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HEXACHLORODISILOXANE is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

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  • 14986-21-1 Structure
  • Basic information

    1. Product Name: HEXACHLORODISILOXANE
    2. Synonyms: HEXACHLORODISILOXANE;hexachloro-disiloxan;1,1,1,3,3,3-Hexachloropropanedisiloxane;1,3-Dichloro-1,1,3,3-tetrachloropropanedisiloxane;Hexachloropropanedisiloxane;Oxybis(trichlorosilane);Hexachlorodisiloxane,96%;Perchlorodisiloxane
    3. CAS NO:14986-21-1
    4. Molecular Formula: Cl6OSi2
    5. Molecular Weight: 284.89
    6. EINECS: 239-070-4
    7. Product Categories: Dielectric MaterialsProtection and Derivatization;Silicon-BasedSelf Assembly&Contact Printing;Organic Conductors and Photovoltaics: OFET and OPV Materials;Organic Electronics and Photonics;Protecting and Derivatizing Reagents;Silane Coupling Agents/Adhesion Promoters;Trichlorosilanes
    8. Mol File: 14986-21-1.mol
  • Chemical Properties

    1. Melting Point: <0°C
    2. Boiling Point: 137 °C(lit.)
    3. Flash Point: 18 °C
    4. Appearance: Clear colorless to light yellow liquid
    5. Density: 1.575 g/mL at 25 °C(lit.)
    6. Vapor Pressure: 9.01mmHg at 25°C
    7. Refractive Index: n20/D 1.428(lit.)
    8. Storage Temp.: N/A
    9. Solubility: N/A
    10. CAS DataBase Reference: HEXACHLORODISILOXANE(CAS DataBase Reference)
    11. NIST Chemistry Reference: HEXACHLORODISILOXANE(14986-21-1)
    12. EPA Substance Registry System: HEXACHLORODISILOXANE(14986-21-1)
  • Safety Data

    1. Hazard Codes: F,C
    2. Statements: 11-34-37
    3. Safety Statements: 16-26-36/37/39-45
    4. RIDADR: UN 2985 3/PG 2
    5. WGK Germany: 3
    6. RTECS:
    7. F: 3-10-21
    8. TSCA: Yes
    9. HazardClass: 8
    10. PackingGroup: III
    11. Hazardous Substances Data: 14986-21-1(Hazardous Substances Data)

14986-21-1 Usage

Chemical Properties

clear colorless to light yellow liquid

Check Digit Verification of cas no

The CAS Registry Mumber 14986-21-1 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,4,9,8 and 6 respectively; the second part has 2 digits, 2 and 1 respectively.
Calculate Digit Verification of CAS Registry Number 14986-21:
(7*1)+(6*4)+(5*9)+(4*8)+(3*6)+(2*2)+(1*1)=131
131 % 10 = 1
So 14986-21-1 is a valid CAS Registry Number.
InChI:InChI=1/Cl6OSi2/c1-8(2,3)7-9(4,5)6

14986-21-1SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name trichloro(trichlorosilyloxy)silane

1.2 Other means of identification

Product number -
Other names hexaclorodisiloxane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:14986-21-1 SDS

14986-21-1Related news

Infrared spectrum of matrix-isolated HEXACHLORODISILOXANE (cas 14986-21-1) and low frequency Raman spectrum of the gas07/18/2019

The IR spectra of hexachlorodisiloxane, (SiCl3)2O, in argon, krypton and nitrogen matrices have been investigated in the region from 1500–200 cm−1. The data in all three of the matrices are unusual in that the antisymmetric Si-O-Si stretch is a doublet. The maximum separation of the doublet is ...detailed

14986-21-1Relevant articles and documents

DIRECT MASS SPECTROMETRIC IDENTIFICATION OF SILICON OXYCHLORIDE COMPOUNDS.

Marra,Kreidler,Jacobson,Fox

, p. 1571 - 1574 (1988)

Silicon oxychloride compounds formed during the high temperature reaction of Si and SiC with Cl//2/O//2 mixtures at 930 degree and 950 degree C have been directly observed with an atmospheric pressure mass spectrometer sampling system. Molecules with the formulas Si//2OCl//6 and Si//3OCl//8 have been identified. These compounds are very likely formed by a gas phase reaction between the oxygen gas in the system and silicon tetrachloride which is produced by chlorination of the silicon-based material.

Thermolysis of Si2OCl6

Wilkening, Andreas,Binnewies, Michael

, p. 21-25n (2000)

The thermolysis of gaseous Si2OCl6 leads to a mixture of higher chlorosiloxanes with up to 8 silicon atoms per molecule. The unexpected formation of larger molecules from smaller ones by high temperature pyrolysis is due to three basic reactions: a) Formation of highly reactive O=SiCl2 as an intermediate, b) insertion Of O=SiCl2 into Si-Cl bonds (growth reaction), and c) thermally induced elimination of SiCl4 from chlorosiloxanes formed in (b). Temperature and time dependencies of the thermolysis have been investigated and are discussed.

METHOD OF MAKING HALOSILOXANE

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Paragraph 0044-0046, (2019/01/06)

A method of producing a halosiloxane, the method comprising: combining water, a halosilane, and first solvent, where the first solvent has a water solubility of > 1.5 grams in 100 ml of solvent, to form a reaction mixture having a temperature above the melting point temperature of the solvent, partially hydrolyzing and condensing the halosilane to form a reaction product mixture comprising the halosiloxane, the solvent, a hydrogen halide and unreacted halosilane, and, optionally, adding a second solvent with a boiling point the boiling point of the halosloxane to the reaction mixture or the reaction product mixture.

METHOD OF MAKING A HALOSILOXANE

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Paragraph 0041; 0051; 0052, (2019/01/06)

A method of producing a halosiloxane, the method comprising: i) combining water, a halosilane, and a first solvent to form a reaction mixture, ii) partially hydrolyzing and condensing the halosilane to form a reaction product mixture comprising the halosiloxane, the solvent, unreacted halosilane, and hydrogen halide, iii) adding a second solent, where the second solent has a boiling point the boiling point of the halosiloxane, to the reaction mixture in i) or to the reaction product mixture in ii), and iv) recovering the halosiloxane from the reaction product mixture.

Gas-Phase Reaction of Hexachlorodisilane with Acetone

Chernyshev,Komalenkova,Kapitova,Bykovchenko,Khromykh,Bochkarev

, p. 753 - 755 (2007/10/03)

Gas-phase reaction between hexachlorodisilane and acetone was studied at 520-560°C. Hexachlorodisiloxane, 1-allyl-1,1,3,3,3-pentachlorodisiloxane, 1,1,3,3,3-pentachloro-1-vinyldisiloxane, and 1,1,3,3,3-pentachloro-1-vinyloxydisiloxane were found to be major reaction products, and a mechanism of their formation was proposed.

The SiO/PN Isoelectronic Pair, I Perchlorocyclosiloxanes and Perchlorocyclophosphazenes. Vibrational Spectra and X-Ray Structure Analysis of (Cl2SiO)3 and (Cl2SiO)4

Wannagat, Ulrich,Bogedain, Gabriele,Schervan, Adrian,Marsmann, Heinrich C.,Brauer, David J.,et al.

, p. 931 - 940 (2007/10/02)

Hexachlorocyclotrisiloxane (2) and octachlorocyclotetrasiloxane (4) were prepared by reaction of SiCl4 with O2 at 955 deg C.Their mass spectra are compared with those of the isoelectronic cyclophosphazenes.The vibrational spectra of 2 and 4 are very similar and closely related to that of (PNCl2)3, but clearly different from that of the puckered (PNCl2)4 molecule.The X-ray examination of 2 and 4 reveals planarity of the (SiO)n, n = 3 and 4 ring systems, with d(Si-O) on average 1.619(4) and 1.584(3) Angstroem, respectively.

Preparation of Hexafluorodisilane and Reactions of Hexafluorodisilane and Hexachlorodisilane with Sulfur Trioxide

Suresh, Bettadapura Srinivasaiah,Padma, Doddaballapur Krishnamurthy

, p. 1867 - 1868 (2007/10/02)

Hexafluorodisilane has been prepared by the fluorination of hexachlorodisilane or hexabromodisilane by potassium fluoride in boiling acetonitrile, in yields approximating 45 and 60percent respectively.Hexafluorodisilane has been characterised by infrared

Trimethyl- and trichlorosilylcobalt tetracarbonyls and the hydrosilation of ethylene

Baay, Yvonne Louise,MacDiarmid, Alan G.

, p. 986 - 994 (2008/10/08)

The new compound (CH3)3SiCo(CO)4 was synthesized by the reaction of (CH3)3SiH with either Co2(CO)8 or HCo(CO)4. The interaction of Cl3SiH or CH3S

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