
Electrochimica Acta p. 126 - 132 (2012)
Update date:2022-08-30
Topics:
Nam, Do Hwan
Kim, Ryoung Hee
Han, Dong Wook
Kwon, Hyuk Sang
A three-dimensional Sn electrode is fabricated by the electrodeposition of Sn on a porous Cu foam substrate that consists of grape-like Cu nanodeposits. It is revealed from the XRD results that a small amount of Cu6Sn 5 is formed at the interface of Sn deposits and the Cu foam, thereby forming Sn-Cu6Sn5/Cu foam electrode. The electrode shows better cyclic performance and higher charge capacity than the Sn electrode electrodeposited on a smooth Cu foil does. The improved electrochemical performances of the Sn-Cu6Sn5/Cu foam electrode is due to the fact that the porous Cu foam accommodates the volumetric expansion of Sn-Cu6Sn5, and hence inhibits the pulverization or delamination of the active materials from the substrate. Furthermore, ex situ XRD analysis and SEM observation demonstrate that Sn deposits electrodeposited on the Cu foam are gradually blended with the Cu deposits, causing the transformation of Sn into Cu6Sn5. The phase transformation of Sn into Cu6Sn5 enhances the bonding force between the Sn and the Cu foam, and reducing the volume changes of active materials during cycling.
SHENYANG COMEBOARD TECHNOLOGY CO., LTD
Contact:+86-24-25724626
Address:Room2210,Tianbao International Building,No.8-1 Weigong South Street,Tiexi District,Shenyang,China
Contact:18710867521(wechat)
Address:Rm10516,Galaxy Tech Building #2,No.25 Tangyan Rd,Hi-Tech Zone,Xi'an, China
CGeneTech (Suzhou, China) Co., Ltd.
Contact:+86-512-62956962
Address:Room 101,Bld C11,218 Xinghu Rd.,Suzhou industrial Park
Springchem New Material Technology Co.,Limited
website:http://www.spring-chem.com
Contact:86-21-62885108
Address:602B, Building 1, No. 641, Tianshan Road
Weifang Dongxing Chitosan Factory
website:http://dxchitosan.lookchem.com/
Contact:13475651157
Address:Weifang city ,shandong province
Doi:10.1016/j.bmcl.2021.128147
(2021)Doi:10.1016/j.jssc.2009.11.023
(2010)Doi:10.1021/ol0156796
(2001)Doi:10.1246/bcsj.81.515
(2008)Doi:10.1039/c9sc00591a
(2019)Doi:10.1016/S0040-4020(01)85510-1
(1994)