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DOI: 10.1063/1.107535

Source and publish data:

Applied Physics Letters p. 1522 - 1524 (1992)

Update date:2022-08-11

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Authors:

Katz, A.Katz, A.

Feingold, A.Feingold, A.

El-Roy, A.El-Roy, A.

Pearton, S. J.Pearton, S. J.

Lane, E.Lane, E.

et al.et al.

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Article abstract of DOI:10.1063/1.107535

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Full text of DOI:10.1063/1.107535

Tungsten metallization onto InP prepared by rapid thermal lowpressure chemical  
vapor deposition of WF6 and H2  
A. Katz, A. Feingold, A. ElRoy, S. J. Pearton, E. Lane, S. Nakahara, and M. Geva  
Citation: Applied Physics Letters 61, 1522 (1992); doi: 10.1063/1.107535  
View online: http://dx.doi.org/10.1063/1.107535  
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/61/13?ver=pdfcov  
Published by the AIP Publishing  
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:  
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:  
128.114.34.22 On: Wed, 26 Nov 2014 03:18:51  
This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:  
128.114.34.22 On: Wed, 26 Nov 2014 03:18:51  
This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:  
128.114.34.22 On: Wed, 26 Nov 2014 03:18:51  

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