Photolysis Wavelength Dependence of the Effect of Xenon on the Production of C2*(d3Πg) by Ultraviolet Multiphoton Dissociation

Article abstract of DOI:10.1021/j100210a002

We report on the effect of Xe buffer gas on the C₂(d^{<*>3_{Πg <*> a}<*>3}Π_u) emission which results from the excimer laser-induced multiphoton fragmentation of acetylene, triethylenediamine (Dabco), and benzene.We find that, upon addition of Xe, normal quenching of this emission occurs for 248-nm (KrF) photolysis of the above molecules, while an unusual enhancement is found for 193-nm (ArF) photolysis.Other radical emmissions resulting from the same process, e. g., CH(A^<*>2Δ <*> X^<*>2Π) and CN(B^<*>2Σ⁺ <*> X^<*>2Σ⁺), show normal quenching at both wavelengths.The possible mechanisms of this unusual enhancement are discussed.