APPLIED PHYSICS LETTERS 96, 253101 ͑2010͒
J. Tatebayashi,1,a͒ G. Mariani,1 A. Lin,1 R. F. Hicks,2 and D. L. Huffaker1,b͒
1Department of Electrical Engineering, University of California, Los Angeles, 420 Westwood Plaza,
Los Angeles, California 90095, USA
2Department of Chemical and Biomolecular Engineering, University of California, Los Angeles,
405 Hilgard Avenue, Los Angeles, California 90095, USA
͑Received 19 April 2010; accepted 27 May 2010; published online 21 June 2010͒
The authors report on the optical properties of GaInP/GaP double-heterostructure ͑DH͒ core-shell
nanowires ͑NWs͒ embedded in polydimethylsiloxane ͑PDMS͒ membranes. Self-catalyzed NW
structures are grown on Si ͑111͒ substrates by initiating with the formation of Ga droplets as a
catalyst which is followed by the growth of GaP core and GaInP DH shells. Optical characteristics
of GaInP/GaP DH core-shell NWs transferred from Si substrates into PDMS membranes show
enhanced 77 K light emission at 630 nm. The signal at 775 nm from the surface states of NWs can
be mitigated by embedding the NWs in a PDMS membrane that acts as a surface state passivant.
Recent technologies on organic light-emitting diodes
͑OLEDs͒ have been attracting growing attention for the re-
alization of low-cost, low-weight, full-color, and flexible
flat-panel display as well as other emissive products. Since
cence in 1987,1 many researchers have been devoted to the
realization and development of high-efficiency OLEDs and
flexible displays.2–4 Furthermore, the integration of organic/
inorganic materials into hybrid optoelectronic nanostructures
enables active devices that combine the diversity of organic
materials with the high-performance and well-established
optical/electronic properties of inorganic nanostructures. So
far, several groups have demonstrated hybrid light-emitting
diodes ͑LEDs͒, solar cells, or photovoltaics that combine
organic materials with semiconductor nanomaterials such
Compound semiconductor NWs, which are crystalline,
vertically aligned, and highly oriented crystalline nanostruc-
tures utilizing either the vapor-liquid-solid method8 or the
been intensively exploited as a key component for diverse
NWs on Si substrates have recently attracted practical inter-
est because of their compatibility with existing Si-based
electronic devices using mature and “low-cost” Si technolo-
gies. Therefore, hybrid combination of these well-
established, intriguing NW technologies with organic mate-
rials which includes polymers would enable the realization
of flexible organic/inorganic hybrid devices utilizing com-
pound semiconductor NWs such as flexible, low-cost LEDs/
displays, detectors, or solar cells which might be able to
circumvent the substantial life-time problems of the existing
all-organic devices by using semiconductor materials as an
In this study, we focus on the development of “self-
catalyzed” GaP NWs growth on Si to prevent the contami-
nation from foreign metal catalysts which causes the deep-
level trap in III–V NWs and in turn deteriorates device
substrates ͑Х0.4%͒ at room temperature ͑RT͒, and GaP-
based material systems have been of practical interests for
their application to LEDs in visible regimes such as red,
yellow, or green. All samples are grown by low-pressure
metal-organic chemical vapor deposition on Sb-doped Si
͑111͒ substrates at a total pressure of 60 Torr. After sequen-
tial cleaning processes with acetone, isopropanol, and de-
ionized water in an ultrasonic bath, the Si wafers are im-
mersed into diluted hydrochloric acid–hydrogen peroxide
mixture ͑HCl:H2O2:H2O=1:1:1͒ to remove the residual
microparticles on the surface. Next the wafers are etched in
5% hydrofluoric acid solution to remove a native oxide on
the surface and loaded immediately into the reactor. The
growth temperature for all the growth including Ga droplets
and GaP NWs is 480 °C. First, Ga droplets are deposited by
supplying trimethylgallium ͑TMG͒ with a mole flow of 2.2
ϫ10−5 mol/min for 30 s to seed NWs on the Si substrate
͓Fig. 1͑a͔͒. Next, the GaP core for the growth of GaInP/GaP
double-heterostructure ͑DH͒ NWs is formed by supplying
tertiarybutylphosphine and TMG with a TMG mole flow of
2.9ϫ10−5 mol/min at a V/III ratio of 27 for 10 min imme-
diately after the formation of Ga droplets ͓Fig. 1͑b͔͒. In this
growth process, Ga droplets act as a catalyst which allow for
vertical NW formation along the ͗111͘ direction. After the
growth of GaP core, GaInP DH layers are grown at a V/III
ratio of 27 which are comprised of thin GaInP layer with a
Ga:In flux ratio of 50:50 ͑GaInP-2͒ cladded by GaInP layers
with a Ga:In flux ratio of 70:30 ͑GaInP-1͒. The mole flow of
TMG is kept constant at 2.2ϫ10−5 mol/min and the growth
duration for the growth of GaInP-1 and GaInP-2 are 1 min
and 6 s, respectively. The Ga compositions of each layer,
GaInP-1 and GaInP-2, can be inferred from the x-ray diffrac-
tion analyses of the bulk material growth to be approxi-
mately 77% and 61%, respectively. After the growth of NWs,
polydimethylsiloxane ͑PDMS͒ base, which is a transparent,
a͒
Electronic mail: tatebaya@ee.ucla.edu.
Electronic mail: huffaker@ee.ucla.edu.
b͒
0003-6951/2010/96͑25͒/253101/3/$30.00
96, 253101-1
© 2010 American Institute of Physics
69.166.47.134 On: Fri, 28 Nov 2014 10:00:41