Size-Controlled Germanium Nanocrystals
A R T I C L E S
associated with Ge.17 As a result, interest in Ge-NC is increasing
in part because it is reasonable that quantum confinement effects
will emerge for larger particle sizes. It is well-known that
quantum confinement-induced photoluminescence from semi-
conductor nanocrystals is size-dependent. Charge retention
properties of oxide-embedded nanocrystals have also been
shown to be strongly dependent on particle size distributions.18
Still, the effects of nanocrystal composition and shape on these
properties are poorly understood and remain the subject of active
research. Hence, it is necessary to develop versatile synthetic
techniques that yield materials of well-defined size, shape, and
composition before the full potential of Ge-NCs can be realized
and practically implemented in the aforementioned applications.
Establishing such methods will also facilitate a fundamental and
comprehensive understanding of size-dependent properties of
Ge-NC.
and electrochemical46 etching of Ge wafers, and laser-induced
air breakdown processing.47 Although these synthetic techniques
have proven successful in the preparation of size-selected Ge-
NC, the use of elaborate experimental infrastructure and
specialized precursors limit their widespread use. In addition,
challenges including limited sample sizes, broad size distribu-
tions, and contamination from residual reaction byproducts could
limit the practicality of these methods. Of particular significance,
it has recently been proposed that residual organic byproducts
from solution-based syntheses could hinder accurate optical
characterization.48
Reports employing substoichiometric oxides of germanium
(GeOx, 0 e x e 2), germanium rich oxides (GRO), as Ge-NC
precursors are surprisingly sparse throughout the literature.
Analogous oxides have been studied extensively for Si (SROs)
and are versatile precursors for the generation of oxide embed-
ded Si-NC. We recently demonstrated that near-monodisperse
oxide-embedded Si-NC could be prepared by reductive thermal
processing of hydrogen silsesquioxane (HSQ, Si8O12H8).49,50 As
with other SiOx-based systems (0 e x e 2), these substoichio-
metric silicon oxides disproportionate into elemental Si and the
stoichiometric oxide, SiO2. There are only limited examples of
GeOx films that have been prepared by magnetron cosputtering51
and electron beam15,52 evaporation. As is the case for their
silicon-based equivalents, GROs disproportionate with appropri-
ate thermal processing and under ideal conditions yield Ge-NC
embedded in a GeO2-like matrix. Although successful, these
methods produced small quantities of Ge-NC and provided
limited control over particle size and size distribution.
To date, there has been much effort devoted to establishing
robust synthetic techniques that meet these requirements.
Existing methods for preparing FS-Ge-NC include solution-
phase reduction of Ge(II)19 and Ge(IV)17,20-23 precursors,
metathesis of Ge Zintl salts with GeCl4,24-26 supercritical
thermolysis,27,28 and solution-phase thermal decomposition.29-31
Oxide-embedded Ge-NC have been prepared by chemical vapor
deposition of GeO,16,32 ion implantation33,34 and cosputtering2,35-40
followed by thermal annealing, sol-gel processing,41-44 stain45
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Here we report the preparation of size-controlled germanium
nanocrystals embedded in germanium oxide (Ge-NC/GeO2) via
thermal processing of an organic functionalized germanium rich
oxide obtained from the hydrolysis and subsequent condensation
of phenyl trichlorogermane (PTG, C6H5GeCl3). The reaction
conditions of the present synthetic strategy were chosen to yield
a GRO with a Ge:O ratio of 1:1.5, the same “metal”:oxide ratio
exhibited by HSQ (Vide supra). The resulting sol-gel polymers,
(C6H5GeO1.5)n, obtained from the condensation of PTG, were
prepared using standard laboratory techniques, and subsequent
reductive thermal processing in a conventional tube furnace
yielded oxide embedded Ge-NC. The presented preparative
method yields near-monodisperse, oxide-embedded, luminescent
nanocrystals whose size may be tailored by varying thermal
processing conditions. The present approach also enables
straightforward liberation of FS-Ge-NC from the surrounding
oxide matrix upon exposure to warm (60 °C) water. The aqueous
liberation procedure described herein yields size-controlled FS-
Ge-NC bearing oxide/hydroxide surface termination.
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