Preparation of BN films by r.f. thermal plasma chemical vapour deposition

DOI: 10.1007/BF00367890

Source and publish data:

Journal of Materials Science p. 713 - 720 (1996)

Update date:2022-08-18

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Authors:

Matsumoto

Nishida Nishida

Akashi Akashi

Sugai Sugai

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Article abstract of DOI:10.1007/BF00367890

Boron nitride films were prepared at 1 atm by r.f. thermal plasma chemical vapour deposition from the gas systems of Ar-BF₃-N₂ (or NH₃, NF₃)-H₂, Ar-BCl₃-N₂ (or NH₃, NF

Full text of DOI:10.1007/BF00367890

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