Journal of the Electrochemical Society p. 2192 - 2198 (1994)
Update date:2022-08-11
Topics:
Wang
Cao
Wang
Zhang
Face-to-face wafers were used to observe anomalous tungsten deposition in the gap-edge between wafers. In the WF6-H2 atmosphere, three regions are identified: (i) an open-deposition region (region A), (ii) a half-sealed deposition region (region B), and (iii) an etching or tunnel region (region C). In the WF6-Ar atmosphere, there are only two regions: (i) an open deposition region (region A'), and (ii) a half-sealed deposition region (region B'). The third region disappears because HF does not form in the absence of H2. Different chemical reactions are expected in different regions, dictated by the local gas composition. A half-sealed structure model proposed here is supported by thermodynamic calculations, and applied to explain encroachment, wormholes, and other well-known effects during the chemical vapor deposition of tungsten from tungsten hexafluoride.
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