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Triethoxychlorosilane, also known as chlorotriethoxysilane, is a colorless, transparent liquid with a strong, acrid odor. It is a highly reactive chemical compound that can undergo hydrolysis in the presence of water to form silanols, which can then condense to form siloxane polymers. This property makes it a versatile precursor in the production of silicone polymers and other silicon-based materials. Additionally, it is commonly used as a coupling agent in adhesives, coatings, and sealants, as well as a surface modifier for various materials, providing improved adhesion and chemical resistance. However, due to its highly flammable nature and potential to cause severe skin and eye irritation, it is crucial to handle this chemical with caution.

4667-99-6

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4667-99-6 Usage

Uses

Used in Adhesives, Coatings, and Sealants Industry:
Triethoxychlorosilane is used as a coupling agent for enhancing the adhesion and compatibility between different materials, such as inorganic surfaces and organic polymers. Its ability to form silanols and siloxane polymers upon hydrolysis contributes to the improved bonding and durability of the final product.
Used in Silicone Polymer Production:
As a precursor, triethoxychlorosilane is used in the synthesis of silicone polymers, which are known for their unique properties such as heat resistance, chemical stability, and flexibility. These polymers find applications in various industries, including automotive, aerospace, electronics, and medical.
Used in Glass Manufacturing:
Triethoxychlorosilane is utilized in the manufacturing of glass to improve its properties, such as adhesion, chemical resistance, and durability. Its reactivity with water to form silanols and siloxane polymers aids in creating a strong bond between the glass and other materials, enhancing the overall performance of the glass products.
Used as a Surface Modifier:
In various industries, triethoxychlorosilane is employed as a surface modifier to enhance the adhesion and chemical resistance of different materials. Its ability to form silanols and siloxane polymers upon hydrolysis allows for improved bonding and durability, making it suitable for applications in coatings, paints, and other protective layers.

Check Digit Verification of cas no

The CAS Registry Mumber 4667-99-6 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 4,6,6 and 7 respectively; the second part has 2 digits, 9 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 4667-99:
(6*4)+(5*6)+(4*6)+(3*7)+(2*9)+(1*9)=126
126 % 10 = 6
So 4667-99-6 is a valid CAS Registry Number.
InChI:InChI=1/C6H15ClO3Si/c1-4-8-11(7,9-5-2)10-6-3/h4-6H2,1-3H3

4667-99-6 Well-known Company Product Price

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  • Aldrich

  • (409243)  Chlorotriethoxysilane  98%

  • 4667-99-6

  • 409243-25G

  • 1,807.65CNY

  • Detail
  • Aldrich

  • (409243)  Chlorotriethoxysilane  98%

  • 4667-99-6

  • 409243-100G

  • 5,465.07CNY

  • Detail

4667-99-6SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 13, 2017

Revision Date: Aug 13, 2017

1.Identification

1.1 GHS Product identifier

Product name chloro(triethoxy)silane

1.2 Other means of identification

Product number -
Other names Triethoxychlorosilane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:4667-99-6 SDS

4667-99-6Synthetic route

Triethoxysilane
998-30-1

Triethoxysilane

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
With trichloroisocyanuric acid In dichloromethane Heating;99.7%
With trichloroisocyanuric acid; copper(l) chloride In dichloromethane at 25℃; for 4h; Temperature; Reagent/catalyst; Reflux; Inert atmosphere;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

acetyl chloride
75-36-5

acetyl chloride

A

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

B

ethyl acetate
141-78-6

ethyl acetate

Conditions
ConditionsYield
With aluminium trichloride Heating;A 92%
B n/a
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
With tetrachlorosilane at 20 - 25℃; for 2.16667h; Product distribution / selectivity;86%
With thionyl chloride In N,N-dimethyl-formamide at 25℃; for 4h;85%
With tetrachlorosilane at 20℃; Product distribution / selectivity;73%
Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

A

ethoxy(methyl)dichlorosilane
1825-75-8

ethoxy(methyl)dichlorosilane

B

chloro(diethoxy)(methyl)silane
18157-20-5

chloro(diethoxy)(methyl)silane

C

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
at 20 - 22℃; for 150h;A 86%
B 12%
C n/a
at 20 - 22℃; for 150h;A n/a
B n/a
C 5%
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
In neat (no solvent) heating of Si(OC2H5)4 and SiCl4 (3:1 mol) at 150°C in a closed tube;;85%
In neat (no solvent) heating of Si(OC2H5)4 and SiCl4 (3:1 mol) at 150°C in a closed tube;;85%
In neat (no solvent) heating of Si(OC2H5)4 and SiCl4 (3:1 mol) at 150°C in a closed tube;;
In neat (no solvent) heating of Si(OC2H5)4 and SiCl4 (3:1 mol) at 150°C in a closed tube;;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

dichloromethylphenylsilane
149-74-6

dichloromethylphenylsilane

A

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

B

chloro(phenyl)ethoxy(methyl)silane
17881-37-7

chloro(phenyl)ethoxy(methyl)silane

C

diethoxy-methyl-phenyl-silane
775-56-4

diethoxy-methyl-phenyl-silane

Conditions
ConditionsYield
at 20 - 22℃; for 160h;A 5.13 g
B 83%
C 15%
at 20 - 22℃; for 160h;A 5.13 g
B 5.01 g
C 0.96 g
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

ethanol
64-17-5

ethanol

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
With tetrachlorosilane at 20 - 30℃; for 2.5 - 24h; Product distribution / selectivity;14.4%
dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

A

trichloroethoxysilane
1825-82-7

trichloroethoxysilane

B

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
at 160℃; Gleichgewicht;
bei der Destillation;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

benzoyl chloride
98-88-4

benzoyl chloride

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

benzoyl chloride
98-88-4

benzoyl chloride

A

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

B

benzoic acid ethyl ester
93-89-0

benzoic acid ethyl ester

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

acetyl chloride
75-36-5

acetyl chloride

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
at 135℃;
at 170 - 180℃;
at 160℃; for 1h;
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

A

ethoxy(methyl)dichlorosilane
1825-75-8

ethoxy(methyl)dichlorosilane

B

chloro(diethoxy)(methyl)silane
18157-20-5

chloro(diethoxy)(methyl)silane

C

dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

D

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
Product distribution;A 51.3 % Spectr.
B 6.4 % Spectr.
C 25.6 % Spectr.
D 10.3 % Spectr.
Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

A

ethoxy(methyl)dichlorosilane
1825-75-8

ethoxy(methyl)dichlorosilane

B

trichloroethoxysilane
1825-82-7

trichloroethoxysilane

C

chloro(diethoxy)(methyl)silane
18157-20-5

chloro(diethoxy)(methyl)silane

D

dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

E

Methyltriethoxysilan
2031-67-6

Methyltriethoxysilan

F

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
N,N-dimethyl-formamide at 90℃; for 5.5h; Product distribution; Thermodynamic data; Equilibrium constant; ΔG0, ΔH0;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

trichlorovinylsilane
75-94-5

trichlorovinylsilane

A

trichloroethoxysilane
1825-82-7

trichloroethoxysilane

B

dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

C

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

D

Triethoxyvinylsilane
78-08-0

Triethoxyvinylsilane

E

vinyldi(ethoxy)chlorosilane
18187-22-9

vinyldi(ethoxy)chlorosilane

F

vinyl(ethoxy)dichlorosilane
56124-75-5

vinyl(ethoxy)dichlorosilane

Conditions
ConditionsYield
N,N-dimethyl-formamide at 90℃; for 5.5h; Product distribution; Thermodynamic data; Equilibrium constant; ΔG0, ΔH0;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

A

trichloroethoxysilane
1825-82-7

trichloroethoxysilane

B

dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

C

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

D

phenyldiethoxychlorosilane
17903-53-6

phenyldiethoxychlorosilane

E

triethoxyphenylsilane
780-69-8

triethoxyphenylsilane

F

phenylethoxydichlorosilane
18236-80-1

phenylethoxydichlorosilane

Conditions
ConditionsYield
N,N-dimethyl-formamide at 90℃; for 5.5h; Product distribution; Thermodynamic data; Equilibrium constant; ΔG0, ΔH0;
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

A

trichloroethoxysilane
1825-82-7

trichloroethoxysilane

B

dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

C

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

D

phenyldiethoxychlorosilane
17903-53-6

phenyldiethoxychlorosilane

E

phenylethoxydichlorosilane
18236-80-1

phenylethoxydichlorosilane

Conditions
ConditionsYield
Product distribution;A 4.4 % Spectr.
B 25.6 % Spectr.
C 5.0 % Spectr.
D 4.3 % Spectr.
E 45.0 % Spectr.
tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

1,1,1,3,3,3-hexachloro-1,3-disilapropane
4142-85-2

1,1,1,3,3,3-hexachloro-1,3-disilapropane

A

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

B

{Chloro-[(dichloro-ethoxy-silanyl)-methyl]-ethoxy-silanyloxy}-ethane

{Chloro-[(dichloro-ethoxy-silanyl)-methyl]-ethoxy-silanyloxy}-ethane

C

bis(diethoxychlorosilyl)methane

bis(diethoxychlorosilyl)methane

Conditions
ConditionsYield
at 20 - 22℃; for 160h;A 8.9 g
B 0.74 g
C 5.5 g
ethanol
64-17-5

ethanol

A

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

B

dichlorodiethoxysilane
4667-38-3

dichlorodiethoxysilane

C

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

Conditions
ConditionsYield
With tetrachlorosilane In pentane -70 deg C to room t.; Yield given. Yields of byproduct given. Title compound not separated from byproducts;
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

2-(1-Hydroxybenzyl)-1,3,2-dioxaphosphorinan-2-oxide
93786-70-0

2-(1-Hydroxybenzyl)-1,3,2-dioxaphosphorinan-2-oxide

2-(1-Triethoxysilyloxybenzyl)-1,3,2-dioxaphosphorinan-2-oxide

2-(1-Triethoxysilyloxybenzyl)-1,3,2-dioxaphosphorinan-2-oxide

Conditions
ConditionsYield
With pyridine In toluene Ambient temperature;98%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

(3S*,4S*,5E,7E)-3,5,7-trimethylnona-1,5,7-trien-4-ol

(3S*,4S*,5E,7E)-3,5,7-trimethylnona-1,5,7-trien-4-ol

(3S*,4S*,5E,7E)-4-(triethylsilyloxy)-3,5,7-trimethylnona-1,5,7-triene

(3S*,4S*,5E,7E)-4-(triethylsilyloxy)-3,5,7-trimethylnona-1,5,7-triene

Conditions
ConditionsYield
With 1H-imidazole; dmap In N,N-dimethyl-formamide at 20℃; for 3h;97%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

lithium phenylacetylide
4440-01-1

lithium phenylacetylide

1-triethoxysilyl-2-phenylacetylene
18402-75-0

1-triethoxysilyl-2-phenylacetylene

Conditions
ConditionsYield
In tetrahydrofuran at 20℃;95%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

phenylacetylene
536-74-3

phenylacetylene

1-triethoxysilyl-2-phenylacetylene
18402-75-0

1-triethoxysilyl-2-phenylacetylene

Conditions
ConditionsYield
Stage #1: phenylacetylene With n-butyllithium In tetrahydrofuran; hexane at -70 - 20℃;
Stage #2: chlorotriethoxysilane In tetrahydrofuran; hexane at 0 - 20℃; Further stages.;
95%
Stage #1: phenylacetylene With n-butyllithium In tetrahydrofuran; hexane at 0℃;
Stage #2: chlorotriethoxysilane In tetrahydrofuran; hexane at -78 - 20℃; for 16h;
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

diethylamine
109-89-7

diethylamine

A

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

B

N-(triethoxysilyl)diethylamine
35077-00-0

N-(triethoxysilyl)diethylamine

Conditions
ConditionsYield
With triethylamine In n-heptane at 20℃; Product distribution / selectivity;A 6%
B 93%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

C74H54N4O2

C74H54N4O2

C86H82N4O8Si2

C86H82N4O8Si2

Conditions
ConditionsYield
Stage #1: C74H54N4O2 With triethylamine In tetrahydrofuran at 20℃; for 0.166667h;
Stage #2: chlorotriethoxysilane In tetrahydrofuran at 20℃; for 15h;
93%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

2'-O-[(triethoxy)silyl]paclitaxel
1335283-69-6

2'-O-[(triethoxy)silyl]paclitaxel

Conditions
ConditionsYield
With triethylamine In tetrahydrofuran at 20℃; for 1h;90.6%
With triethylamine In tetrahydrofuran at 20℃; for 1h; Sealed tube;90.6%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

ammonium thiocyanate
1147550-11-5

ammonium thiocyanate

triethoxy isothiocyanato silane
18301-79-6

triethoxy isothiocyanato silane

Conditions
ConditionsYield
In cyclohexane for 30h; Heating;90%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

1-triethoxysilylglycerol

1-triethoxysilylglycerol

Conditions
ConditionsYield
In ethanol; glycerol90%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

[LiOB{CH(SiMe3)2}2]

[LiOB{CH(SiMe3)2}2]

(EtO)3SiOB{CH(SiMe3)2}2

(EtO)3SiOB{CH(SiMe3)2}2

Conditions
ConditionsYield
In tetrahydrofuran at 60℃; for 12h; Inert atmosphere;87%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

[:C{[N(2,6-Pri2C6H3)]2CHCLi}]

[:C{[N(2,6-Pri2C6H3)]2CHCLi}]

C33H50N2O3Si

C33H50N2O3Si

Conditions
ConditionsYield
In tetrahydrofuran at -20 - 20℃; for 1h;87%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

1,3-diphenylpropanedione
120-46-7

1,3-diphenylpropanedione

triethoxy(1,3-diphenylpropane-1,3-dionato-O)silicon

triethoxy(1,3-diphenylpropane-1,3-dionato-O)silicon

Conditions
ConditionsYield
With triethylamine In toluene at 20℃; for 1h; Inert atmosphere; Schlenk technique;86%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

2',7-di-O-(triethoxysilyl)paclitaxel
1415222-02-4

2',7-di-O-(triethoxysilyl)paclitaxel

Conditions
ConditionsYield
With pyridine In tetrahydrofuran at 20℃; for 2h;85%
With pyridine In tetrahydrofuran at 20℃; for 2h; Sealed tube;85%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

chloroprene
126-99-8

chloroprene

(buta-1,3-dien-2-yl)triethoxysilane
124597-49-5

(buta-1,3-dien-2-yl)triethoxysilane

Conditions
ConditionsYield
Stage #1: chloroprene With 1,1-Dibromoethane; magnesium; zinc(II) chloride In tetrahydrofuran; xylene for 0.75h; Heating;
Stage #2: chlorotriethoxysilane In tetrahydrofuran for 1h; Heating; Further stages.;
84.7%
Stage #1: chloroprene With magnesium; ethylene dibromide; zinc(II) chloride In tetrahydrofuran; xylenes for 1.33333h; Heating / reflux;
Stage #2: chlorotriethoxysilane In tetrahydrofuran; xylenes at 20℃; for 1h; Heating / reflux;
84.7%
Stage #1: chloroprene With magnesium; ethylene dibromide; zinc(II) chloride In tetrahydrofuran; xylenes for 1.25h; Reflux;
Stage #2: chlorotriethoxysilane In tetrahydrofuran; xylenes for 1h; Reflux;
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

silver thiocyanate
1701-93-5

silver thiocyanate

triethoxy isothiocyanato silane
18301-79-6

triethoxy isothiocyanato silane

Conditions
ConditionsYield
In benzene80%
In benzene80%
With benzene
3-[(trifluorovinyl)oxy]bromobenzene
260262-38-2

3-[(trifluorovinyl)oxy]bromobenzene

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

[3-[(trifluorovinyl)oxy]phenyl]triethoxysilane
851681-35-1

[3-[(trifluorovinyl)oxy]phenyl]triethoxysilane

Conditions
ConditionsYield
Stage #1: 3-[(trifluorovinyl)oxy]bromobenzene With magnesium In tetrahydrofuran at 0 - 20℃; for 2h;
Stage #2: chlorotriethoxysilane In tetrahydrofuran at -48 - 20℃; for 24h;
80%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

acetylenemagnesium bromide
4301-14-8

acetylenemagnesium bromide

triethoxyethynylsilane
5700-28-7

triethoxyethynylsilane

Conditions
ConditionsYield
In tetrahydrofuran at -78 - 50℃; for 5h;80%
6-fluoro-1-benzylindole

6-fluoro-1-benzylindole

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

1-benzyl-6-(triethoxysilyl)-1H-indole

1-benzyl-6-(triethoxysilyl)-1H-indole

Conditions
ConditionsYield
With 2-((2,4,6-trimethylphenyl)amino)-4-((2,4,6-trimethylphenyl)imino)-2-pentene; cobalt(II) aceylacetonate; magnesium In tetrahydrofuran at 25℃; for 24h; Inert atmosphere; Glovebox;79%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

12CH3O2Si(1-)*(x)C4H10O*4Cu(2+)*(x)H2O*4Na(1+)

12CH3O2Si(1-)*(x)C4H10O*4Cu(2+)*(x)H2O*4Na(1+)

C84H216O60Si24

C84H216O60Si24

Conditions
ConditionsYield
With pyridine In toluene at 20℃; for 48h; Schlenk technique; Inert atmosphere;78%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

4-methyl-4'-fluorobiphenyl
72093-43-7

4-methyl-4'-fluorobiphenyl

triethoxy(4'-methyl-[1,1'-biphenyl]-4-yl)silane

triethoxy(4'-methyl-[1,1'-biphenyl]-4-yl)silane

Conditions
ConditionsYield
With 2-((2,4,6-trimethylphenyl)amino)-4-((2,4,6-trimethylphenyl)imino)-2-pentene; cobalt(II) aceylacetonate; magnesium In tetrahydrofuran at 25℃; for 16h; Inert atmosphere; Glovebox;76%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

(E)-1-(2-iodophenyl)-2-phenyldiazene
51343-11-4

(E)-1-(2-iodophenyl)-2-phenyldiazene

triethoxy[2-((E)-phenylazo)phenyl]silane
892495-60-2

triethoxy[2-((E)-phenylazo)phenyl]silane

Conditions
ConditionsYield
Stage #1: (E)-1-(2-iodophenyl)-2-phenyldiazene With n-butyllithium In tetrahydrofuran; hexane at -105℃; for 0.0833333h;
Stage #2: chlorotriethoxysilane In tetrahydrofuran; hexane at 0℃; for 3h;
75%
With n-butyllithium In tetrahydrofuran; hexane at 0℃; for 22h;75%
1-bromo-4-ethenyl-benzene
2039-82-9

1-bromo-4-ethenyl-benzene

chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

triethoxy(4-vinylphenyl)silane
6026-60-4

triethoxy(4-vinylphenyl)silane

Conditions
ConditionsYield
Stage #1: 1-bromo-4-ethenyl-benzene With magnesium In tetrahydrofuran for 1h;
Stage #2: chlorotriethoxysilane In tetrahydrofuran Further stages.;
75%
chlorotriethoxysilane
4667-99-6

chlorotriethoxysilane

diethylamine
109-89-7

diethylamine

N-(triethoxysilyl)diethylamine
35077-00-0

N-(triethoxysilyl)diethylamine

Conditions
ConditionsYield
In n-heptane at 20℃; for 2h; Product distribution / selectivity;75%
at 25 - 30℃; for 2.5h; Product distribution / selectivity;8.6%

4667-99-6Relevant academic research and scientific papers

Semisynthetic Antimycobacterial C-3 Silicate and C-3/C-21 Ester Derivatives of Fusidic Acid: Pharmacological Evaluation and Stability Studies in Liver Microsomes, Rat Plasma, and Mycobacterium tuberculosis culture

Njoroge, Mathew,Kaur, Gurminder,Espinoza-Moraga, Marlene,Wasuna, Antonina,Dziwornu, Godwin Akpeko,Seldon, Ronnett,Taylor, Dale,Okombo, John,Warner, Digby F.,Chibale, Kelly

, p. 1634 - 1644 (2019)

Fusidic acid (FA), a natural product fusidane triterpene-based antibiotic with unique structural features, is active in vitro against Mycobacterium tuberculosis, the causative agent of tuberculosis (TB). While possessing good pharmacokinetics in man, FA is rapidly metabolized in rodents, thus complicating proof-of-concept studies in this model. Toward the repositioning of FA as an anti-TB agent, we herein describe the synthesis, activity, and metabolism of FA and semisynthesized ester derivatives in rat liver microsomes, rat plasma, and mycobacterial cell culture. FA and derivative molecules with a free C-3 OH underwent species-specific metabolism to the corresponding 3-OH epimer, 3-epifusidic acid (3-epiFA). FA was also metabolized in rat plasma to form FA lactone. These additional routes of metabolism may contribute to the more rapid clearance of FA observed in rodents. C-3 alkyl and aryl esters functioned as classic prodrugs of FA, being hydrolyzed to FA in microsomes, plasma, and Mycobacterium tuberculosis culture. In contrast, C-3 silicate esters and C-21 esters were inert to hydrolysis and so did not act as prodrugs. The antimycobacterial activity of the C-3 silicate esters was comparable to that of FA, and these compounds were stable in microsomes and plasma, identifying them as potential candidates for evaluation in a rodent model of tuberculosis.

Synthesis of a 12-membered cyclic siloxane possessing alkoxysilyl groups as a nanobuilding block and its use for preparation of gas permeable membranes

Yoshikawa, Masashi,Shiba, Hiroya,Kanezashi, Masakoto,Wada, Hiroaki,Shimojima, Atsushi,Tsuru, Toshinori,Kuroda, Kazuyuki

, p. 48683 - 48691 (2017)

A 12-membered cyclic siloxane possessing alkoxysilyl groups was synthesized as a nanobuilding block for siloxane-based materials by the alkoxysilylation of organometallasiloxane containing a 12-membered ring with Si-Me and Si-O- groups as the side groups. The cyclic structure was retained not only in the hydrolysis and condensation reactions (sol-gel process) of the alkoxysilyl groups but also in the xerogel and membrane preparation processes. The degree of condensation of the xerogel derived from the 12-membered ring siloxane was higher than that derived from alkoxysilane monomers, indicating that the alkoxysilylated cyclic oligosiloxane is useful for controlling siloxane networks. A membrane composed of the cyclic siloxane was prepared by coating the hydrolyzed solution onto a porous alumina tube for evaluating the gas permeation properties. The membrane showed a molecular sieving effect for H2/SF6.

Synthesis of triethoxysilanol

Kazakova,Gorbatsevich,Skvortsova,Demchenko,Muzafarov

, p. 1350 - 1351 (2005)

Triethoxysilanol was isolated for the first time by hydrolysis of chloro(triethoxy)silane in an organic solvent in the presence of a heterogeneous base and identified as an individual compound. The synthesis of this compound made it possible to study its physicochemical properties and substantially extended its potentialities for the synthesis of hyperbranched polyethoxysiloxanes and functional oligomers.

Industrial synthesis method of triethoxychlorosilane

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Paragraph 0040-0077, (2021/05/05)

The invention relates to the field of organic synthesis, aims to overcome the defects of high content of byproducts, low selectivity of triethoxychlorosilane and the like in preparation of triethoxychlorosilane by using triethoxysilane as a raw material and adopting a chlorination reaction, and provides a method for converting the triethoxysilane into the triethoxychlorosilane by using trichloroisocyanuric acid as a chlorination reagent and halogenated metal salt as an additive. The method for converting the triethoxysilane into the triethoxychlorosilane has the advantages of high conversion rate of the triethoxysilane, low content of byproducts, high selectivity of the triethoxychlorosilane and small separation load, and is particularly suitable for industrial preparation of the triethoxychlorosilane.

Method for removing methyldichlorosilane and silicon tetrachloride impurities in trimethyl chlorosilane

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Paragraph 0037-0038; 0042-0044; 0049; 0051-0052; 0063; ..., (2021/08/25)

The invention relates to a method for removing methyldichlorosilane and silicon tetrachloride impurities in trimethyl chlorosilane, which comprises a hydrosilylation reaction, a partial esterification reaction and a complete esterification reaction. Firstly, a mixture of trimethylsilyl chloride containing methyldichlorosilane and silicon tetrachloride impurities is added to a reactor for hydrosilylation reaction, and the reaction product enters a separation system. The silicon tetrachloride in the mixture is partially esterified and reacted by adding the low-carbon alcohol as an esterifying agent, and the reaction product enters a separation system. Finally, the partially esterified product is further fully esterified to valuable tetraalkoxy silicon products. The high-efficiency recycling of trimethylchlorosilane is realized, and high-value utilization is also realized.

Synthesis of Polycyclic and Cage Siloxanes by Hydrolysis and Intramolecular Condensation of Alkoxysilylated Cyclosiloxanes

Sugiyama, Tomoaki,Shiba, Hiroya,Yoshikawa, Masashi,Wada, Hiroaki,Shimojima, Atsushi,Kuroda, Kazuyuki

, p. 2764 - 2772 (2019/02/01)

The controlled synthesis of oligosiloxanes with well-defined structures is important for the bottom-up design of siloxane-based nanomaterials. This work reports the synthesis of various polycyclic and cage siloxanes by the hydrolysis and intramolecular condensation of monocyclic tetra- and hexasiloxanes functionalized with various alkoxysilyl groups. An investigation of monoalkoxysilylated cyclosiloxanes revealed that intramolecular condensation occurred preferentially between adjacent alkoxysilyl groups to form new tetrasiloxane rings. The study of dialkoxy- and trialkoxysilylated cyclotetrasiloxanes revealed multistep intramolecular condensation reactions to form cubic octasiloxanes in relatively high yields. Unlike conventional methods starting from organosilane monomers, intramolecular condensation enables the introduction of different organic substituents in controlled arrangements. So-called Janus cubes have been successfully obtained, that is, Ph4R4Si8O12, in which R=Me, OSiMe3, and OSiMe2Vi (Vi=vinyl). These findings will enable the creation of siloxane-based materials with diverse functions.

Selective Formation of Alkoxychlorosilanes and Organotrialkoxysilane with Four Different Substituents by Intermolecular Exchange Reaction

Komata, Yuma,Yoshikawa, Masashi,Tamura, Yasuhiro,Wada, Hiroaki,Shimojima, Atsushi,Kuroda, Kazuyuki

, p. 3225 - 3233 (2016/11/29)

Alkoxychlorosilanes are scientifically and industrially important toward preparing silicone and silica as well as preparation of siloxane-based nanomaterials by stepwise reactions of Si?OR (R=alkyl) and Si?Cl groups. Intermolecular exchange of alkoxy and chloro groups between alkoxysilanes and chlorosilanes (functional group exchange reaction) provides an efficient and environmentally benign route to alkoxychlorosilanes. BiCl3 as a Lewis acid catalyst can promote the functional group exchange reactions more efficiently than conventional acid catalysts. Higher reactivity has been observed for chlorosilanes with smaller numbers of Si?CH3 groups and for alkoxysilanes with larger numbers of Si?CH3 groups. The reaction mechanism is proposed and selective syntheses of alkoxychlorosilanes are demonstrated. These findings also enable us to synthesize an organotrialkoxysilane with four different substituents.

Method of producing arylhalosilane alkoxyphthalocyanine (by machine translation)

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Paragraph 0015; 0021-0022; 0027, (2016/10/09)

PROBLEM TO BE SOLVED: alkoxyphthalocyanine arylhalosilane compd. alkoxy halo silane can be efficiently manufactured to provide a novel method of producing and purpose. SOLUTION: arylhalosilane compd. alkylalkoxysilane compound having a functional group and in exchange reaction, by utilizing a bismuth halide (III), alkoxyphthalocyanine arylhalosilane compd. can be efficiently manufactured. Selected drawing: no (by machine translation)

Mechanistic insights into the hydrosilylation of allyl compounds - Evidence for different coexisting reaction pathways

Gigler, Peter,Drees, Markus,Riener, Korbinian,Bechlars, Bettina,Herrmann, Wolfgang A.,Kuehn, Fritz E.

, p. 1 - 14 (2013/01/14)

The hydrosilylation of allyl compounds is often accompanied by the formation of high amounts of byproducts. The formation processes have not been fully understood so far. In this work, the allyl hydrosilylation mechanism is investigated in detail and experimental and theoretical evidence for multiple, coexisting reaction pathways is provided. Based on earlier reports and the observations during an extensive catalytic study, different pathways, leading to the observed byproducts, were identified and proven by labeling experiments and DFT calculations. Oxidative addition of the silane and the insertion of the allyl compound into the Pt-H bond turned out to be the crucial, selectivity-determining steps within the catalytic cycle. Based on these findings, it should be possible to systematically influence these steps and pave the way to a rational and straightforward design of more selective catalysts.

Ethylene polymerization reactions with multicenter Ziegler-Natta catalysts-manipulation of active center distribution

Kissin, Yury V.,Mink, Robert I.

scheme or table, p. 4219 - 4229 (2011/12/15)

This article describes ethylene/1-hexene copolymerization reactions with a supported titanium-based, multicenter Ziegler-Natta catalyst. The catalyst was modified by pretreating its solid precursor with AlEt2Cl and with similar organoaluminum chlorides, Al2Et3Cl3, AlEtCl2, and AlMe2Cl. Testing of the untreated and the pretreated catalysts in copolymerization reactions under standard reaction conditions demonstrated that the modifying agents produce two changes in the catalyst. First, the pretreatment significantly reduces the reactivity of active centers that produce high molecular weight, highly crystalline copolymer components with a low 1-hexene content. Second, the pretreatment noticeably increases the reactivity of active centers that produce low molecular weight copolymer components with a high 1-hexene content. The first effect is caused by Lewis acidbase interactions of the modifiers with the active centers, whereas the second (activating) effect is due to the removal of catalyst poisons (organosilicon compounds generated in the process of the catalyst synthesis) by AlEt2Cl.

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