Nanocrystalline Ge filaments in the pores of a mesosilicate

DOI: 10.1103/PhysRevB.52.R2285

Source and publish data:

(1995)

Update date:2022-08-11

Topics:

Authors:

Leon, R.

Margolese, D.

Stucky, G.

Petroff, P. M.

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Article abstract of DOI:10.1103/PhysRevB.52.R2285

Direct imaging showing pore filling of a mesopore (MCM-41) by a semiconductor has been achieved by transmission-electron microscopy (TEM). Ge was deposited using wapor-phase epitaxy where the mesotope wall hydroxylsacted as anchor points to seed the nucle

Full text of DOI:10.1103/PhysRevB.52.R2285

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