ARTICLE IN PRESS
314
N.M.A. Hadia et al. / Physica B 405 (2010) 313–317
their samples by sputtering. They emphasize the importance of
Ultraviolet photoelectron spectroscopy experiments for surface
electronic structure of tin oxide were performed only on single
various properties that SnO
nounced electrochromism.
x
should exhibit for attaining pro-
2 2
crystal SnO (0 01) and SnO (110) surfaces using synchrotron
In this investigation, we have employed spray pyrolysis
technique for SnO thin film deposition and discussed their
light and He I UV sources [20]. Cox et al. [21] found unusual band
+
x
2
gap emission at the clean SnO crystal surface after Ar bombard-
structural, electrical and optical properties. The deposition has
been carried out from aqueous stannic chloride solution, with a
postulation that the resultant films may have some water content
ment and Themlin et al. [35] also reported that the tin-derived
character of the band gap defect states was found in the perturbed
2
SnO (110) surface by the ion bombardment.
[
11], which would be in turn beneficial for better electrochromic
effect. Several experiments on electrochromism in SnO thin films
are underway and results will be disseminated elsewhere.
SnO is an n-type semiconductor with an optical band gap of
about 3.6 eV. SnO
rutile SnO , each atom is surrounded by a distorted octahedron of
O atoms with all Sn distances equal to 2.05 A. In comparison with
SnO , the structure and physical properties of SnO have not been
extensively investigated. The structure of SnO is layered, similar to
In this present work, we thoroughly examine the oxidation
processes of SnO powder heated at different temperatures in air
x
for 2 hr. The variations of the structural properties of SnO
x
that
2
have happened through SnO to SnO transformation are investi-
2
1
4
4
h
2
crystallizes in the rutile structure D [12]. In
gated. The effects of annealing temperatures on the optical and
structural properties of the products are discussed.
2
˚
2
2. Experimental details
1
4
that of PbO, with tetragonal structure D [12]. In this structure
the Sn is situated at the apex of a square pyramid with Sn-O
4
h
2
+
99.99% pure SnO powders were placed in an alumina boat
˚
positioned at the centre of the quartz tube. The temperature of the
furnace was rapidly ramped up to 250, 450, 650 and 850 1C and
kept for 2 hr. During the process, a constant flow of air was
distances equal to 2.224 A and O-Sn-O angles 11.731. Also, SnO
exists in an orthorhombic phase depending on the preparation
procedures. The optical band gap is in the range 2.5–3 eV.
The oxidation of tin and in particular the mechanism of the
adjusted. The crystal structure of the SnO
X-ray diffraction (XRD) using a DRON 4 utilizing Cu K
UV/visible absorption measurements were carried out on the SnO
x
were characterized by
oxidation process from SnO to SnO
2
have been extensively studied
a
radiation.
using various kinds of preparation techniques [13]. In general,
when tin oxide films were deposited on a high temperature
substrate by several deposition techniques, since it dissociates in
the gaseous SnO and forms oxygen-deficient SnO
post-annealing in an O environment should be given. Geurts
x
using a spectrophotometer (UV-210A, Shimadzu) in the wave-
length range between 190 and 900 nm. The IR studies were
carried out at room temperature using FIR -spectrometer Vertex
70 (Bruker).
x
(xo2) films,
2
et al. [14] and Reddy et al. [13] found that the annealed films reach
the final oxidation state either through simple oxidation of SnO
3. Results and discussions
(
(
direct transition) or through intermediate oxidation states
indirect transition), namely Sn or Sn , depending on the
2
O
3
3 4
O
3
.1. X-ray diffraction studies
deposition parameters.
According to most previous studies [13], the oxidation of SnO
and SnO was carried out without knowledge of the initial oxygen
content in as-deposited films and it was reported that the perfect
SnO formation could only be attained after above 600 1C
annealing in O exposure. Therefore the influences of initial
composition, which intimately depend on deposition parameters,
on the oxidation process and crystallization from SnO and SnO
The crystal structure and phase of the powder samples were
2
determined from the XRD patterns. Fig. 1 shows X-ray diffraction
(XRD) patterns of the SnO powder heating at different
temperatures (250, 450, 650 and 850 1C) for 2 hr in air and SnO
2
powder. All the peaks in Fig. 1(a and b) can be readily indexed as
2
2
tetragonal SnO (JCPDS, no. 06-0395) with cell parameters
2
˚
˚
were not yet systematically clarified as the annealing temperature
increased.
a=3.80 A and c=4.84 A. Comparing the XRD spectrum of the
standard tetragonal SnO powder (Fig. 1a), the XRD spectrum of
SnO powder heated at 450 1C (Fig. 1c) shows a very strong feature
of texture structure. Fig. 1c is indexed as (2 0 0), (110), (10 2),
(211), (3 01), (4 0 0) for Sn, (101), (110), (0 0 2), (2 0 0), (112),
(211), (10 3), (2 2 0), (0 0 4) for SnO and (110), (101), (2 0 0),
Moreover, many extensive investigations of the oxidation state
of tin oxide have been carried out using Auger electron spectro-
scopy (AES), core-level and valence-band (VB) X-ray photoelec-
tron spectroscopy (XPS), ion scattering spectroscopy (ISS), and
ultraviolet photoelectron spectroscopy (UPS) [15], but quantita-
tive analysis is complicated by the difficulty of preparing standard
samples with an accurately known composition, and the mod-
ification of surface composition by an incident electron or ion
beam.
Detailed analyses of the VB region led to the distinction
2
between SnO and SnO by UPS and VB XPS, where the presence
of the prominent leading peak of a Sn 5s-derived origin for SnO
and that of an O 2p-derived structure at the lower binding energy
side of the VB in SnO
the SnO and SnO phases [16]. Recently Themlin et al. [17]
and Sanjinrs et al. [18] reported that a sizable chemical shift of
2
uses the characteristic peak to distinguish
2
2
+
4+
0
.7 eV between Sn (SnO) and Sn (SnO
2
) by XPS. In a previous
2
+
report [19], we also found that the chemical shift between Sn
4
+
and Sn occurred as much as 1.070.02 eV in XPS analyses and 2–
71 eV in AES spectra. However, the chemical shift measured
from AES spectra was not reliable because main doublet Auger
4
transitions (M
resolved.
5 4 5 4 4 5
N , N4,5,M N , N4,5) in tin oxide were not well
Fig. 1. XRD spectra of source material SnO powders annealing at different
2
temperatures 250, 450, 650 and 850 1C for 2 h in air and SnO powder.