LASER-INDUCED FLUORESCENCE SPECTROSCOPY OF SiF PRODUCED BY IR MULTIPLE-PHOTON DISSOCIATION OF SiF4

Article abstract of DOI:10.1016/0022-2860(90)80271-K

Excitation spectra and dispersed fluorescence were measured in the β-system (B²Σ-X²?) of the SiF radical produced by multiphoton dissociation (MPD) of SiF4 with a TEA CO2 laser.Within the limits of error no effect of the wavelength of the photolysis laser on the spectra was found.Formation and decay kinetics of SiF during and after IR laser excitation, as monitored by LIF, are also presented.The temporal behaviour if the SiF LIF signal was different for different wavelengths of the CO2 laser.For wavelengths close to the linear absorption band there was no induction period in the formation of SiF.The pressure dependence of the kinetics was different for the two CO2 laser branches.