Welcome to LookChem.com Sign In|Join Free
  • or
TETRAKIS(TRIMETHYLSILOXY)SILANE, also known as Tetrakis(trimethylsilyloxy)silane (TTMS), is an organosilicon compound characterized by its colorless liquid appearance. It is widely utilized in various applications due to its unique chemical properties and ability to form nanostructured organosilicon polymer films.

3555-47-3

Post Buying Request

3555-47-3 Suppliers

Recommended suppliers

  • Product
  • FOB Price
  • Min.Order
  • Supply Ability
  • Supplier
  • Contact Supplier

3555-47-3 Usage

Uses

Used in Semiconductor Industry:
TETRAKIS(TRIMETHYLSILOXY)SILANE is used as a precursor for the formation of nanostructured organosilicon polymer films. This application is particularly relevant in the semiconductor industry, where these films are essential for creating advanced electronic devices and components.
Used in Plasma-Enhanced Chemical Vapor Deposition (PECVD) Process:
TETRAKIS(TRIMETHYLSILOXY)SILANE is used as a precursor in the PECVD process at atmospheric pressure. This method allows for the creation of thin films with precise control over their properties, making it a valuable tool in the development of advanced materials for various applications.
Used in the Synthesis of Low Dielectric Constant SiCOH Films:
In the field of material science, TETRAKIS(TRIMETHYLSILOXY)SILANE is used in conjunction with cyclohexane to synthesize low dielectric constant SiCOH films. These films are crucial for improving the performance of microelectronic devices by reducing signal propagation delays and power consumption.

Flammability and Explosibility

Notclassified

Check Digit Verification of cas no

The CAS Registry Mumber 3555-47-3 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 3,5,5 and 5 respectively; the second part has 2 digits, 4 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 3555-47:
(6*3)+(5*5)+(4*5)+(3*5)+(2*4)+(1*7)=93
93 % 10 = 3
So 3555-47-3 is a valid CAS Registry Number.
InChI:InChI=1/C12H36O4Si5/c1-17(2,3)13-21(14-18(4,5)6,15-19(7,8)9)16-20(10,11)12/h1-12H3

3555-47-3 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
  • Price
  • Detail
  • Alfa Aesar

  • (L06083)  Tetrakis(trimethylsiloxy)silane, 98+%   

  • 3555-47-3

  • 1g

  • 176.0CNY

  • Detail
  • Alfa Aesar

  • (L06083)  Tetrakis(trimethylsiloxy)silane, 98+%   

  • 3555-47-3

  • 5g

  • 534.0CNY

  • Detail
  • Alfa Aesar

  • (L06083)  Tetrakis(trimethylsiloxy)silane, 98+%   

  • 3555-47-3

  • 25g

  • 1066.0CNY

  • Detail
  • Alfa Aesar

  • (L06083)  Tetrakis(trimethylsiloxy)silane, 98+%   

  • 3555-47-3

  • 100g

  • 3373.0CNY

  • Detail
  • Aldrich

  • (454516)  Tetrakis(trimethylsilyloxy)silane  97%

  • 3555-47-3

  • 454516-5ML

  • 351.00CNY

  • Detail

3555-47-3SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 13, 2017

Revision Date: Aug 13, 2017

1.Identification

1.1 GHS Product identifier

Product name tetrakis(trimethylsilyl) silicate

1.2 Other means of identification

Product number -
Other names Tetrakis-trimethylsilyloxy-silan

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:3555-47-3 SDS

3555-47-3Relevant academic research and scientific papers

Trimethylsilyl Derivatives for the Study of Silicate Structures. Part 7. Calcium Silicate Structures

Calhoun, Harry P.,Masson, Charles R.

, p. 1282 - 1291 (1980)

A detailed study was made of the yield and products of trimethylsilylation of calcium orthosilicate (Ca2), rankinite (Ca3), and pseudowollastonite (Ca3) under various experimantal conditions.With hexamethyldisiloxane, chlorotrimethylsilane, and isopropylalcohol as reagents, in the absence of added water Ca2 yielded predominantly SiO4(SiMe3)x(Pri)4-x (x = 1-4) and a lesser amount of Si2O7(SiMe3)x(Pri)6-x (x = 2-6), Ca3 gave predominantly Si2O7(SiMe3)x(Pri)6-x (x = 2-6), and Ca3 gave predominantly Si3O9(SiMe3)x(Pri)6-x (x = 2-6) and Si3O10(SiMe3)x(Pri)8-x (x = 3-8).Mixed trimethylsilyl-isopropyl derivatives were converted to the fully trimethylsilylated derivatives SiO4(SiMe3)4, Si2O7(SiMe3)6, and Si3O10(SiMe3)8 on treatment with Amberlyst 15 ion-exchange resin in the presence of hexamethyldisiloxane.In the trimethylsilylation of Ca2 reaction of mineral itself is complete within ca. 6 min at room temparature, under the conditions employed, and the majority of unwanted side reactions which yield Si2O7 and Si3O10 derivatives occur during the first 3-4 min.Side reactions may be suppressed by increasing the proportion of isopropyl alcohol and decreasing that of Ca2 in the reagents.The presence of both isopropyl alcohol and chlorotrimethylsilane is necessary for reaction to occur.Isopropyl alcohol may be replaced by either ethyl alcohol or water, altough the yield is reduced.When isopropyl alcohol is replaced by water, only the fully trimethylsilylated derivatives are formed.The mechanism of the reaction is discussed and experimental conditions are described which gives highest yields of the desired products.

MANUFATURING METHOD FOR TETRAKIS(TRIALKYLSILYLOXY) SILANE, SEMICONDUCTOR THIN FILM HAVING POLYMER DERIVED FROM TETRAKIS(TRIALKYLSILYLOXY) SILANE, AND MANUFATURING METHOD FOR SEMICONDUCTOR THIN FILM

-

Paragraph 0064; 0097-0102; 0104, (2019/10/11)

Provided by the present invention are: a method for producing tetrakis (trialkylsilyloxy) silane represented by chemical formula 3, Si(OSiR^2_3)_4, including reaction between a compound represented by chemical formula 1, Si(OR^1)_n(OSiR^2_3)_(4-n), and a compound represented by chemical formula 2, SiX(R^2)_3; a semiconductor thin film including a polymer derived from tetrakis (trialkylsilyloxy) silane; and a method of producing a semiconductor thin film. The definitions of formulas 1 and 2 are as described in the specification. The present invention is able to produce tetrakis (trialkylsilyloxy) silane having high purity.COPYRIGHT KIPO 2019

O-Metalation of silanols and POSS silanols over Amberlyst-15 catalyst: A facile route to unsymmetrical siloxanes, borasiloxanes and germasiloxanes

Kuciński, Krzysztof,Hreczycho, Grzegorz

supporting information, p. 261 - 266 (2019/03/27)

A simple and highly practical Amberlyst-catalyzed direct O-metalation of silanols, POSS silanols and alkoxysilanes under mild conditions is proposed. This protocol can be applied to the synthesis of a wide range of important organosilicon derivatives such as siloxanes, germasiloxanes, borasiloxanes and functionalized silsesquioxanes. It is worth noting that Amberlyst-15 can be reused for further experiments and its catalytic activity in this process is well-preserved for several recycling steps.

Synthetic process of tetra-(trimethyl silica group) silane

-

Paragraph 0013-0020, (2018/05/15)

The invention relates to a synthetic process of tetra-(trimethyl silica group) silane and belongs to the field of organic synthetic chemistry. According to the invention, tetra-(trimethyl silica group) silane is produced by reaction under the condition of an acid catalyst by taking silicon tetrachloride and hexamethyldisiloxane as materials. After reaction is ended, vacuum filtration and standingfor layering are performed, an upper-layer solution is collected, trimethylchlorosilane is distilled out at normal pressure, and then reduced pressure distillation is performed to obtain an excessivehexamethyldisiloxane material and a tetra-(trimethyl silica group) silane product. The synthetic process has the advantages of being simple in operation of the production process, low in production cost, easy for separation, high in yield and good in quality, and having product content reaching 99.0% or above, tri-substituted byproduct content reaching 0.1% or below, and mole yield reaching 96.8%or above.

A four (three-siloxy) silicon synthetic method (by machine translation)

-

Paragraph 0009; 0010; 0011; 0012; 00013; 0014; 0015-0022, (2018/03/28)

This invention relates to a four (three-siloxy) silicon synthetic method, which belongs to the technical field of fine chemicals. The invention is firstly to silicon tetrachloride and trimethylchlorosilane according to the proportion in the input to the reactor, adding catalyst, stirring ice-[...] water reaction reactant layered, washing, drying and then distilled, to obtain four (three-siloxy) silicon product. The invention four (three-siloxy) silicon product content is high, the yield is high, production cost is very low, few by-products, environmental pollution is small. (by machine translation)

BRANCHED ORGANOSILOXANES USED AS HEAT TRANSFER FLUID

-

Paragraph 0036; 0037; 0048; 0049, (2018/02/06)

The invention relates to a method for operating a system at an operating temperature of between 300° C. and 500° C., using a heat transfer fluid comprising branched siloxanes of general formula (I) (R3SiO1/2), (SiO4/2) in which w represents integral values of between 4 and 20, z represents integral values of between 1 and 15, and R represents a methyl group, the sum of the fractions of all siloxanes of general formula (1) being at least 95 mass %, in relation to the whole heat transfer fluid.

Protecting and Leaving Functions of Trimethylsilyl Groups in Trimethylsilylated Silicates for the Synthesis of Alkoxysiloxane Oligomers

Yoshikawa, Masashi,Tamura, Yasuhiro,Wakabayashi, Ryutaro,Tamai, Misa,Shimojima, Atsushi,Kuroda, Kazuyuki

supporting information, p. 13990 - 13994 (2017/10/31)

The concept of protecting groups and leaving groups in organic synthesis was applied to the synthesis of siloxane-based molecules. Alkoxy-functionalized siloxane oligomers composed of SiO4, RSiO3, or R2SiO2 units were chosen as targets (R: functional groups, such as Me and Ph). Herein we describe a novel synthesis of alkoxysiloxane oligomers based on the substitution reaction of trimethylsilyl (TMS) groups with alkoxysilyl groups. Oligosiloxanes possessing TMS groups were reacted with alkoxychlorosilane in the presence of BiCl3 as a catalyst. TMS groups were substituted with alkoxysilyl groups, leading to the synthesis of alkoxysiloxane oligomers. Siloxane oligomers composed of RSiO3 and R2SiO2 units were synthesized more efficiently than those composed of SiO4 units, suggesting that the steric hindrance around the TMS groups of the oligosiloxanes makes a difference in the degree of substitution. This reaction uses TMS groups as both protecting and leaving groups for SiOH/SiO? groups.

Method for producing polyimidesiloxane

-

Paragraph 0039, (2018/10/16)

PROBLEM TO BE SOLVED: To provide a method for synthesizing siloxanes at will in good yield while maintaining high structural controllability, which can be applied to substrates having various substituents.SOLUTION: The method comprises reacting benzyloxysilanes and silicon halides in the absence of hydrogen using a catalyst comprising a transition metal or a compound thereof, preferably a metal of group 9 or group 10 of the periodic table or a compound thereof. Thereby, corresponding siloxanes can be produced safely and simply in high yield under a mild reaction condition accompanied by elimination of a benzyl halide. Especially, by using an active carbon-supported catalyst as a heterogeneous catalyst, the target siloxanes can be separated easily.

An efficient catalytic approach for the synthesis of unsymmetrical siloxanes

Hreczycho, Grzegorz

, p. 67 - 72 (2015/01/30)

The potential for expanding the variety of catalytic methods for siloxane bond formation is explored. Alkoxysilanes react with methylallylsilanes in the presence of scandium(III) trifluoromethanesulfonate to yield disiloxanes and isobutene. The reaction p

In a method of manufacturing a condition anhyride silanolated

-

Paragraph 0035, (2018/03/24)

PROBLEM TO BE SOLVED: To provide a method capable of synthesizing silanol under an anhydrous condition and a mild condition, adapting to substrates having various substituents, and producing siloxanes freely at an excellent yield, while having high structure controllability.SOLUTION: By a hydrogen addition reaction in which benzyloxy-substituted silanes are used as a silanol precursor, and a metal in the group 9 or 10 on the periodic table or a metal compound is used as a catalyst, corresponding silanols can be produced safely and easily at a high yield under an anhydrous condition and a mild condition, and especially object silanols can be isolated easily by using a carbon-carrying catalyst.

Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1 Customer Service

What can I do for you?
Get Best Price

Get Best Price for 3555-47-3