
Tetrahedron Letters p. 3989 - 3990 (1999)
Update date:2022-07-30
Topics:
Dinsmore, Christopher J.
Zartman, C. Blair
The methanesulfonyl protecting group for a phenol is conveniently unmasked under the conditions of the S(N)Ar reaction with an activated aryl halide, producing diarylether products directly. The method is advantageous when the preparation of a phenol substrate requires O-protection, since the selection of the robust methanesulfonate as a latent phenol obviates a deprotection step prior to the S(N)Ar reaction.
View MoreContact:86-510-82853889
Address:Rm.3732, No.18-2,Yonghe Rd.,Wuxi,Jiangsu,214023,China
Zhejiang Chemicals Import & Export Corporation (ZHECHEM)
Contact:+86-571-87046953
Address:No. 37, Qingchun Road
Contact:0833-5590788/5590338/5590055
Address:Victory in the town of Red Star Village,Mount Emei City,industrial concentration area storage processing logistics parkpark
Guangzhou Reachin Chemical Co., Ltd
Contact:+86-20-37087379 ext.604
Address:A122C-1, Tianyuan Plaza, 401 Tianyuan Rd., Tianhe, Guangzhou, China
Qingzhou Baibang import and export co.,Ltd
Contact:+86-536-3265899
Address:No.338, Tuoshan Road
Doi:10.1016/j.tet.2009.11.111
(2010)Doi:10.1002/jhet.5570360208
(1999)Doi:10.1039/j39690001325
(1969)Doi:10.1021/jo00829a084
(1970)Doi:10.1016/S0039-128X(69)80011-5
(1969)Doi:10.1021/ja01033a033
(1969)