
Journal of the Electrochemical Society p. 1376 - 1381 (1988)
Update date:2022-08-11
Topics:
Ng
Snyder
LaSala
Clemens
Fuerst
Thin film nickel-phosphorus alloys are electrodeposited at a high rate using a specialized rapid electrolyte flow system. Current densities up to 2. 33 A/cm**2, which are difficult to maintain in conventional plating processes, can be used to produce satisfactory films. The deposits are characterized by x-ray diffraction and differential scanning calorimetry. Phosphorus content decreases with increasing current density and is virtually independent of the electrolyte flow rate above 5. 7 m/s, where the system is operating in the turbulent regime. Deposit structure depends strongly on the phosphorus content; it is amorphous or highly microcrystalline at greater than 14 atom percent (a/o) and crystalline at less than 14 a/o.
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