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| CAS No.: | 10025-78-2 |
|---|---|
| Name: | Trichlorosilane |
| Molecular Structure: | |
|
|
|
| Formula: | Cl3HSi |
| Molecular Weight: | 135.452 |
| Synonyms: | Silicochloroform;Silicon chloride hydride (SiCl3H);CCRIS 9413;Trichloromonosilane;Trichlorosilane (HSiCl3);HSDB 890;Silane A-19;Silici-chloroforme;Triclorosilano;Silane,trichloro-; |
| EINECS: | 233-042-5 |
| Density: | 1.34 g/cm3 |
| Melting Point: | -127 °C |
| Boiling Point: | 31.8 °C at 760 mmHg |
| Flash Point: | -27 °C |
| Solubility: | Water: decomposes |
| Appearance: | Clear liquid |
| Hazard Symbols: |
 F+, C
|
| Risk Codes: | 12-14-17-20/22-29-35 |
| Safety: | 16-26-36/37/39-43-45-7/9-43A |
| Transport Information: | UN 1295 4.3/PG 1 |
| PSA: | 0.00000 |
| LogP: | 1.42000 |
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silicon
A
- 75-79-6
Methyltrichlorosilane
B
- 10026-04-7, 53609-55-5
tetrachlorosilane
C
- 10025-78-2
trichlorosilane
D
- 75-78-5
dimethylsilicon dichloride
| Conditions | Yield |
|---|---|
| With methylene chloride; copper In neat (no solvent) mixt. of CH3Cl/N2 (2:5) and Si-Cu (9:1) at 300°C;; | A 4% B n/a C n/a D 86.5% |
| With methylene chloride; copper In neat (no solvent) mixt. of CH3Cl/N2 (2:5) and Si-Cu (9:1) at 300°C;; | A 4% B n/a C n/a D 86.5% |
| With methylene chloride; copper In neat (no solvent) CH3Cl and Si-Cu mixt. (8:2) at 350°C;; |
- 141-57-1
n-propyltrichlorosilane
- 10025-78-2
trichlorosilane
| Conditions | Yield |
|---|---|
| With hydrogen; Rh, Re/C at 550℃; under 5807.73 Torr; for 10.1h; Product distribution / selectivity; | 82% |
| Conditions | Yield |
|---|---|
| In neat (no solvent) reaction at 300 °C;; | A 20% B 80% |
| In neat (no solvent) reaction at 300 °C;; | A 20% B 80% |
- 115-21-9
ethyltrichlorosilane
- 10025-78-2
trichlorosilane
| Conditions | Yield |
|---|---|
| With hydrogen; Rh, Re/C at 700℃; under 5947.36 Torr; for 17.8833h; Product distribution / selectivity; | 75.3% |
| Conditions | Yield |
|---|---|
| With hydrogen; Rh/C at 800℃; Product distribution / selectivity; | A 73.3% B 25.1% |
| Conditions | Yield |
|---|---|
| In neat (no solvent) SiCl4 reacted with H2 in thermo-plasma at 50 kW at 3500-5000 K; | 72.9% |
| In neat (no solvent) Kinetics; byproducts: hydrogen chloride; bubbling H2 through liq. SiCl4 at constant temp.; introducing into the discharge zone; various product ratios yield various H2:SiCl4 molar ratio, molar energy input, and pressure; gas chromy.; | 60% |
| at 900 - 1300℃; under 1125.11 - 3750.38 Torr; Product distribution / selectivity; |
- 75-79-6
Methyltrichlorosilane
- 10025-78-2
trichlorosilane
| Conditions | Yield |
|---|---|
| With hydrogen; Rh, Re/C at 550℃; under 4556.19 Torr; for 4.55h; Product distribution / selectivity; | 70.8% |
| Conditions | Yield |
|---|---|
| With CuO-ZnO-In2O3 mesocrystal microspheres Reagent/catalyst; | 61.2% |
| In not given heating of silicon washed with HCl and dried in a stream of HCl at 450-500 °C;; | |
| In not given heating of silicon washed with HCl and dried in a stream of HCl at 450-500 °C;; | |
| at 230 - 260℃; |
- 75-79-6
Methyltrichlorosilane
A
- 75-54-7
Dichloromethylsilane
B
- 10026-04-7, 53609-55-5
tetrachlorosilane
C
- 10025-78-2
trichlorosilane
| Conditions | Yield |
|---|---|
| With hydrogen; Rh/C at 700℃; Product distribution / selectivity; | A 5.5% B 28.2% C 22.9% |
| Conditions | Yield |
|---|---|
| copper(l) chloride at 525℃; Product distribution / selectivity; | 6.14% |
| at 525℃; Product distribution / selectivity; | 4.6% |
| at 500℃; under 22502.3 Torr; Product distribution / selectivity; Industry scale; |
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- Total:29 Page 1 of 1 1
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Consensus Reports
Reported in EPA TSCA Inventory.
Standards and Recommendations
DOT Classification: 4.3; Label: Dangerous When Wet, Flammable Liquid, Corrosive
Specification
1. Introduction of Trichlorosilane
The Trichlorosilane belongs to product categories of Reduction; Si (Classes of Silicon Compounds); Si-Cl Compounds; Si-H Compounds; Silicon Compounds (for Synthesis); Synthetic Organic Chemistry; Trichlorosilanes; Chloro Silanes; POSS Precursors and Intermediates; Protecting and Derivatizing Reagents; RSiCl3Protection and Derivatization; Silicon-Based; Silsesquioxanes: POSS Nanohybrids. This chemical is a clear liquid and should be stored in a ventilated, cool and dry place. Besides, it is the basic ingredient used in the production of purified polysilicons.
2. Properties of Trichlorosilane
Physical properties about Trichlorosilane are: (1)ACD/LogP: 4.77; (2)ACD/LogD (pH 5.5): 4.77; (3)ACD/LogD (pH 7.4): 4.77; (4)ACD/BCF (pH 5.5): 2501.35; (5)ACD/BCF (pH 7.4): 2501.35; (6)Enthalpy of Vaporization: 26.57 kJ/mol; (7)Boiling Point: 31.8 °C at 760 mmHg; (8)Vapour Pressure: 596 mmHg at 25 °C.
3. Structure Descriptors of Trichlorosilane
You could convert the following datas into the molecular structure:
1). Canonical SMILES: [Si](Cl)(Cl)Cl
2). InChI: InChI=1S/Cl3Si/c1-4(2)3
3). InChIKey: PPDADIYYMSXQJK-UHFFFAOYSA-N
4. Toxicity of Trichlorosilane
| Organism | Test Type | Route | Reported Dose (Normalized Dose) | Effect | Source |
|---|---|---|---|---|---|
| mammal (species unspecified) | LC50 | inhalation | 1gm/m3 (1000mg/m3) | LUNGS, THORAX, OR RESPIRATION: ACUTE PULMONARY EDEMA LIVER: FATTY LIVER DEGERATION BLOOD: OTHER CHANGES | Toksikologiya Novykh Promyshlennykh Khimicheskikh Veshchestv. Toxicology of New Industrial Chemical Substances. For English translation, see TNICS*. Vol. 3, Pg. 81, 1961. |
| mouse | LC50 | inhalation | 1500mg/m3/2H (1500mg/m3) | "Toxicometric Parameters of Industrial Toxic Chemicals Under Single Exposure," Izmerov, N.F., et al., Moscow, Centre of International Projects, GKNT, 1982Vol. -, Pg. 114, 1982. | |
| rat | LCLo | inhalation | 500ppm/4H (500ppm) | Union Carbide Data Sheet. Vol. 2/21/1979, | |
| rat | LD50 | oral | 1030mg/kg (1030mg/kg) | Journal of Industrial Hygiene and Toxicology. Vol. 31, Pg. 60, 1949. |
5. Safety Information of Trichlorosilane
When you are using this chemical, please be cautious about it. As a chemical, it is spontaneously flammable in air and causes severe burns. It is also harmful by inhalation and if swallowed. Besides, it reacts violently with water and liberates toxic gas. During using it, wear suitable protective clothing, gloves and eye/face protection. Keep container tightly closed and in a well-ventilated place away from sources of ignition. In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. If accident happens or you feel unwell seek medical advice immediately.
6. Preparation of Trichlorosilane
Preparation of Trichlorosilane: it is prepared by blowing hydrogen chloride through a bed of silicon powder at 300°C. The yield is about 80-90%. What's more, the reaction produces byproducts of silicon tetrachloride (chemical formula SiCl4), hexachlorodisilane (Si2Cl6), and dichlorosilane (H2SiCl2), which can be separated by distillation.
Si+3HCl→HSiCl3+H2