D.M. Trichês et al. / Journal of Alloys and Compounds 505 (2010) 762–767
763
Due to the technological importance of the Al–Sb system and
nanostructured materials, we focused our research on producing
AlSb in nanometric form by MA. Since the MA technique yields
materials containing a high concentration of defects, we inves-
tigated the influence of these defects on the thermal diffusivity
measured by photoacoustic absorption spectroscopy (PAS). This
paper reports the results of XRD and PAS measurements on AlSb
produced by MA.
achieved through carrier–phonon interactions (phonon emis-
emission results in cooling of the carriers and heating of the
lattice until the carrier and lattice temperatures become equal.
This process is called carrier cooling [22]. González de la Cruz
and Gurevich [23,24] reported the calculation of electron and
phonon temperature distribution functions in semiconductors
and they also carried out a deeper analysis of these temperature
distribution functions in PAS measurements.The contribution
of this process to the PAS signal decreases exponentially with
the modulation frequency according to the equation
2. Theoretical background
Thermal diffusivity is defined as ˛ = k/ꢀc, where k is the ther-
mal conductivity, ꢀ the mass density and c the specific heat. It is an
important physical parameter due not only to its intrinsic physical
interest but also to its use in the modeling and designing of tech-
nological devices based on semiconductor materials. Physically, the
equilibrium in a given material. As in the case of the optical absorp-
tion coefficient, its value is different for each material. Furthermore,
the thermal diffusivity is known to be strongly dependent on the
effects of compositional and microstructural variables [20], as well
as processing conditions [21]. Thus, an appropriate strategy to mon-
itor the structural changes in mixtures submitted to the MA process
is to measure the ˛ parameter.
When a modulated light beam impinges on the material inside
a photoacoustic gas cell, the absorbed light is converted into peri-
odic heat and a PAS signal is created. The dependence of the PAS
signal on the optical absorption coefficient and the light-to-heat
conversion efficiency may be used to determine the nonradiative
de-excitation efficiency, the photoinduced energy conversion, etc.
The PAS signal is directly proportional to the light-to-heat con-
version efficiency due to nonradiative processes in the material
[20]. For a thermally thick semiconductor sample, there are four
processes that may contribute to the PAS signal:
ꢀ
A
S = exp(−a f )
(1)
f
√
ꢁ
where a = ls
⁄
˛, f is the modulation frequency, ls is the sample
thickness, and ˛ its thermal diffusivity. The PAS signal phase
shows a modulation frequency dependence of the type
ꢀ
ꢁ
˚
=
− a
f
(2)
ph
2
when this process is present, it occurs in the low frequency
range;
(2) Nonradiative bulk recombination: a complete relaxation of the
system is reached after electron and hole recombine, either
radiatively or nonradiatively. When nonradiative recombina-
tion of excess electron–hole pairs occurs after diffusion, it takes
√
place over a distance Dꢂ. The contribution of this process to
the PAS signal shows a modulation frequency dependence of
the type f−1.5. The thermal diffusivity ˛, carrier diffusion coef-
ficient D, surface recombination velocity v, and recombination
time ꢂ can be determined by fitting the PAS signal phase to the
expression given by Pinto Neto et al. [25],
ꢁ
ꢂ
ꢁ
(bD/v)(ωꢂeff + 1)
˚
=
+ tan−1
,
(3)
ph
2
2
(bD/v)(1 − ωꢂeff) − 1 − (ωꢂeff
)
√
where ꢂeff = ꢂ(D⁄
˛
s − 1), b =
⁄˛, and ω = 2ꢁf . When present,
ꢁf
(1) Intraband nonradiative thermalization (thermal diffusion):
when the absorbed photon energy is greater than the band gap,
an electron is created in the conduction band and a hole is left
in the valence band. The excess energies of the electron (the
energy difference between the lower edge of the conduction
band and the initial energy of the photogenerated electron)
and hole (the energy difference between the upper edge of
the valence band and the initial energy of the photogener-
ated hole) appear in the respective carriers as kinetic energy.
The initial electron and hole distributions are not Boltzmann-
like, and the first step toward establishing equilibrium is for
the electrons and holes to interact among themselves, through
carrier-carrier collisions and intervalley scattering, to estab-
lish separate Boltzmann distributions of electrons and holes.
The Boltzmann distributions of electrons and holes can then be
separately assigned electron and hole temperatures that reflect
the distributions of kinetic energy in the respective charge car-
rier populations. If photon absorption produces electrons and
holes, each with initial excess kinetic energy at least kT above
the conduction and valence bands, both initial carrier temper-
atures are always above the lattice temperature; these carriers
are called hot carriers (i.e., hot electrons and hot holes). This
first stage of relaxation or equilibration occurs very rapidly
(<100 fs), and this process is often referred to as carrier thermal-
ization (i.e., establishment of a thermal distribution described
by Boltzmann statistics). The next step of equilibration is for
the hot electrons and hot holes to reach equilibrium with the
lattice. The initial lattice temperature is the room temperature,
which is lower than the initial hot-electron and hot-hole tem-
peratures. Equilibrium of the hot carriers with the lattice is
this process occurs in the high frequency range after intraband
nonradiative thermalizations;
(3) Nonradiative surface recombination: when nonradiative sur-
face recombination of excess electron–hole pairs occurs, it takes
place at the sample surface. The contribution of this process to
the PAS signal shows a modulation frequency dependence of
the type f−1.0. Similarly to process (2), the ˛, D, v, and param-
eters can be determined by fitting the PAS signal phase to the
expression given by Pinto Neto et al. [25]. When present, this
process occurs in the high frequency range after the nonradia-
tive bulk recombination process; and
(4) Thermoelastic bending: when a temperature gradient is gener-
ated within the sample, across its thickness, the thermoelastic
bending process contributes to the PAS signal. This contribution
shows a modulation frequency dependence of the type f−1.0
.
The thermal diffusivity ˛ can be determined by fitting the PAS
signal phase to the expression
ꢃ
ꢄ
1
˚
= ꢃ0 + tan−1
,
(4)
ꢀ
ph
a
f − 1
where the constant a is the same defined for process (1). The PAS
signal for processes (3) and (4) shows the same dependence on
the modulation frequency. However, the PAS signal phase for
each process has a different dependence on the modulation fre-
quency. Thus, analysis of the PAS signal phase can be used to
distinguish these processes and determine the thermal diffusiv-
ity ˛. When present, this process occurs in the high frequency
range after the nonradiative surface recombination process.In