
Journal of Physical Chemistry p. 4522 - 4525 (1982)
Update date:2022-08-03
Topics:
Dohmaru, Takaaki
Nagata, Yoshio
Photolytic reactions of mixtures of HSiCl3 and cis-C4H8 have been investigated between 425 and 525 K in the gas phase.It was found that .SiCl3 radicals induced cis-trans isomerization of cis-C4H8 above 425 K.The rates of the isomerization and of the simultaneous formation of sec-C4H9SiCl3 have been measured at varying HSiCl3 concentrations.The kinetic treatment of these results leads to log
guide(suzhou) fine materials co. ltd
Contact:0512-80972173
Address:21st Building, No.369 Lushan Rd, New District Suzhou China 215129
Hangzhou Yingshanhua Pigment Chemicals Co.,Ltd.
Contact:+86-0150-58101658
Address:Nanyang Economic DevelopmentZong,Xiaoshan,Hangzhou,China
Ji'an Kexin Trade Co., Ltd.(expird)
Contact:86-0796-8187704 18507063190
Address:ji'an jiangxi
Rudong Zhenfeng Yiyang Chemical Co., Ltd.
Contact:0513-84573047
Address:South Fengli Town, Rudong County, Jiangsu Province, China
Suzhou Wedo Chemicals Co., Ltd.
Contact:86 512 58100425
Address:Zonger Road, DongSha Industry Park , Zhangjiagang, Jiangsu, China
Doi:10.1055/s-1979-28626
(1979)Doi:10.1016/j.bmcl.2017.08.012
(2017)Doi:10.1021/jo060073m
(2006)Doi:10.1007/BF00911912
(1979)Doi:10.1016/j.ejmech.2015.12.015
(2016)Doi:10.1002/jlcr.2580150127
(1978)