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obtained by the direct reaction of sulfur and silicon. 2,6-Diisopro-
1. Introduction
pylphenol (Alfa-Aesar, 97%), 2-isopropylphenol (Alfa-Aesar, 98%)
and toluene were used as purchased.
Alkoxysilanes are produced for diverse purposes such as sol–gel
processes, surface modification, protection of hydroxyl groups and
others. The laboratory and industrial method of synthesis is based
on the reaction of a chlorosilane with an alcohol [1–3]. Several
other methods were proposed in the literature such as the prepa-
ration of (EtO)4Si from Ca3(SiO4)O, Ca2SiO4, and portland cement
[4] or the use of cyclic [5] and unsymmetrical [3] ethers instead
of alcohols. The latter one described quite recently was proposed
with the purpose to avoid generation of toxic and corrosive hydro-
gen chloride during the production process [1]. Even elemental sil-
icon can react with primary alcohols [6–9] and phenols [10] to
afford triorganoxysilanes and tetraorganoxysilanes. With the use
of copper(I) chloride as a catalyst, trialkoxysilanes and triphenox-
ysilane were selectively obtained by the reactions of silicon with
primary alcohols or phenol respectively [8–10]. Direct syntheses
of organodichlorosilanes from silicon, hydrogen chloride and al-
kanes or alkenes [11] and generation of alkylalkoxysilanes from sil-
icon and methanol [12] or alcohol/alkene mixtures [13] were also
developed by the same group of Japanese scientists. These reac-
tions are likewise catalyzed by CuCl.
2.1.1. Tetra(2-isopropylphenoxy)silane (1)
The compound was obtained by phenolysis of SiS2 as described
for tris(2,6-dimethylphenoxy)silanethiol [17], tri(mesityloxy)sila-
nethiol (TMST) [18] and tris(2,6-diisopropylphenoxy)silanethiol
[19]. In the first synthesis SiS2 (60%, 23.5 g) and 2-isopropylphenol
(125 g) were stirred and heated for approx. 30 h in 150–180 °C un-
der the stream of nitrogen. After that 250 ml toluene was added to
the reaction mixture and the unreacted SiS2 was removed by cen-
trifugation. Toluene and the excess phenol were removed by vac-
uum distillation. The crude solid (46.8 g, ꢁ53% yield with regard
to pure SiS2) was dissolved in n-hexane. Colourless crystals of 1
were obtained at À18 °C. M. p. 56 °C, Anal. Calcd.: C-76.01; H-
7.80; S-0.00; Anal. Found: C-75.71; H-7.83; S-0.01 (indicates the
presence of traces of silanethiol or other sulfur-containing com-
3
pounds), 1H NMR (300 MHz) in CDCl3: 1.16 (d, 24H, JHH 6.9 Hz),
3.27 (sept, 4H, 3JHH, 6.9 Hz), 7.05–7.16 (m, 12H), 7.26–7.32 (m, pro-
ton in position 3 of the aromatic ring, 4H) ppm. 13C NMR
(125 MHz) in CDCl3: 22.9 (CH(CH3)2), 26.96 (CH(CH3)2), 119.2 (aro-
matic ring 6-C), 123.37 (aromatic ring 4-C), 126,67 (aromatic ring
5-C), 126,72 (aromatic ring 3-C), 138.91 (aromatic ring 2-C),
150.15 (aromatic ring C-O-Si) ppm. 29Si NMR (59.6 MHz) in CDCl3:
In our department a different method of synthesis of organoxy-
silicon compounds was elaborated i.e. the reaction of silicon disul-
fide with alcohols and phenols. The reactions of silicon disulfide
with primary, secondary and tertiary alcohols were studied in detail
À101.6 ppm. FT-IR (solid, cmÀ1
) 3070 m,br, 3033 m, 2967vs,
´
by Wojnowski, Pie˛kos and Wojnowska [14–16]. The reaction of SiS2
2931vs, 2912s,sh, 2885 m,sh, 2869s, 1944w, 1938w,sh, 1904w,
1873vw, 1830vw, 1794w, 1752w,br, 1718vw, 1703w, 1697vw,br,
1649vw, 1640vw, 1602 m, 1582s, 1493vs, 1450vs, 1384 m,
1363 m, 1348s, 1283s, 1245vs, 1234vs,sh 1195vs, 1159 m,
1156 m,sh, 1114 m, 1088vs, 1038s, 990vs, 968s, 939 m, 929w,
895 m, 859 m, 783vs, 758vs, 754s, 711s.
with 2,6-dimethylphenol and its products: aryloxysilanethiol and
aryloxycyclodisilthiane were first described in 1973 [17]. The most
important advantage of the method is the absence of strong acid
among the reaction products. Gaseous hydrogen sulfide that
evolves during the reaction is burnt outside the reaction vessel. It
allows to obtain pure substances without traces of acid catalyst that
could initiate the sol–gel processes and decomposition of the prod-
ucts. For us it is important since we apply the obtained products
such as silanethiols and silanols for further syntheses of metal com-
plexes e.g. [18–26]. Application of technical SiS2 without the need
for its purification is another favorable feature of the method.
Since 2010 we have re-investigated the reaction of SiS2 with
phenols and added new members to the aryloxysilanethiols family
[18,19]. In this paper we describe the continuation of the studies
and report the synthesis and crystal structure of tetra(2-isopropyl-
phenoxy)silane and tetra(2,6-diisopropylphenoxy)cyclodisilthiane.
The influence of the location of the alkyl substituents in phenol
substrate on the outcome of the reactions between silicon disulfide
and 2- or 2,6-substituted phenols is discussed.
The synthesis was repeated in lower temperatures within the
range 100–120 °C with other conditions unchanged and the same
product was obtained with similar yield. In 60 °C the reaction pro-
ceeded very slowly and the experiment was aborted.
2.1.2. Tetrakis(2,6-diisopropylphenoxy)cyclodisilthiane (2)
The compound was obtained as a side product during the syn-
thesis of tris(2,6-diisopropylphenoxy)silanethiol [19]. Almost all
conditions of the synthesis were the same as in [19] in spite of
the temperature that was lowered to 150–160 °C. SiS2 (40.8 g)
and 2,6-diisopropylphenol (257 g) were stirred and heated for ap-
prox. 30 h in 150–160 °C under the stream of nitrogen. After that
250 ml toluene was added to the reaction mixture and the unre-
acted SiS2 was removed by centrifugation. Toluene and the excess
phenol were removed by vacuum distillation. The crude product
was suspended in n-hexane but partly it did not dissolve thus
the suspension was filtered. The white precipitate obtained as a re-
sult of the filtration was dried and weighed (3.1 g, 2.8% yield, the
yield is given with regard to pure SiS2). Colourless blocks suitable
for X-ray diffraction measurements were obtained from toluene
at 0 °C. Melting point: 191–193 °C, Anal. Calcd.: C-69.51; H-8.26;
S-7.73; Anal. Found: C-69.46; H-7.83; S-7.43, 1H NMR (300 MHz)
Recently a great deal of attention has been sacrificed to various
types of weak interactions involving aromatic rings [27] that in-
clude: anion—p interaction [28], cation—p [29] as well as X–H—p
interactions where X = N, O, S, C e.g. [30]. It has been acknowledged
that such non-covalent forces are responsible for chemical (crystal
packing, supramolecular assembly) and biological (protein folding)
events. Since the participation of sulfur in hydrophobic S–H—
p
interactions is relatively little investigated [31,32] we present the
crystal structures of the obtained compounds as experimental
3
3
in CDCl3: 1.08 (d, 48H, JHH, 6.8 Hz), 3.26 (sept, 8H, JHH, 6.9 Hz),
6.99–7.11 (m, 12H) ppm. 13C NMR (125 MHz) in CDCl3: 23.4
(CH(CH3)2), 28.05 (CH(CH3)2), 123.86 (aromatic ring 4-C), 123,91
(aromatic ring 3,5-C), 139.03 (aromatic ring 2,6-C), 147.3 (aromatic
ring C-O-Si) ppm. 29Si NMR (59.6 MHz) in CDCl3 À58.1 ppm. FT-IR
examples of weak X–H—p interactions (X = C, S) and analyze the
S–H— bonding present in the polymorphic forms of tris(2,6-diiso-
p
propylphenoxy)silanethiol by means of FT-IR and DFT calculations
with the use of GGA BLYP-D XC potential at the TZP level.
2. Experimental section
(solid, crystalline sample cmÀ1
) 3081w,sh, 3063 m, 3030 m,
2969vs, 2931vs, 2907s,sh, 2887m,sh 2869s, 1923w, 1857w,
1796vw, 1730vw, 1712vw, 1695w, 1651w, 1598w,sh, 1588w,
1463s, 1445vs, 1384 m, 1362 m, 1330s, 1256s, 1185vs, 1148w,
1115s, 1107 m,sh, 1099s, 1056 m, 1045s, 968s, 934s, 905vw,
884w, 796s, 773s, 759vs.
2.1. Synthesis of studied compounds
Technical silicon disulfide (material that contained ꢁ60% of
pure SiS2 as confirmed by the analysis of sulfides content) was