Phosphine oxide-Doped Light-Emitting Diodes
COMMUNICATION
weaker than that of BPhen. Although among the I-type de-
vices I-B showed the highest efficiency of 28 LmWꢁ1
(30 cdAꢁ1, 13.3%) at 90 cdmꢁ2 (Figure 4c and Figure S4 in
the Supporting Information), device I-A exhibited the most
stable efficiency between 100–1000 cdmꢁ2, the percentages
of efficiency roll-off are only 23% for power efficiency
(PE), 4% for current efficiency (CE) and 4% for EQE. To
the best of our knowledge, this is among the highest levels
reported for single-host/FIrpic-based PHOLEDs and com-
parable to mixed-host-based devices.[5,7g,h]
Because FIrpic and BPhen have similar T1 values (T1 =
2.78 eV), the electron-transporting tri[3-(3-pyridyl)mesityl]-
borane (3TPYMB), which has a much higher T1 value
(2.95 eV), was inserted between the EML and BPhen layers
as exiton-blocking layer to prevent the diffusion of T1 exci-
ton from EML to ETL. This led to the construction of four
II-type devices (device II-A, II-B, II-C and II-D), the config-
urations of which were ITO/MoOx (2 nm)/m-MTDATA:-
Figure 3. Absorption and emission spectra of o-DBFPPO in a film and in
CH2Cl2 (1ꢁ10ꢁ5 m) and phosphorescence spectrum of o-DBFPPO in
CH2Cl2 (1ꢁ10ꢁ5 m) at 77 K: : absorption in the film, : absorption in
&
*
~
*
CH2Cl2, &: emission in the film, : emission in CH2Cl2 and : phosphor-
escence in CH2Cl2.
MoOx (3:1, 10 nm)/m-MTDATA (30 nm)/[Ir
DBFPPO:FIrpic (10:1, 10 nm)/3TPYMB (y nm)/BPhen
((40ꢁy) nm)/LiF(1 nm)/Al (for II-A, y=0; for II-B, y=5;
ACHTUNGRTEN(NUNG ppz)3] (10 nm)/
metal-to-ligand charge-transfer (MLCT) absorption peak of
ACHTUNGTRENNUNG
the blue-phosphorescent-emitting bis
N
for II-C, y=10; for II-D, y=15). The combined thickness of
3TPYMB and BPhen was 40 nm. Therefore, from II-A to II-
D, the thickness of the 3TPYMB layer increased from 0 to
15 nm, whereas the thickness of the BPhen layer decreased
from 40 to 25 nm. Devices II-A and II-B showed similar cur-
rent–voltage characteristics. The driving voltages of II-C and
II-D gradually increased compared with II-A and II-B; this
may be attributed to the strong hole-blocking ability of
3TPYMB (HOMO=ꢁ6.77 eV) (Figure 4b). Because of the
efficient T1 exciton blocking, the highest CE and EQE
values of II-C (139 cdmꢁ2) were improved to 35.5 cdAꢁ1and
15.5%, respectively. However, with the lower operating
voltage, device II-B showed the highest PE of 36 LmWꢁ1 at
83 cd mꢁ2 (Figure 4d and Figure S5 in the Supporting Infor-
mation). Simultaneously, device II-B had the most stable ef-
ficiencies among the II-type devices with very low efficiency
roll-offs of 25% for PE, 9% for CE and 9% for EQE (100–
1000 cdmꢁ2).
The electroluminescent (EL) spectra of the I- and II-type
devices at 1000 cdmꢁ2 are shown in Figure 4a and b. The
main peaks appear at 468 nm. The shoulder peaks at 500 nm
are much weaker. The Commission Internationale de
L’Eclairage (CIE) coordinates are (0.16, 0.32) and (0.15,
0.29) for the I- and II-type devices, respectively. These coor-
dinates are remarkably smaller than for other PHOLEDs
based on phosphine oxide hosts and FIrpic.[7b–h] The vibra-
tional peak at 500 nm is attributed to the recombination
zones close to the interfaces between carrier-transporting
layers and EMLs.[7h] The ortho linkage endows o-DBFPPO
with both hole- and electron-injection/transporting abilities,
which induce the recombination zones to shift to the centre
of EML and further reduce the vibrational peaks. The more
efficient polarisation of dibenzofuran in o-DBFPPO is also
the reason for the extremely stable EL efficiencies of the I-
and II-type devices. For most phosphine oxide hosts, stron-
ger electron-injection/transporting ability leads limitations
pyridinato-N,C2)picolinatoiridium(III) (FIrpic) constituting
AHCTUNGTRENNUNG
the basis of the diode. The phosphorescence spectrum of o-
DBFPPO was also measured at 77 K. T1 of o-DBFPPO esti-
mated from the u0,0 transition identified as the highest-
energy band (394 nm) was as high as 3.15 eV, which was
0.4 eV higher than that of FIrpic (2.75 eV). Therefore, an ef-
ficient exothermic energy transfer from o-DBFPPO to
FIrpic can be expected. Simultaneously, the energy gap be-
tween S1 and T1 (DEST) of o-DBFPPO is only 0.74 eV. The
small DEST reduces the driving voltage of PHOLEDs.[5]
To investigate the performance of o-DBFPPO as the host
material, three I-type devices (device I-A, I-B and I-C) were
fabricated through vacuum evaporation with the same con-
figuration of ITO/MoOx (2 nm)/m-MTDATA: MoOx (3:1,
10 nm)/m-MTDATA (30 nm)/[IrACHTNUGRTENUNG(ppz)3] (10 nm)/o-DBFPPO:
FIrpic (10:1, x nm)/BPhen ((50ꢁx) nm)/LiF (1 nm)/Al (for
I-A, x=10; for I-B, x=20; for I-C, x=30), in which MoOx
and LiF served as hole- and electron-injecting layers, m-
MTDATA is 4,4’,4’’-tri(N-3-methylphenyl-N-phenylamino)-
triphenylamine, which served as a hole-transporting layer
(HTL), BPhen is 4,7-diphenyl-1,10-phenanthroline, which
served as an electron-transporting layer (ETL), and [Ir-
ACHTUNGTRENNUNG(ppz)3] is tris(phenylpyrazole)iridium, which was used as
both hole-transporting and electron-blocking materials, re-
spectively. The combined thickness of EML and ETL was
50 nm. Therefore, from I-A to I-C, the thickness of EML in-
creased from 10 to 30 nm, whereas the thickness of the ETL
decreased from 40 to 20 nm. Device I-A showed the lowest
turn-on voltage of 2.6 V at 3 cdmꢁ2, and the driving voltages
at 100 and 1000 cdmꢁ2 were as low as 3.1 and 4.0 V, respec-
tively (Figure 4a). These are the lowest operating voltages
reported so far among the single-host/FIrpic-based PHO-
LEDs.[5,7] Along with increasing thickness of the EML, the
driving voltages also gradually increased, which implies that
the electron-injection/transporting ability of o-DBFPPO is
Chem. Eur. J. 2011, 17, 445 – 449
ꢀ 2011 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim
447