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grow larger with deeper boundaries being observed upon
heating. The AFM images reveal that root-mean-square
(RMS) roughness of thin films increases with increasing the
annealing temperatures. RMS values for P1 and P2 thin films
are 0.426 and 0.434 nm at the room temperature, and 0.571
and 0.449 nm at the annealing temperature of 120 8C.
Because a deep grain boundary is not beneficial for intergran-
ular charge transport, the resulting negative contribution to
carrier mobility may lead to a partial cancellation of the
improvement in grain sizes. The compromise between grain
size and boundary interprets why the best charge transport
property was achieved at the annealing temperature of 120 8C.
The work was financially supported by the National Natural
Science Foundation of China (Grants 51473021, 21673258 and
21474116), the National Key Research and Development Pro-
gram of China (2016YFB0401100), and the Strategic Priority
Research Program of the Chinese Academy of Sciences
(XDB12030100). The high temperature GPC measurements are
supported by Open Research Fund of State Key Laboratory of
Polymer Physics and Chemistry, Changchun Institute of Applied
Chemistry, Chinese Academy of Sciences. The GIXRD analyses
were performed at the BL14B1 Station of Shanghai Synchro-
tron Radiation Facility (SSRF), 23A1 Station of National Syn-
chrotron Radiation Research Centre (NSRRC, Taiwan), and
1W1A station of Beijing Synchrotron Radiation Facility (BSRF).
The authors are very grateful to the assistance of scientists
from the stations during the experiments.
Figure 6 depicts GIXRD patterns of the as-spun and annealed
P1 and P2 films. From the diffraction patterns, we clearly
observed that both polymers formed lamellar molecular pack-
ing thin films, and adopted predominantly face-on molecular
packing mode in the solid state, judged from strong (010) dif-
fraction peaks appearing in out-of-plane orientation, whereas
no (010) diffraction peaks were found in the in-plane orienta-
tion. The as-spun P1 thin film displays strong (100) and weak
(200) diffraction peaks in the out-of-plane direction, and
(100), (001), (200), (300) diffraction peaks in the in-plane
direction. In its annealed thin film, the (200) and (300) dif-
fraction peaks in the in-plane direction become stronger, indi-
cating that crystallinity of polymers of the films are improved
and molecular packing become more ordered. Both polymers
exhibited distinctly (001) diffraction peak distance of 15.5 Å,
indicating the length of a co-repeat unit.35 Based on the locat-
ing positions of (100) diffraction peaks in as-spun thin films,
the d-d distances of polymers were estimated to be 22.77 Å
for P1 and 25.07 Å for P2. After annealing, d-spacing distan-
ces of P1 and P2 thin films increase to 23.03 and 25.23 Å,
respectively. On the basis of the positions of (010) diffraction
peaks in annealed thin films, the p 2 p stacking distances of
P1 and P2 were 3.82 and 3.84 Å, respectively.
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