent-4-ene

1,1,2,2-tetrachloro-1,2-disilacyclopent-4-ene

Conditions
ConditionsYield
With hexachlorodisilane at 520℃; for 0.00833333h; Further byproducts given;A 42.7%
B 22.1%
C 3.8%
D 11.8%
With hexachlorodisilane at 450℃; for 0.00694444h; Further byproducts given;A 35.7%
B 17.2%
C 14.1%
D 21.1%
chloroform
67-66-3

chloroform

A

dichloromethane
75-09-2

dichloromethane

B

(dichlorosilylmethyl)trichlorosilane
18171-02-3

(dichlorosilylmethyl)trichlorosilane

C

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With trichlorosilane at 100℃; for 8h;A 42%
B 5%
C 42%
2-propynyl chloride
624-65-7

2-propynyl chloride

A

allyltrichlorosilane
107-37-9

allyltrichlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

trichloro(prop-2-ynyl)silane
33415-29-1

trichloro(prop-2-ynyl)silane

D

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

E

1,1,2,2-tetrachloro-1,2-disilacyclopent-4-ene

1,1,2,2-tetrachloro-1,2-disilacyclopent-4-ene

Conditions
ConditionsYield
With hexachlorodisilane at 450℃; for 0.00694444h; Product distribution; Mechanism; influence of temperature, ratio of reagents;A 11.6%
B 35.7%
C 17.2%
D 14.1%
E 21.1%
chloroform
67-66-3

chloroform

A

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

B

tris(trichlorosilyl)methane
4775-56-8

tris(trichlorosilyl)methane

Conditions
ConditionsYield
With hexachlorodisilane at 550℃; for 0.00833333h;A 30%
B 34%
With hexachlorodisilane at 550℃; for 0.00833333h; Product distribution; gas-phase reactions of chloroalkanes and chloroalkenes with Si2Cl6; other temperature, molar concentration of Si2Cl6;
trichloromethyltrichlorosilane
17760-13-3

trichloromethyltrichlorosilane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With tri-n-propylamine; trichlorosilane In acetonitrile 1.) r.t., 18 h, 2.) reflux, 16 h;22.7%
Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With aluminium trichloride at 450℃; unter Druck;
at 710℃; unter vermindertem Druck;
dichloromethane
75-09-2

dichloromethane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With copper; silicon at 300 - 400℃;
With hexachlorodisilane at 620℃;
With tetrachlorosilane; hydrogen at 300 - 750℃; Catalytic behavior; Flow reactor;
With copper; silicon at 300℃;
1,1,3,3-tetrachloro-2,4-bis-trichlorosilanyl-[1,3]disiletane
18038-59-0

1,1,3,3-tetrachloro-2,4-bis-trichlorosilanyl-[1,3]disiletane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With hydrogenchloride; N,N-dimethyl-aniline at 150℃;
C19H17Cl3Si2

C19H17Cl3Si2

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With hydrogenchloride; aluminium trichloride In benzene at 5 - 15℃; Yield given;
dichloromethane
75-09-2

dichloromethane

A

chloroform
67-66-3

chloroform

B

(chloromethyl)trichlorosilane
1558-25-4

(chloromethyl)trichlorosilane

C

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With hexachlorodisilane at 399℃; Product distribution; var. temp. and molar ratio;
dichloromethane
75-09-2

dichloromethane

A

bis(dichlorosilyl)methane
18081-42-0

bis(dichlorosilyl)methane

B

(dichlorosilylmethyl)trichlorosilane
18171-02-3

(dichlorosilylmethyl)trichlorosilane

C

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With hydrogenchloride; silicon; Cu(10 percent)-Cd(0.5 percent) at 280℃; for 2h;A 10.1 g
B 8.7 g
C 2.0 g
With hydrogenchloride; silicon; Cu(10 percent)-Cd(0.5 percent) at 280℃; for 2h; Product distribution; effects of temperature, mixing ratio and further catalysts investigated;A 10.2 g
B 8.7 g
C 2.0 g
With hydrogenchloride; methylene chloride; copper; cadmium; silicon at 280℃; for 2h;A 10.1 g
B 8.7 g
C 2 g
dichloromethane
75-09-2

dichloromethane

silicon

silicon

copper

copper

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
at 300 - 400℃;
trichloro(dichloromethyl)silane
1558-24-3

trichloro(dichloromethyl)silane

copper silicon-alloy

copper silicon-alloy

A

Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

B

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

C

(chloromethyl)trichlorosilane
1558-25-4

(chloromethyl)trichlorosilane

D

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
at 360℃;
(chloromethyl)trichlorosilane
1558-25-4

(chloromethyl)trichlorosilane

silicon-copper

silicon-copper

A

Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane
16538-67-3

1,1,1,3,3,5,5,5-octachloro-1,3,5-trisilapentane

Conditions
ConditionsYield
at 300 - 370℃;
hexa-Si-chloro-Si,Si'-chloromethanediyl-bis-silane
18157-13-6

hexa-Si-chloro-Si,Si'-chloromethanediyl-bis-silane

copper silicon-alloy

copper silicon-alloy

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

tris(trichlorosilyl)methane
4775-56-8

tris(trichlorosilyl)methane

D

1,1,2,2-tetrakis-trichlorosilanyl-ethane
18105-80-1

1,1,2,2-tetrakis-trichlorosilanyl-ethane

Conditions
ConditionsYield
at 360℃;
chloroform
67-66-3

chloroform

silicon-copper

silicon-copper

A

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

B

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

C

tris(trichlorosilyl)methane
4775-56-8

tris(trichlorosilyl)methane

D

trichlorosilane
10025-78-2

trichlorosilane

Conditions
ConditionsYield
at 300℃;
trichloromethyltrichlorosilane
17760-13-3

trichloromethyltrichlorosilane

A

CH2Cl4Si

CH2Cl4Si

B

chloroform
67-66-3

chloroform

C

trichloro(dichloromethyl)silane
1558-24-3

trichloro(dichloromethyl)silane

D

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Conditions
ConditionsYield
With trichlorosilane; tetrabutyl phosphine chloride In dodecane at 60℃; for 8h; Product distribution; Further Variations:; Temperatures;
octadec-1-ene
112-88-9

octadec-1-ene

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

1,1,1,3,3-pentachloro-1,3-disilaheneicosane
1621184-16-4

1,1,1,3,3-pentachloro-1,3-disilaheneicosane

Conditions
ConditionsYield
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; Inert atmosphere; Autoclave;
Stage #2: octadec-1-ene With dihydrogen hexachloroplatinate In tetrahydrofuran at 90 - 110℃; Inert atmosphere;
91%
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

disilylmethane
1759-88-2

disilylmethane

Conditions
ConditionsYield
With lithium aluminium tetrahydride In diethylene glycol dimethyl ether at -78 - 25℃; for 2h; Inert atmosphere;82%
With dibutyl ether; lithium hydride
With lithium aluminium tetrahydride
With lithium aluminium tetrahydride In various solvent(s) Reduction;
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

Dichloro-bis(trichlorosilyl)methane
18157-09-0

Dichloro-bis(trichlorosilyl)methane

Conditions
ConditionsYield
With chlorine In tetrachloromethane for 64h; Heating; Irradiation;80.8%
With tetrachloromethane; chlorine Irradiation.UV-Licht;
With chlorine at 240℃; Irradiation.UV-licht;
With sulfuryl dichloride; dibenzoyl peroxide at 240℃; Irradiation.UV-licht;
With chlorine UV-irradiation;
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

allyloxytri(ethylene glycol) monomethyl ether
19685-21-3

allyloxytri(ethylene glycol) monomethyl ether

[2-methoxy(triethyleneoxy)propyl]-1,1,1,3,3-pentachloro-1,3-disilapropane
431900-65-1

[2-methoxy(triethyleneoxy)propyl]-1,1,1,3,3-pentachloro-1,3-disilapropane

Conditions
ConditionsYield
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; Inert atmosphere; Autoclave;
Stage #2: allyloxytri(ethylene glycol) monomethyl ether With dihydrogen hexachloroplatinate In tetrahydrofuran at 85 - 105℃; Inert atmosphere;
70%
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

lithium hydride

lithium hydride

disilylmethane
1759-88-2

disilylmethane

Conditions
ConditionsYield
In dibutyl ether63%
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

ethylamine
75-04-7

ethylamine

(NEtH)3Si-CH2-Si(NEtH)3

(NEtH)3Si-CH2-Si(NEtH)3

Conditions
ConditionsYield
In pentane at -78 - 20℃;62%
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

3-Chloro-2-methylpropene
563-47-3

3-Chloro-2-methylpropene

1,1,1,3,3,6-hexachloro-5-methyl-1,3-disilahexane
1627573-20-9

1,1,1,3,3,6-hexachloro-5-methyl-1,3-disilahexane

Conditions
ConditionsYield
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; for 10h; Inert atmosphere; Autoclave;
Stage #2: 3-Chloro-2-methylpropene With dihydrogen hexachloroplatinate In tetrahydrofuran at 110 - 120℃; Inert atmosphere;
60%
(dichlorosilylmethyl)trichlorosilane
18171-02-3

(dichlorosilylmethyl)trichlorosilane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

3-Chloro-2-methylpropene
563-47-3

3-Chloro-2-methylpropene

1,1,1,3,3,6-hexachloro-5-methyl-1,3-disilahexane
1627573-20-9

1,1,1,3,3,6-hexachloro-5-methyl-1,3-disilahexane

Conditions
ConditionsYield
With hexachloroplatinic acid In tetrahydrofuran at 110 - 130℃; for 3h;60%
1-Decene
872-05-9

1-Decene

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

1,1,1,3,3-pentachloro-1,3-disilatridecane
1621184-14-2

1,1,1,3,3-pentachloro-1,3-disilatridecane

Conditions
ConditionsYield
Stage #1: 1,1,1,3,3,3-hexachloro-1,3-disilapropane With trihexyl(tetradecyl)phosphonium chloride; Dichloromethylsilane at 80 - 90℃; for 10h; Inert atmosphere; Autoclave; Large scale;
Stage #2: 1-Decene With dihydrogen hexachloroplatinate In tetrahydrofuran at 90 - 110℃; Inert atmosphere; Large scale;
59%
1-Decene
872-05-9

1-Decene

(dichlorosilylmethyl)trichlorosilane
18171-02-3

(dichlorosilylmethyl)trichlorosilane

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

1,1,1,3,3-pentachloro-1,3-disilatridecane
1621184-14-2

1,1,1,3,3-pentachloro-1,3-disilatridecane

Conditions
ConditionsYield
With hexachloroplatinic acid In tetrahydrofuran at 90 - 110℃; for 1.5h; Inert atmosphere;59%
sodium dicarbonyl(cyclopentadienyl)ferrate

sodium dicarbonyl(cyclopentadienyl)ferrate

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

[dicarbonyl(η5-cyclopentadienyl)ferrio]dichlorosilyl-(trichlorosilyl)methane
545443-52-5

[dicarbonyl(η5-cyclopentadienyl)ferrio]dichlorosilyl-(trichlorosilyl)methane

Conditions
ConditionsYield
In cyclohexane suspn. of Fe-complex in cyclohexane was combined with Si-compound, stirred for 14 h at ambient temp. under exclusion of light; filtered, solvent was removed in vac., washed with n-pentane at -78°C, dried in vac., crystd. from petroleum ether at -78°C; elem.anal.;46%
1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

methylamine
74-89-5

methylamine

{Bis-methylamino-[(tris-methylamino-silanyl)-methyl]-silanyl}-methyl-amine

{Bis-methylamino-[(tris-methylamino-silanyl)-methyl]-silanyl}-methyl-amine

Conditions
ConditionsYield
In pentane at -78 - 20℃;41%

4142-85-2Relevant articles and documents

Process for Preparing Polysilylalkane

-

Paragraph 0045-0047; 0056-0066; 0076-0078, (2020/04/17)

Polysilylalkane according to the present invention is represented by following formula. The present invention has an advantage that bis(silyl)alkanes or tri(silyl)alkanes can be manufactured in a high yield by dehydrochlorination with a small amount of catalyst by using a silane compound having a dichloro organic matter or a dichloromethyl group.COPYRIGHT KIPO 2020

Exhaustively Trichlorosilylated C1 and C2 Building Blocks: Beyond the Müller-Rochow Direct Process

Georg, Isabelle,Teichmann, Julian,Bursch, Markus,Tillmann, Jan,Endeward, Burkhard,Bolte, Michael,Lerner, Hans-Wolfram,Grimme, Stefan,Wagner, Matthias

supporting information, p. 9696 - 9708 (2018/07/21)

The Cl--induced heterolysis of the Si-Si bond in Si2Cl6 generates an [SiCl3]- ion as reactive intermediate. When carried out in the presence of CCl4 or Cl2C=CCl2 (CH2Cl2 solutions, room temperature or below), the reaction furnishes the monocarbanion [C(SiCl3)3]- ([A]- 92%) or the vicinal dianion [(Cl3Si)2C-C(SiCl3)2]2- ([B]2- 85%) in excellent yields. Starting from [B]2-, the tetrasilylethane (Cl3Si)2(H)C-C(H)(SiCl3)2 (H2B) and the tetrasilylethene (Cl3Si)2C=C(SiCl3)2 (B; 96%) are readily available through protonation (CF3SO3H) or oxidation (CuCl2), respectively. Equimolar mixtures of H2B/[B]2- or B/[B]2- quantitatively produce 2 equiv of the monoanion [HB]- or the blue radical anion [B?]-, respectively. Treatment of B with Cl- ions in the presence of CuCl2 furnishes the disilylethyne Cl3SiC≡CSiCl3 (C; 80%); in the presence of [HMe3N]Cl, the trisilylethene (Cl3Si)2C=C(H)SiCl3 (D; 72%) is obtained. Alkyne C undergoes a [4+2]-cycloaddition reaction with 2,3-dimethyl-1,3-butadiene (CH2Cl2, 50 °C, 3d) and thus provides access to 1,2-bis(trichlorosilyl)-4,5-dimethylbenzene (E1; 80%) after oxidation with DDQ. The corresponding 1,2-bis(trichlorosilyl)-3,4,5,6-tetraphenylbenzene (E2; 83%) was prepared from C and 2,3,4,5-tetraphenyl-2,4-cyclopentadien-1-one under CO extrusion at elevated temperatures (CH2Cl2, 180 °C, 4 d). All closed-shell products were characterized by 1H, 13C{1H}, and 29Si NMR spectroscopy; an EPR spectrum of [nBu4N][B?] was recorded. The molecular structures of [nBu4N][A], [nBu4N]2[B], B, E1, and E2 were further confirmed by single-crystal X-ray diffraction. On the basis of detailed experimental investigations, augmented by quantum-chemical calculations, plausible reaction mechanisms for the formation of [A]-, [B]2-, C, and D are postulated.

Process for Preparing Polysilylalkane

-

Paragraph 0056; 0058, (2016/11/02)

According to the present invention, polysilylalkane is represented by chemical formula 3. In chemical formula 3, m is equal to n, and n is equal to zero; and R^3 is a chloromethyl group. In the case of R^4 is H, -SiMe_2Cl, -SiMe_3, -SiMeCl_2, and -SiCl_3, R^3 is equal to -SiCl_3. In the case of R^4 is H, and R^5 is equal to R^6 and R^6 is equal to Me, or R^5 is equal to Me and R^6 is equal to Et, R^3 is -SiCl_3. In the case of R^4 is H, R^5 is equal to -CH_2SiCl_3, and R^6 is Me, R^3 is equal to -SiCl_3. In the case of R^4 is H, R^5 is equal to R^6 and R^6 is equal to -CH_2SiCl_3, R^3 is equal to Et, SiMe_2Cl, -SiMeCl_2, and -SiCl_3, and m is an integer of zero to nine. The manufacturing method is capable of manufacturing bis(silyl)alkane or tri(silyl)alkane in a high yield with a small amount of a catalyst.COPYRIGHT KIPO 2016

Process for Preparing Polysilylalkane

-

Paragraph 0056; 0057, (2016/10/31)

A polysilyalkane according to the present invention is presented by a formula. Here, m=n=0, R^3 is chloro, and methyl group; when R^4 is H, -SiMe_2Cl, -SiMe_3,-SiMeCl_2, -SiCl_3, R^3=-SiCl_3; R^4 is H, R^5=R^6=Me or R^5=Me, when R6=Et, R^3-SiCl_3; R^4 is H, R^5= -CH_2SiCl_3, when R^6 is Me, R^3=-SiCl_3; R^4 is H, when R5=R6=-CH_2SiCl_3, R^3=Et, SiMe_2Cl, -SiMeCl_2, -SiCl_3, and m is integer number of 0-9.COPYRIGHT KIPO 2015

[2σ + 2σ + 2π]-Cycloaddition of quadricyclane to partially methylated chlorosilylalkenes

Chapala, Pavel P.,Bermeshev, Maxim V.,Lakhtin, Valentin G.,Genaev, Alexander M.,Tavtorkin, Alexander N.,Finkelshtein, Eugene Sh.

, p. 344 - 345 (2015/10/19)

[2σ + 2σ + 2π]-Cycloaddition of quadricyclane to trissilylated ethenes Cl3 - nMenSiCH=CSiMenCl3 - n(SiMe3 - nCln) (n = 1, 2) at 95 °C affords 3,3,4-trissilylated exo-tricyclo[4.2.1.02,5]non-7-enes. Tetrakis(trichlorosilyl)ethene does not react with quadricyclane.

METHOD OF PREPARING HALOGENATED SILAHYDROCARBYLENES

-

Paragraph 0038, (2014/05/07)

A method comprises separate and consecutive steps (i) and (ii). Step (i) includes contacting a copper catalyst with hydrogen gas and a halogenated silane monomer at a temperature of 500 °C to 1400 °C to form a silicon-containing copper catalyst comprising at least 0.1 % (w/w) of silicon. Step (ii) includes contacting the silicon-containing copper catalyst with an organohalide at a temperature of 100°C to 600 °C to form a reaction product. The organohalide has formula HaCbXc, where X is a halogen atom, subscript a is an integer of 0 or more, subscript b is an integer of 1 or more, and subscript c is an integer of 2 or more. The method produces a reaction product. The reaction product includes a halogenated silahydrocarbylene.

PRODUCTION METHOD FOR LINEAR AND CYCLIC TRISILAALKANE

-

Page/Page column 5, (2011/04/19)

The present invention relates to a preparation method for a linear or cyclic trisilaalkane which is a substance useful in the preparation of polycarbosilane and silicon carbide precursors. Linear or cyclic trisilaalkane and organic trichlorosilane derivatives can be synthesized simultaneously and in high yield by reacting bis(chlorosily)methane having a Si—H bond, either alone or together with an organic chloride, using a quaternary organic phosphonium salt compound as a catalyst. Further, since the catalyst can be recovered after use, the present invention is very economical and is thus effective for mass-producing precursors for organic/inorganic hybrid substances.

Phosphine-Catalyzed Si-C Coupling of Bissilylmethanes: Preparation of Cyclic (Cl2SiCH2)2 and Linear Cl 2Si(CH2SiCl3)2 via Silylene and Silene Intermediates

Hong, Soon Hyun,Hyun, Sang Il,Jung, Il Nam,Han, Won-Sik,Kim, Min-Hye,Yun, Hoseop,Nam, Suk-Woo,Kang, Sang Ook

experimental part, p. 687 - 691 (2010/05/15)

Cyclic and linear carbosilanes, (Cl2SiCH2) 2 (2) and Cl2Si(CH2SiCl3) 2 (3), were produced from phosphine-catalized Si-C coupling reactions of bissilylmethanes, HCl2SiCH2SiX1X 2Cl (X1, X2 = Cl (1), X1 = H, X 2 = Cl (7), and X1 = Me, X2 = Cl (8)). The formation of compounds 2 and 3 suggested competing reaction pathways, involving dichlorosilene [CH2=SiCl2] and dichlorosilylene [:SiCl2] intermediates. Each intermediate was either proposed by the product isolation of the trimerized product (3) or confirmed by trapping experiments with 2,3-dimethylbutadiene and methylene chloride.

Si-C coupling reaction of polychloromethanes with HSiCl3 in the presence of Bu4PCl: Convenient synthetic method for bis(chlorosilyl)methanes

Jung, Dong Euy,Kang, Seung-Hyun,Han, Joon Soo,Lim, Weon Cheol,Park, Young-ae W.,Yoo, Bok Ryul

, p. 3901 - 3906 (2008/03/12)

Coupling reaction of polychloromethanes CH4-nCln (n = 2-4) with HSiCl3 in the presence of tetrabutylphosphonium chloride (Bu4PCl) as a catalyst occurred at temperatures ranging from 30 °C to 150 °C. The reactivity of polychloromethanes increases as the number of chlorine-substituents on the carbon increases. In the reactions of CCl4 with HSiCl3, a variety of coupling products such as bis(chlorosilyl)methanes CH2(SiCl3)(SiXCl2) [X = Cl (1a), H (1b)], (chlorosilyl)trichloromthanes Cl3CSiXCl2 [X = Cl (2a), H (2b)], and (chlorosilyl)dichloromthanes Cl2HCSiXCl2 [X = Cl (3a), H (3b)] were obtained along with reductive dechlorination products such as CHCl3 and CH2Cl2 depending on the reaction temperature. In the reaction of CCl4, 2a is formed at the initial stage of the coupling reaction and converted to give CHCl3 at low temperature of 30 °C, to give 1a, 3a, and CHCl3 at 60 °C, and to afford 1a as major product and CH2Cl2 in competition above 100 °C. Si-H bond containing silylmethanes can be formed by the H-Cl exchange reaction with HSiCl3. Reaction of CHCl3 with HSiCl3 took placed at 80 °C to give three compounds 1a, 3a, and CH2Cl2, and finally 3a was converted to give 1a and CH2Cl2 at longer reaction time. While the condition for the reaction of CH2Cl2 with HSiCl3 required a much higher temperature of 150 °C. Under the optimized conditions for synthesizing bis(chlorosilyl)methanes 1a,b, a mixture of 1a and 1b were obtained as major products in 65% (1a:1b = 64:1) and 47% (42:5) yields from the reaction of CCl4 and CHCl3 at 100 °C for 8 h, respectively, and in 41% (34:7) yield from that of CH2Cl2 at 170 °C for 12 h. In the Si-C coupling reaction of polychloromethanes with HSiCl3, it seems likely that a trichlorosilyl anion generated from the reaction of HSiCl3 with Bu4PCl is an important key intermediate.

Processes for manufacturing organochlorosilanes and dipodal silanes and silanes made thereby

-

Page/Page column 7, (2010/02/10)

Processes are provided for producing organchlorosilanes and dipodal silanes in which an organic halide or alkene or chloralkene is reacted with a hydridochlorosilane in the presence of a quarternary phosphonium salt catalyst by providing sufficient heat to effect a dehydrohalogenative coupling reaction and/or a hydrosilylation reaction and venting the reaction to control reaction pressure and to remove gaseous byproducts from the reaction. The processes are preferably continuous using a catalyst in fluid form at reaction pressures not exceeding about 600 psi. The reactions may be carried out substantially isothermally and/or isobarically, for example in a plug flow reactor or continuous stirred tank reactor. The processes may produce novel silylated compounds including 1,2-bis(trichlorosilyl)decane or 1,2-bis(trimethoxysilyl)decane.

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