
Journal of Organometallic Chemistry p. 497 - 519 (1990)
Update date:2022-07-29
Topics:
Haynes, Anthony
Poliakoff, Martyn
Turner, James J.
Bender, Bruce R.
Norton, Jack R.
UV photolysis of Os2(CO)9 or ((μ-C1,C2)CH2CH2)Os2(CO)8 (1) isolated in argon matrices causes ejection of a CO or C2H4 ligand respectively, and formation of Os2(CO)8, which has structure with only terminal CO groups.Long wavelength irradiation of matrix is
View MoreDisynthesis Chemical Technology Co. Ltd.
Contact:+86-571-88194596
Address:Dengyun road 380, Gongshu district, Hangzhou city, China
Shijiazhuang Haitian Amino Acid Co., Ltd.
Contact:+86-311-88908111
Address:Shijiazhuang Hebei province,China
Hangzhou Showland Technology Co., Ltd.
Contact:86-571-88920516
Address:ROOM2118,NO.553,WENSAN ROAD,HANGZHOU,CHINA
Contact:+86-371-86058576
Address:NO.32, Jingsan Road, Zhengzhou, China
Contact:410-273-7300; 800-221-3953
Address:4609 Richlynn Dr., PO Box 369, Belcamp, MD, 21017-0369, USA
Doi:10.1246/bcsj.20090295
(2010)Doi:10.1016/j.tetasy.2010.04.009
(2010)Doi:10.1021/om100482w
(2010)Doi:10.1016/j.ejmech.2010.05.006
(2010)Doi:10.1016/j.bmcl.2010.07.121
(2010)Doi:10.1016/0022-328X(91)86452-V
(1991)