
Chemistry - A European Journal p. 6490 - 6497 (2008)
Update date:2022-07-29
Topics:
Woell, Dominik
Smirnova, Julia
Galetskaya, Marina
Prykota, Tamara
Buehler, Jochen
Stengele, Klaus-Peter
Pfleiderer, Wolfgang
Steiner, Ulrich E.
Novel photolabile protecting groups based on the 2-(2-nitrophenyl)- propoxycarbonyl (NPPOC) group with a covalently linked thioxanthone as an intramolecular triplet sensitizer exhibit significantly enhanced light sensitivity under continuous illumination. Herein we present a detailed study of the photokinetics and photoproducts of nucleosides caged with these new protecting groups. Relative to the parent NPPOC group, the light sensitivity of the new photolabile protecting groups is enhanced by up to a factor of 21 at 366 nm and is still quite high at 405 nm, the wavelength at which the sensitivity of the parent compound is practically zero. A new pathway for de-protection of the NPPOC group pro_ceeding through a nitroso benzylalcohol intermediate has been discovered to complement the main mechanism, which involves β elimination. Under standard conditions of lithographic DNA-chip synthesis, some of the new compounds, while maintaining the same chip quality, react ten times faster than the unmodified NPPOC-protected nucleosides.
View MorePharmaResources(Kaiyuan)CO,.Ltd
Contact:+86-21-50720028
Address:No.3, Beihuan Road, Economic Development District, Kaiyuan City, Tieling City, Liaoning Province, China 112300
website:http://www.vanzpharm.com/en/index.html
Contact:86-27-84492310
Address:FANHU INDUSTRY PARK
Wuhan Hanye Chemical New Material Co.,Ltd
Contact:+86-27-85308141
Address:LiuDian, Panlongcheng Economic Development Zone, HuangPi district, Wuhan, Hubei 430311 P.R.China
Weihao Chemtech (ChangZhou) Co., Ltd.(expird)
Contact:051989185693
Address:NO 217 huangshan Rd ,Changzhou
Shanghai Mintchem Development ., Ltd
Contact:0086 21 5190 8570
Address:R602,4#,89Nong, Mudan Road Pudong Shanghai China
Doi:10.1016/j.bmc.2018.01.015
(2018)Doi:10.1016/j.tetlet.2008.06.069
(2008)Doi:10.1016/j.tetlet.2008.06.065
(2008)Doi:10.1016/j.bmcl.2008.06.069
(2008)Doi:10.1002/adsc.200700133
(2007)Doi:10.1016/S0040-4039(00)84312-9
(1986)