Silicon tetrachloride

Base Information

• Chemical Name: Silicon tetrachloride
• CAS No.: 10026-04-7
• Molecular Formula: Cl₄Si
• Molecular Weight: 169.898
• Hs Code.: 2812 19 90
• European Community (EC) Number: 233-054-0
• ICSC Number: 0574
• UN Number: 1818
• UNII: 96L75U0BM3
• DSSTox Substance ID: DTXSID0029711
• Nikkaji Number: J95.221D
• Wikipedia: Silicon tetrachloride,Silicon_tetrachloride
• Wikidata: Q413709
• Mol file: 10026-04-7.mol

Synonyms:silicon tetrachloride;tetrachlorosilane

Chemical Property of Silicon tetrachloride

Chemical Property:

• Appearance/Colour: Colourless or light yellow fuming liquid
• Vapor Pressure: 420 mm Hg ( 37.7 °C)
• Melting Point: -70 °C(lit.)
• Refractive Index: 1.413
• Boiling Point: 57.6 °C at 760 mmHg
• Flash Point: 57.6°C
• PSA: 0.00000
• Density: 1.547 g/cm³
• LogP: 2.37720
• Storage Temp.: Store below +30°C.
• Sensitive.: Moisture Sensitive
• Solubility.: Miscible with benzene, toluene, chloroform, petroleum ether, car
• Water Solubility.: reacts
• Hydrogen Bond Donor Count: 0
• Hydrogen Bond Acceptor Count: 0
• Rotatable Bond Count: 0
• Exact Mass: 169.849387
• Heavy Atom Count: 5
• Complexity: 19.1
• Transport DOT Label: Corrosive

Purity/Quality:

98% ^*data from raw suppliers

Tetrachlorosilane ^*data from reagent suppliers

Safty Information:

• Pictogram(s): C,Xi
• Hazard Codes: C,Xi
• Statements: 20/21/22-34-40-36/37/38-14-67-37-35-20/22
• Safety Statements: 26-7/8-45-36/37/39-28-27

MSDS Files:

SDS file from LookChem

Total 1 MSDS from other Authors

Useful:

• Chemical Classes: Toxic Gases & Vapors -> Chlorosilanes
• Canonical SMILES: [Si](Cl)(Cl)(Cl)Cl
• Inhalation Risk: No indication can be given about the rate at which a harmful concentration of this substance in the air is reached on evaporation at 20 °C.
• Effects of Short Term Exposure: The substance and the vapour are corrosive to the eyes, skin and respiratory tract. Corrosive on ingestion. Inhalation of the vapour may cause lung oedema. Inhalation of the vapour may cause asthma-like reactions. The effects may be delayed. Exposure could cause death. Medical observation is indicated.
• Physical Properties: Colorless fuming liquid; suffocating odor; density 1.52 g/mL; freezes at –68.9°C; boils at 57.7°C; vapor pressure 235 torr at 25°C; critical temperature 235°C; critical pressure 35.45 atm; critical volume 326 cm3/mol; decomposes in water forming silicic acid and HCl; soluble in benzene, toluence, chloroform, and ether.
• Uses: Silicon tetrachloride was first prepared by Berzelius in 1823. It is used widely in preparing pure silicon and many organosilicon compounds such as silicone. It also is used to produce smoke screens in warfare. . Silicon tetrachloride (SiCl4) may be used as an intermediate in the manufacture of high purity silicon. High purity silicon derived from silicon tetrachloride may find major applications in the semiconductors industry and photovoltaic cells. . High purity SiCl4 may be used to manufacture of optical fibers. Silicon tetrachloride (SiCl4), produced when both silicon and chlorine are combined at high temperatures, is used by the military to produce smoke screens. Chlorosilanes are chemical intermediates used in the production of silicon and silicon-containing materials, and in the semiconductor industry; they are also protecting agents for intermediates in pharmaceutical syntheses. The most important industrially utilized silicon halides are trichlorosilane and silicon tetrachloride. Silicon tetrachloride (SiCl4) can be manufactured by chlorination of silicon compounds such as ferrosilicon or silicon carbide, or by heating silicon dioxide and carbon in a stream of chlorine. It can also be obtained as a by-product in the production of zirconium tetrachloride, and in the past substantial quantities were produced by this route, which in recent decades has lost importance owing to the reduced demand for zirconium in nuclear facilities. Nowadays, industrial silicon tetrachloride is produced either by direct reaction of hydrogen chloride with silicon – this product mainly being employed as an intermediate in fumed silica production – or as the by-product of the production of silane for the microelectronics industry by disproportionation of trichlorosilane. Tetrachlorosilane, can be used as a coupling agent for the synthesis of amine from carboxylic acid and an amide. It can also be used in preparation of high purity silicon, used in photovoltaic cells, and in the semiconductors industry.
• Description: Chlorosilanes (general formula RnHmSiCl4-n-m, where R is an alkyl, aryl, or olefin group) are compounds in which silicon is bound to between one and four chlorine atoms, bonds with hydrogen and/or organic groups making its total number of bonds up to four. Chlorosilanes react with water, moist air, and steam, producing heat and toxic, corrosive hydrogen chloride fumes. Contact between gaseous hydrogen chloride and metals may release gaseous hydrogen, which is inflammable and explosive. Chlorosilanes react vigorously with oxidizing agents, alcohols, strong acids, strong bases, ketones, and aldehydes.

Technology Process of Silicon tetrachloride

There total 345 articles about Silicon tetrachloride which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 70.0%

diazoacetic acid ethyl ester (623-73-4) + trichlorosilane (10025-78-2) + germaniumtetrachloride (10038-98-9) → tetrachlorosilane (10026-04-7,53609-55-5)

Guidance literature:

In neat (no solvent); byproducts: N2, ClCH2COOCH2CH3; diazoester adding to a mixt. of silane and germane in a molar ratio 1:1:1, allowing to react for 48 h at 20°C; isolated by distn.;

DOI:10.1016/S0022-328X(00)87640-8

Reference yield: 62.0%

phosgene (75-44-5) + silica gel (112926-00-8,7631-86-9) → tetrachlorosilane (10026-04-7,53609-55-5)

Guidance literature:

In neat (no solvent); treatment of precipitated SiO2 with COCl2 in presence of sugarcoal at 900-1000 °C;;

Reference yield:

copper dichloride + silicon (7440-21-3) → tetrachlorosilane (10026-04-7,53609-55-5)

Guidance literature:

In neat (no solvent); reaction by heating of the mixture;;

DOI:10.1021/cr60100a004

upstream raw materials:

(benzyloxy)trichlorosilane

1,2-dichloro-benzene

aluminium trichloride

Methyltrichlorosilane

Downstream raw materials:

tetrakis-(2-chloro-ethoxy)-silane

benzylidene dichloride

4-methyl-pent-3-en-2-one

di-t-butoxydichlorosilane

Refernces

• 1、 Schumb, W. C.. "". . p. 587 - 595. Retrieved 1942.
• 2、 Zemany,Price. "-". . p. 4222. Retrieved 1948.
• 3、 Rochow, E. G.. "-". . p. 963 - 965. Retrieved 1945.
• 4、 Agre, C. L.,Hilling, W.. "-". . p. 3899 - 3902. Retrieved 1952.
• 5、 Baxter, G. P.,Weatherill, P. F.,Holmer, E. O.. "". . p. 1194 - 1197. Retrieved 1920.
• 6、 Jung, Dong Euy,Kang, Seung-Hyun,Han, Joon Soo,Lim, Weon Cheol,Park, Young-ae W.,Yoo, Bok Ryul. "Si-C coupling reaction of polychloromethanes with HSiCl3 in the presence of Bu4PCl: Convenient synthetic method for bis(chlorosilyl)methanes". . p. 3901 - 3906. Retrieved 2007.
• 7、 Goubeau,Behr. "-". . p. 2,6,9. Retrieved 1953.
• 8、 Anderson. "". . p. 3049. Retrieved 1947.
• 9、 Hyde, K. R.,Hooper, E. W.,Waters, J.,Fletcher, J. M.. "". . p. 428 - 434. Retrieved 1965.
• 10、 Frost,Rochow. "". . p. 201,203. Retrieved 1958.