MECHANISM OF THE PHOTOOXIDATIVE CLEAVAGE OF α-METHYLSTYRENE IN DRY MEDIA

Article abstract of DOI:10.1016/S0040-4020(01)85853-1

The influence of the nature of different active sites on the solid surface is analysed in the photoxidative cleavage of α-methylstyrence (electron-rich olefin) adsorbed on the solid.The process takes place on acid on basic solids giving PhCOCH3 and PhCO2H.Benzoic acid is produced from acetophenone.Selective poisoning experiments of the active sites are carried out in order to determine the nature of the solid surface activesites that act in the process.The Lewis acid-oxidizing sites of the acidsolids and the Lewis basic-reducing sites of basic solids are responsible for the photoxidative cleavage of this olefin.These sites seems to be electron carriers in the process.