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4353-77-9

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4353-77-9 Usage

Uses

Trimethylsilyl chlorosulfonate may be used:in the sulfonation of small organic molecules in the synthesis of sulfonated polysulfone as sulfonating agent in the preparation of nano-structured organic-inorganic membranes for proton exchange membrane fuel cells (PEMFC) based on methacrylate and epoxy polymeric structures in the preparation of sulfonated polysulfone (sPS)/titanium dioxide (TiO2) composite membranes for use in PEMFCs in the preparation of iodosobenzene sulfate, required for the synthesis of cyclic sulfates

General Description

Trimethylsilyl chlorosulfonate is commonly employed as sulfonating agent.

Check Digit Verification of cas no

The CAS Registry Mumber 4353-77-9 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 4,3,5 and 3 respectively; the second part has 2 digits, 7 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 4353-77:
(6*4)+(5*3)+(4*5)+(3*3)+(2*7)+(1*7)=89
89 % 10 = 9
So 4353-77-9 is a valid CAS Registry Number.
InChI:InChI=1/C3H9ClO3SSi/c1-9(2,3)7-8(4,5)6/h1-3H3

4353-77-9 Well-known Company Product Price

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  • Aldrich

  • (359742)  Trimethylsilylchlorosulfonate  99%

  • 4353-77-9

  • 359742-50ML

  • 740.61CNY

  • Detail

4353-77-9Synthetic route

bis(trimethylsilyl)sulphate
18306-29-1

bis(trimethylsilyl)sulphate

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

Conditions
ConditionsYield
With thionyl chloride at 120℃;A 92%
B 97%
With thionyl chloride at 70 - 120℃; Yields of byproduct given;A n/a
B 97%
With thionyl chloride at 80 - 120℃;A n/a
B 97%
With thionyl chloride at 120℃;A n/a
B 97%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

Conditions
ConditionsYield
With sulfur trioxide at 50℃; for 0.166667h;87%
With sulfur trioxide
With chlorosulphuric acid
With sulfur trioxide Ambient temperature;91.5 g
Bis(trimethylsilyl)peroxodisulfat
29938-10-1

Bis(trimethylsilyl)peroxodisulfat

A

chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

B

bis(trimethylsilyl)sulphate
18306-29-1

bis(trimethylsilyl)sulphate

Conditions
ConditionsYield
In dichloromethane at -20 - 20℃;A 6.2%
B 2.5%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

sulfur trioxide
7446-11-9

sulfur trioxide

chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

Conditions
ConditionsYield
-30°C;>99
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

6-chloro-2-isopropylimidazo[1,2-a]pyridine-7-carbonitrile

6-chloro-2-isopropylimidazo[1,2-a]pyridine-7-carbonitrile

6-chloro-7-cyano-2-isopropylimidazo[1,2-a]pyridine-3-sulfonic acid

6-chloro-7-cyano-2-isopropylimidazo[1,2-a]pyridine-3-sulfonic acid

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 90℃; for 5h; Cooling with ice;99%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

mercury bis(trifluoromethanethiolate)
21259-75-6

mercury bis(trifluoromethanethiolate)

S-(Trifluormethyl)thioschwefelsaeure-trimethylsilylester

S-(Trifluormethyl)thioschwefelsaeure-trimethylsilylester

Conditions
ConditionsYield
In tetrachloromethane at 20℃;95%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

recorcinol
108-46-3

recorcinol

2-Hydroxy-4-trimethylsiloxy-1-benzolsulfonsaeure-trimethylsilylester
81293-06-3

2-Hydroxy-4-trimethylsiloxy-1-benzolsulfonsaeure-trimethylsilylester

Conditions
ConditionsYield
at 80℃; for 12h;92%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

ethoxycarbonylketene ethyltrimethylsilyl acetal
17906-37-5

ethoxycarbonylketene ethyltrimethylsilyl acetal

(Trimethylsiloxysulfonyl)malonsaeure-diethylester
89056-12-2

(Trimethylsiloxysulfonyl)malonsaeure-diethylester

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 60℃; for 4h;91%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

2,4-dimethyl-3-trimethylsilyloxy-2-pentene
55339-64-5

2,4-dimethyl-3-trimethylsilyloxy-2-pentene

2,4-Dimethyl-2-(trimethylsiloxysulfonyl)-3-pentanon
72458-54-9

2,4-Dimethyl-2-(trimethylsiloxysulfonyl)-3-pentanon

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 25℃; for 2.5h;91%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

1-(Trimethylsilyl)imidazole
18156-74-6

1-(Trimethylsilyl)imidazole

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

C6H12N2O3SSi

C6H12N2O3SSi

Conditions
ConditionsYield
In dichloromethane for 1h; Ambient temperature;A n/a
B 90%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

p-cresol
106-44-5

p-cresol

chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

5-Methyl-2-trimethylsiloxy-1-benzolsulfonsaeure-trimethylsilylester
81293-05-2

5-Methyl-2-trimethylsiloxy-1-benzolsulfonsaeure-trimethylsilylester

Conditions
ConditionsYield
at 80℃; for 12h;89%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

silver(I) benzenesulphonate
39938-06-2

silver(I) benzenesulphonate

Benzolpyrosulfonsaeure-trimethylsilylester
81293-11-0

Benzolpyrosulfonsaeure-trimethylsilylester

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 0℃; for 0.5h;89%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

((CH3)3Sn)C(CH2OCOCH3)CH(Sn(CH3)3)
180070-63-7

((CH3)3Sn)C(CH2OCOCH3)CH(Sn(CH3)3)

sodium hydrogencarbonate
144-55-8

sodium hydrogencarbonate

Na(1+)*(CH3)3SnC(CH2OCH3)CHSO3(1-)*H2O=(CH3)3SnC(CH2OCH3)CHSO3Na*H2O

Na(1+)*(CH3)3SnC(CH2OCH3)CHSO3(1-)*H2O=(CH3)3SnC(CH2OCH3)CHSO3Na*H2O

Conditions
ConditionsYield
In tetrachloromethane byproducts: Me3SnCl; Ar-atmosphere; slow addn. of 2 equiv. Sn-compd. to chlorosulfonate, standing at 20°C for 1 h, addn. of satd. aq. NaHCO3, stirring for 30 min; washing of aq. layer (Et2O), evapn., dissoln. in hot EtOH, filtration, evapn., washing (pentane), drying (vac., 80°C); elem. anal.;88%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

3,3-dimethyl-2-(trimethylsilyl)oxy-1-butene
17510-46-2

3,3-dimethyl-2-(trimethylsilyl)oxy-1-butene

3,3-Dimethyl-1-(trimethylsiloxysulfonyl)-2-butanon
72458-53-8

3,3-Dimethyl-1-(trimethylsiloxysulfonyl)-2-butanon

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 25℃; for 2.5h;87%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

trimethyl[(Z)-(1-phenyl-1-propenyl)oxy]silane
66323-99-7

trimethyl[(Z)-(1-phenyl-1-propenyl)oxy]silane

1-Phenyl-2-(trimethylsiloxysulfonyl)-1-propanon
72458-56-1

1-Phenyl-2-(trimethylsiloxysulfonyl)-1-propanon

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 25℃; for 2.5h;87%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

aniline
62-53-3

aniline

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

anilinium phenylamidosulfate
1021-03-0

anilinium phenylamidosulfate

Conditions
ConditionsYield
In tetrachloromethane at -15 - -10℃; for 3h;A n/a
B 87%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

2-(trimethylsilyl)-4-methoxy-1,3-difluorobenzene
114636-02-1

2-(trimethylsilyl)-4-methoxy-1,3-difluorobenzene

2,6-difluoro-3-methoxybenzenesulfonic acid

2,6-difluoro-3-methoxybenzenesulfonic acid

Conditions
ConditionsYield
In tetrachloromethane for 18h; Inert atmosphere; Reflux;85.3%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

2-methyl-1-phenyl-1-trimethylsiloxy-1-propene
39158-85-5

2-methyl-1-phenyl-1-trimethylsiloxy-1-propene

2-Methyl-1-phenyl-2-(trimethylsiloxysulfonyl)-1-propanon
72458-57-2

2-Methyl-1-phenyl-2-(trimethylsiloxysulfonyl)-1-propanon

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 25℃; for 2.5h;85%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

1-phenoxy-1-trimethylsilyloxyprop-1-ene
86294-78-2, 86294-84-0, 65946-50-1

1-phenoxy-1-trimethylsilyloxyprop-1-ene

2-(Trimethylsiloxysulfonyl)propansaeure-phenylester
89056-10-0

2-(Trimethylsiloxysulfonyl)propansaeure-phenylester

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 60℃; for 4h;85%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

trimethyl-(4-trimethylsilanyloxy-phenyl)-silane
18036-81-2

trimethyl-(4-trimethylsilanyloxy-phenyl)-silane

4-Trimethylsiloxy-1-benzolsulfonsaeure-trimethylsilylester
81293-04-1

4-Trimethylsiloxy-1-benzolsulfonsaeure-trimethylsilylester

Conditions
ConditionsYield
for 15h; Ambient temperature;85%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

m-xylene
108-38-3

m-xylene

2,4-Dimethyl-1-benzolsulfonsaeure-trimethylsilylester
81292-90-2

2,4-Dimethyl-1-benzolsulfonsaeure-trimethylsilylester

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 80℃; for 10h;85%
Ethyl thiophene-2-carboxylate
2810-04-0

Ethyl thiophene-2-carboxylate

chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

5-<(Trimethylsiloxy)sulfonyl>-2-thiophencarbonsaeure-ethylester
81293-10-9

5-<(Trimethylsiloxy)sulfonyl>-2-thiophencarbonsaeure-ethylester

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 80℃; for 18h;84%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

trimethyl(4-methylphenoxy)silane
17902-32-8

trimethyl(4-methylphenoxy)silane

5-Methyl-2-trimethylsiloxy-1-benzolsulfonsaeure-trimethylsilylester
81293-05-2

5-Methyl-2-trimethylsiloxy-1-benzolsulfonsaeure-trimethylsilylester

Conditions
ConditionsYield
With chloro-trimethyl-silane In 1,2-dichloro-ethane at 80℃; for 12h;84%
heptamethyldisilazane
920-68-3

heptamethyldisilazane

chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

methyl-trimethylsilanyl-amidosulfuric acid trimethylsilanyl ester
58584-42-2

methyl-trimethylsilanyl-amidosulfuric acid trimethylsilanyl ester

Conditions
ConditionsYield
In dichloromethane at 20℃; for 3h;83%
In dichloromethane
p-cresol
106-44-5

p-cresol

chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

2-Hydroxy-5-methyl-1-benzolsulfonsaeure-trimethylsilylester
81293-03-0

2-Hydroxy-5-methyl-1-benzolsulfonsaeure-trimethylsilylester

Conditions
ConditionsYield
In 1,2-dichloro-ethane for 6h; Heating;82%
1,2-dimethoxybenzene
91-16-7

1,2-dimethoxybenzene

chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

3,4-Dimethoxy-1-benzolsulfonsaeure-trimethylester
81293-07-4

3,4-Dimethoxy-1-benzolsulfonsaeure-trimethylester

Conditions
ConditionsYield
With chloro-trimethyl-silane In 1,2-dichloro-ethane at 80℃; for 10h;82%
trimethylsilanyl-acetic acid ethyl ester
4071-88-9

trimethylsilanyl-acetic acid ethyl ester

chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

C7H16O5SSi
107716-49-4

C7H16O5SSi

Conditions
ConditionsYield
Ambient temperature;A n/a
B 82%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

o-xylene
95-47-6

o-xylene

3,4-Dimethyl-1-benzolsulfonsaeure-trimethylsilylester
81292-89-9

3,4-Dimethyl-1-benzolsulfonsaeure-trimethylsilylester

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 80℃; for 10h;82%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

methoxybenzene
100-66-3

methoxybenzene

4-Methoxy-1-benzolsulfonsaeure-trimethylester
74692-08-3

4-Methoxy-1-benzolsulfonsaeure-trimethylester

Conditions
ConditionsYield
With chloro-trimethyl-silane In 1,2-dichloro-ethane at 80℃; for 10h;82%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

toluene
108-88-3

toluene

A

4-Methyl-1-benzolsulfonsaeure-trimethylsilylester
17872-98-9

4-Methyl-1-benzolsulfonsaeure-trimethylsilylester

B

2-Toluolsulfonsaeure-trimethylsilylester

2-Toluolsulfonsaeure-trimethylsilylester

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 80℃; for 12h;A 82%
B 9%
chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

2,4-Dimethyl-3-(triethylsiloxy)-2-penten
80239-20-9

2,4-Dimethyl-3-(triethylsiloxy)-2-penten

A

triethylsilyl chloride
994-30-9

triethylsilyl chloride

B

2,4-Dimethyl-2-(trimethylsiloxysulfonyl)-3-pentanon
72458-54-9

2,4-Dimethyl-2-(trimethylsiloxysulfonyl)-3-pentanon

Conditions
ConditionsYield
In 1,2-dichloro-ethane for 3.5h; Ambient temperature;A n/a
B 81%
1-styrenyloxytrimethylsilane
13735-81-4

1-styrenyloxytrimethylsilane

chlorosulfonate de trimethylsilyle
4353-77-9

chlorosulfonate de trimethylsilyle

1-Phenyl-2-(trimethylsiloxysulfonyl)-1-ethanon
89056-02-0

1-Phenyl-2-(trimethylsiloxysulfonyl)-1-ethanon

Conditions
ConditionsYield
In 1,2-dichloro-ethane at 25℃; for 2.5h;80%

4353-77-9Relevant articles and documents

-

Schmidt,Schmidbaur

, (1962)

-

Insertion of Sulfur Trioxide into the N-Si bond of Anilinotrimethylsilane. An Improved Method for the Preparation of Free Phenylamidosulfuric Acid

Kanetani, Fujio,Okada, Eiji,Negoro, Kenji

, p. 2517 - 2520 (2007/10/02)

The reaction between anilinotrimethylsilane (1) and a variety of sulfonating agents has been studied.With SO3, 5, or a dioxane-sulfur trioxide complex a sulfur trioxide molecule was inserted selectively into the N-Si bond of 1 to yield trimethylsilyl phenylamidosulfate (2), which on treatment with acetic acid, trifluoroacetic acid, or methanol gave free phenylamidosulfuric acid (3).The reaction of 1 with ClSO3H afforded 3 directly, but the product was contaminated with slight amounts of anilinium hydrogensulfate and anilinium chloride.The reaction of 1 with 10 yielded a mixture containing dianilinium (4-sulfonatophenylamido)sulfate, 4-aminobenzenesulfonic acid, and ethyl phenylamidosulfate as major products (after desilylation).The reaction of 1 with 5 has been found to provide an improved method for preparing 3.

REACTION OF BIS(TRIMETHYLSILYL) SULFATE WITH HYDROGEN HALIDES AND WITH PHOSPHORUS AND SULFUR HALIDES AND OXYHALIDES

Voronkov, M. G.,Roman, V. K.,Maletina, E. A.,Korotaeva, I. M.

, p. 621 - 623 (2007/10/02)

-

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